公开(公告)号：US3975613A

公开(公告)日：1976-08-17

申请号：US503697

申请日：1974-09-06

Applicant: Gunther Wulff ,  Josef Vogt

Inventor： Gunther Wulff ,  Josef Vogt

IPC: B23K15/00 ,  H01J37/063 ,  H01J37/305

CPC classification number: H01J37/305 ,  B23K15/002 ,  H01J37/063

Abstract: In an electron beam-generating system including an electron-emitting cathode, a beam focusing electrode, and an anode electrode for accelerating the emitted electrons, the magnetic fields for deflecting the beam to material to be heated and for periodically deflecting the focal spot of the beam on the material are produced by a heavy current conductor, that is, a conductor carrying a high current, arranged in proximity to the curved path of the deflected electron beam and extending perpendicular to the plane of deflection of the electron beam. The anode electrode may be formed with an opening for the passage of the electron beam, and the heavy current conductor is arranged in the proximity of the opening and parallel to the latter. The heavy current conductor may be designed as an edge of a slot-shaped opening, and may comprise a plurality of individual conductors.

Abstract translation: 在包括电子发射阴极，光束聚焦电极和用于加速发射的电子的阳极电极的电子束发生系统中，磁场用于将光束偏转到待加热的材料，并且用于周期性地偏转 材料上的光束由大电流导体（即，承载高电流的导体）产生，布置在偏转的电子束的弯曲路径附近并且垂直于电子束的偏转平面延伸。 阳极电极可以形成有用于电子束通过的开口，并且大电流导体布置在开口附近并且平行于后者。 大电流导体可以被设计为槽形开口的边缘，并且可以包括多个单独的导体。

公开(公告)号：US3878424A

公开(公告)日：1975-04-15

申请号：US38010073

申请日：1973-07-17

Applicant: JEOL LTD

Inventor： SUGANUMA TADAO

IPC: H01J3/02 ,  H01J37/06 ,  H01J37/063 ,  H01J37/065 ,  H01J37/075 ,  H01J1/20 ,  H01J19/14

CPC classification number: H01J37/075 ,  H01J37/063 ,  H01J37/065

Abstract: This invention relates to an electron beam generating source comprising a cathode and anode, the opposite and facing surfaces of the cathode and anode being flat and parallel so that the electrostatic field formed between the two electrodes is parallel and perpendicular to the surfaces of both electrodes, thereby preventing the electrons emitted from the electron emitter from being affected by lens effects, for example, spherical aberration.

Abstract translation: 本发明涉及一种包括阴极和阳极的电子束产生源，阴极和阳极的相对且相对的表面是平坦且平行的，使得在两个电极之间形成的静电场平行并垂直于两个电极的表面， 从而防止从电子发射器发射的电子受透镜效应的影响，例如球面像差。

公开(公告)号：US3852560A

公开(公告)日：1974-12-03

申请号：US36260873

申请日：1973-05-21

Applicant: COCKERILL

Inventor： STREEL D

IPC: H05B7/00 ,  B23K15/00 ,  C21D1/38 ,  C23C14/54 ,  C23C14/56 ,  H01J37/063 ,  H01J37/30 ,  H01J37/305

CPC classification number: C23C14/562 ,  B23K15/00 ,  B23K15/0086 ,  C23C14/541 ,  H01J37/063 ,  H01J37/30 ,  H01J37/305 ,  H01J37/3053

Abstract: A device for heating a metallic product of great length and small thickness, particularly a wire or sheet metal, by means of a flow of electrons comprises a container in which there is maintained a permanent vacuum of 10 3 to 10 5 torr. The container contains the metallic product to be heated, a means for the production of electrons which, by the action of an electrical field, are hurled onto the product, and reflecting means for returning toward the product any electrons which have escaped from said field.

Abstract translation: 用于通过电子流加热长度和小厚度的金属产品，特别是金属丝或金属片的装置包括容器，其中维持10 -3至10 -3的永久真空， 5托 容器包含待加热的金属产品，用于产生电子的手段，其通过电场的作用被投掷到产品上，以及用于向产品返回任何从所述场逃逸的电子的反射装置。

公开(公告)号：US3846660A

公开(公告)日：1974-11-05

申请号：US84797269

申请日：1969-08-06

Applicant: GEN ELECTRIC

Inventor： WOLFE J ,  LEDGES G ,  GLASCOCK H

IPC: G11C17/00 ,  G11C11/30 ,  G11C13/04 ,  H01J1/16 ,  H01J31/60 ,  H01J37/06 ,  H01J37/063 ,  H01J37/073 ,  H01J37/302 ,  H01J29/64 ,  H01J29/56

CPC classification number: H01J37/302 ,  G11C13/04 ,  G11C13/048 ,  H01J1/16 ,  H01J31/60 ,  H01J37/06 ,  H01J37/063 ,  H01J37/073 ,  H01J2237/06316

Abstract: A storage system for the mass recording and readout of digital data with ultra high resolution. An electron beam structure is provided for forming a beam of extremely small focused spot diameter, on the order of 0.1 microns, and high current density capability, on the order of 1,000 amperes per sq. cm., which records data by scanning over defined areas of the storage medium surface and micromachining elemental portions of said medium as a function of beam modulation. Readout may be subsequently accomplished by similarly scanning the beam at reduced power density and detecting electrons that have been transmitted by or reflected from the storage medium.

Abstract translation: 一种用于以超高分辨率大量记录和读出数字数据的存储系统。 提供电子束结构，用于形成约0.1微米的极小聚焦光点直径和高电流密度能力的光束，其数量级为每平方厘米1000安培，其通过在限定区域上扫描记录数据 作为光束调制的函数的所述介质的存储介质表面和微加工元素部分。 可以随后通过以降低的功率密度类似地扫描光束并检测已经由存储介质传输或从存储介质反射的电子来实现读出。

公开(公告)号：US3770934A

公开(公告)日：1973-11-06

申请号：US3770934D

申请日：1971-10-29

Applicant: MACHLETT LAB INC

Inventor： RANDMER J

IPC: B23K15/00 ,  H01J37/063

CPC classification number: B23K15/0013 ,  H01J37/063

Abstract: Electron beam heating apparatus for heating a large area workpiece in a vacuumized area by electron bombardment, including means for forming and beaming a plurality of ribbon-shaped electron beams which combine into a single beam of uniform current density and large cross-section for heating the workpiece.

Abstract translation: 电子束加热装置，用于通过电子轰击在真空区域中加热大面积的工件，包括用于形成和发射多个带状电子束的装置，所述多个带状电子束组合成具有均匀电流密度的单个光束和用于加热的多个横截面 工件。

公开(公告)号：US3731094A

公开(公告)日：1973-05-01

申请号：US17304571

申请日：1971-08-19

Applicant: PHILIPS CORP

Inventor： LE POOLE J

IPC: G01Q30/02 ,  H01J29/56 ,  H01J37/04 ,  H01J37/063 ,  H01J37/067 ,  H01J37/145 ,  H01J37/153 ,  H01J41/04 ,  H01J37/26

CPC classification number: H01J37/04 ,  H01J29/56 ,  H01J37/063 ,  H01J37/067 ,  H01J37/145 ,  H01J37/153 ,  H01J41/04

Abstract: An apparatus for generating an electrostatic space charge in a rotation-symmetrical magnetic field, in which an electron beam from an electron gun which is arranged laterally on the field space generates the space charge in the field space. The electron beam may be adjusted by mechanical adjustment of the gun and also by means of the potential of a conducting sleeve in the magnetic field. By means of this potential, it is also possible to adjust the ratio between the contributions to the space charge which are due to primary electrons and to secondary electrons produced by the primary electrons in a residual gas in the field space.

Abstract translation: 一种用于在旋转对称磁场中产生静电空间电荷的装置，其中来自电子枪的电子束横向设置在场空间上，在场空间中产生空间电荷。 电子束可以通过枪的机械调节以及通过导磁套在磁场中的电位来调节。 通过这种电位，还可以调整由于一次电子引起的空间电荷的贡献与在场空间中残留气体中的一次电子产生的二次电子之间的比率。

公开(公告)号：US3634645A

公开(公告)日：1972-01-11

申请号：US3634645D

申请日：1970-04-21

Applicant: WESTINGHOUSE ELECTRIC CORP

Inventor： LEMPERT JOSEPH ,  LOWRY JERALD F ,  BONNER FREDERICK M

IPC: H01J37/063 ,  H01J37/21 ,  H01J37/24 ,  H01J37/301 ,  B23K9/00

CPC classification number: H01J37/063 ,  H01J37/21 ,  H01J37/241 ,  H01J37/301

Abstract: The electron beam B is projected on work W, usually in the atmosphere outside of the chamber where the beam is generated, through a plurality of aperture members 11, 13, 15, 17. The holes in the aperture members are as small as practicable to suppress the feedback of air into the chamber. The beam B is focussed in regions 85 and 87 (FIG. 3) with reference to the aperture members so as to preclude damage to the members by impingement of the beam on the walls of the holes through which the beam passes. The beam current is varied in dependence on the demands of the work but the focus of the beam is maintained by bias resistor 115 (FIG. 1), without damage to the aperture member, by instantaneous change in the bias impressed on the beam by a control electrode G.

Abstract translation: 电子束B通过多个孔径构件11,13,15,17，通常在产生梁的室内的大气外部突出在工件W上。孔径构件中的孔尽可能地小到 抑制空气反馈到室内。 光束B参照光圈元件聚焦在区域85和87（图3）中，以防止光束撞击光束通过的孔的壁上的部件损坏。 光束电流根据工作的需要而变化，但是通过偏置电阻器115（图1）来保持光束的焦点，而不会损坏孔径部件，通过施加在光束上的偏置的瞬时变化由 控制电极G.

公开(公告)号：US3500110A

公开(公告)日：1970-03-10

申请号：US3500110D

申请日：1967-08-23

Applicant: RAYTHEON CO

Inventor： WINSOR DONALD L

IPC: H01J3/02 ,  H01J19/00 ,  H01J23/06 ,  H01J23/065 ,  H01J37/063 ,  H01J25/34

CPC classification number: H01J25/04 ,  H01J3/029 ,  H01J19/00 ,  H01J23/065 ,  H01J2893/0022

公开(公告)号：US12198889B2

公开(公告)日：2025-01-14

申请号：US17044850

申请日：2020-05-08

Applicant: Photo electron Soul Inc.

Inventor： Atsushi Koizumi ,  Hokuto Iijima

IPC: H01J37/073 ,  H01J37/063

Abstract: The present disclosure addresses the problem of providing an electron gun that can directly monitor an intensity of an electron beam emitted from a photocathode using only the configuration provided to the electron gun, an electron beam applicator equipped with an electron gun, and a method for controlling an electron gun.
The aforementioned problem can be solved by an electron gun comprising a light source, a photocathode that emits an electron beam in response to receiving light from the light source, an anode, an electron-beam-shielding member with which it is possible to shield part of the electron beam, and a measurement unit that measures the intensity of the electron beam emitted from the photocathode using a measurement electron beam shielded by the electron-beam-shielding member.

公开(公告)号：US20220262598A1

公开(公告)日：2022-08-18

申请号：US17739830

申请日：2022-05-09

Applicant: CANON ANELVA CORPORATION

Inventor： Yasushi Yasumatsu ,  Naoyuki Okamoto ,  Masashi Tsujiyama ,  Fumihito Suzuki

IPC: H01J37/305 ,  H01J27/02 ,  H01J37/08 ,  B08B3/08 ,  H01J37/063 ,  H01J37/317

Abstract: Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.