公开(公告)号：US11915908B2

公开(公告)日：2024-02-27

申请号：US17501238

申请日：2021-10-14

Applicant: Carl Zeiss SMT GmbH

Inventor： Eugen Foca ,  Amir Avishai ,  Dmitry Klochkov ,  Thomas Korb ,  Jens Timo Neumann ,  Keumsil Lee

IPC: H01J37/24 ,  H01J37/28

CPC classification number: H01J37/24 ,  H01J37/28

Abstract: The present invention relates to a method for measuring a sample with a microscope, the method comprising the steps of: measuring a tilt of the sample, correcting an orientation of the sample based on the tilt, and scanning the sample.

公开(公告)号：US11908656B2

公开(公告)日：2024-02-20

申请号：US17497761

申请日：2021-10-08

Applicant: ASML Netherlands B.V.

Inventor： Han Willem Hendrik Severt ,  Jan-Gerard Cornelis Van Der Toorn ,  Ronald Van Der Wilk ,  Allard Eelco Kooiker

IPC: H01J37/20 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/0206 ,  H01J2237/04756 ,  H01J2237/24592

Abstract: A stage apparatus for a particle-beam apparatus is disclosed. A particle beam apparatus may comprise a conductive object and an object table, the object table being configured to support an object. The object table comprises a table body and a conductive coating, the conductive coating being provided on at least a portion of a surface of the table body. The conductive object is disposed proximate to the conductive coating and the table body is provided with a feature proximate to an edge portion of the conductive coating. Said feature is arranged so as to reduce an electric field strength in the vicinity of the edge portion of the conductive coating when a voltage is applied to both the conductive object and the conductive coating.

公开(公告)号：US20240055220A1

公开(公告)日：2024-02-15

申请号：US18267502

申请日：2020-12-23

Applicant: Hitachi High-Tech Corporation

Inventor： Yuka II

IPC: H01J37/20 ,  H01J37/304 ,  H01J37/28 ,  H01J37/305

CPC classification number: H01J37/20 ,  H01J37/3045 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/208 ,  H01J2237/31749

Abstract: A charged particle beam device includes a sample stage on which a sample is mounted and moved, a charged particle beam irradiation optical system irradiating with a charged particle beam, a sample piece movement unit holding and conveying a sample piece extracted from the sample, a holder fixing table holding a sample piece holder to which the sample piece is transferred, and a computer. When allowing the sample piece movement unit to approach the sample piece, the computer selects a matching region for performing image matching between a reference image obtained in advance by irradiating the sample with the charged particle beam and a comparison image obtained by irradiating the sample, which is an extraction target for the sample piece, with the charged particle beam.

公开(公告)号：US11887807B2

公开(公告)日：2024-01-30

申请号：US18158444

申请日：2023-01-23

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/1478 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

公开(公告)号：US20240014001A1

公开(公告)日：2024-01-11

申请号：US18257213

申请日：2021-01-29

Applicant: University Of Science And Technology Of China

Inventor： Hongmin Zhou ,  Shengquan Fu ,  Ming Li

IPC: H01J37/20 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/204

Abstract: A system of scanning electron microscope sample box and a method of opening the same are provided, including: a sample chamber (1); an exchange chamber (2) communicated with the sample chamber (1), a sample stage base (3) is disposed in the exchange chamber (2), the sample stage base (3) is subjected to an external force to be translated from the exchange chamber (2) to the sample chamber (1), and an inner wall of the exchange chamber (2) is provided with a pulling arm (4); and a sample box including a box body (5) and a box cover (6) sealing the box body (5), wherein the box body (5) is placed on the sample stage base (3) of the exchange chamber (2), and the box cover (6) is connected to the pulling arm (4), so that the box body (5) is separated from the box cover (6) when the sample stage base (3) is subjected to the external force to translate the box body (5) from the exchange chamber (2) to the sample chamber (1). The method of opening the scanning electron microscope sample box provided by the present disclosure is simple and is easy for implementation, reducing a difficulty and a cost of a process of manufacturing the sample box.

公开(公告)号：US11869745B2

公开(公告)日：2024-01-09

申请号：US17435479

申请日：2019-03-27

Applicant: Hitachi High-Tech Corporation

Inventor： Minami Shouji ,  Natsuki Tsuno ,  Hiroya Ohta ,  Daisuke Bizen

IPC: H01J37/28 ,  H01J37/22 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J37/224 ,  H01J37/226 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/2448 ,  H01J2237/2817

Abstract: An object of the invention is to provide a charged particle beam device capable of increasing the contrast of an observation image of a sample as much as possible in accordance with light absorption characteristics that change for each optical parameter. The charged particle beam device according to the invention changes an optical parameter such as a polarization plane of light emitted to the sample, and generates the observation image having a contrast corresponding to the changed optical parameter. An optical parameter that maximizes a light absorption coefficient of the sample is specified according to a feature amount of a shape pattern of the sample (refer to FIG. 5).

公开(公告)号：US20230420224A1

公开(公告)日：2023-12-28

申请号：US18230722

申请日：2023-08-07

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Andreas Schmaunz

IPC: H01J37/32 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J37/304

CPC classification number: H01J37/32449 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/006 ,  H01J2237/2065

Abstract: Operating a gas feed device for a particle beam apparatus includes predetermining a flow rate of a precursor through an outlet of a precursor reservoir containing the precursor to be fed onto an object, loading a temperature of the precursor reservoir, the temperature being associated with the predetermined flow rate, from a database into a control unit, setting a temperature of the precursor reservoir to the temperature loaded from the database using a temperature setting unit, and determining at least one functional parameter of the precursor reservoir depending on the flow rate and the temperature, loaded from the database, using the control unit and informing a user of the gas feed device about the determined functional parameter. Informing the user of the gas feed device about the functional parameter may include displaying the functional parameter on a display unit, outputting an optical signal, or outputting an acoustic signal.

公开(公告)号：US11848171B2

公开(公告)日：2023-12-19

申请号：US17587935

申请日：2022-01-28

Applicant: Hitachi High-Tech Corporation

Inventor： Akio Yamamoto ,  Wen Li ,  Hiroshi Oinuma ,  Shunsuke Mizutani

IPC: H01J37/244 ,  H01J37/28 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/244 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2443 ,  H01J2237/2826

Abstract: Provided is a charged particle beam device and a charged particle beam device calibration method capable of correcting an influence of characteristic variation and noise with high accuracy. Control units execute a first calibration of correcting a characteristic variation between a plurality of channels in detectors and signal processing circuits by using a setting value of a control parameter for each of the plurality of channels in a state in which a primary electron beam is not emitted. The control units further execute a second calibration of correcting a characteristic variation between the plurality of channels in scintillators or the like by using the setting value of the control parameter for each of the plurality of channels in a state in which the primary electron beam is emitted.

公开(公告)号：US20230402248A1

公开(公告)日：2023-12-14

申请号：US18034929

申请日：2020-12-16

Applicant: Hitachi High-Tech Corporation

Inventor： Akito TANOKUCHI ,  Hiroki TSUBOUCHI ,  Takao UBUKATA

IPC: H01J37/18 ,  H01J37/28

CPC classification number: H01J37/18 ,  H01J37/28 ,  H01J2237/1825

Abstract: Provided are a vacuum treatment device and a vacuum treatment method with which it is possible to suppress deterioration of the degree of vacuum in a conveyance destination vacuum chamber when conveying a sample between two vacuum chambers. In this regard, a control device 30 controls conveyance of a wafer 600 from LC 102 to SC 101 via a LC-SC gate valve 510. At this time, the control device stops vacuum evacuation, which is being performed by a TMP 401A for a first duration of time, after having controlled the LC-SC gate valve 510 to close, measures an internal pressure of the LC 102 by using a pressure gauge 103 in a condition in which the vacuum evacuation is stopped, and controls the LC-SC gate valve 510 to open if the measured internal pressure has reached a first reference value.

公开(公告)号：US11837433B2

公开(公告)日：2023-12-05

申请号：US17669503

申请日：2022-02-11

Applicant: JEOL Ltd.

Inventor： Akiho Nakamura

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/147

CPC classification number: H01J37/265 ,  H01J37/1474 ,  H01J37/28 ,  H01J2237/2802 ,  H01J2237/2804

Abstract: A method of measuring a relative rotational angle includes: shifting an electron beam on a specimen plane by using a deflector; tilting the electron beam with respect to the specimen plane by using the deflector; acquiring a first STEM image including information of a scattering azimuth angle and a second STEM image not including the information of the scattering azimuth angle, before the shifting and the tilting; acquiring a third STEM image including the information of the scattering azimuth angle and a fourth STEM image not including the information of the scattering azimuth angle, after the shifting and the tilting; and obtaining the relative rotational angle based on the first STEM image, the second STEM image, the third STEM image and the fourth STEM image.