公开(公告)号：US20240331967A1

公开(公告)日：2024-10-03

申请号：US18407388

申请日：2024-01-08

Applicant: KOREA BASIC SCIENCE INSTITUTE

Inventor： Myoung Choul Choi ,  Woo Jun Byeon ,  Byeong Jun Cha

IPC: H01J37/08

CPC classification number: H01J37/08 ,  H01J2237/032 ,  H01J2237/0805 ,  H01J2237/208

Abstract: A liquid metal ion source device for using bismuth and an alloy of the bismuth is provided. The liquid metal ion source device includes a base formed of an electrically insulating material, two electrodes connected to the base and configured to supply current, a needle mounted on the base and configured to pass through the base, a filament including a pair of connection rods connected to the two electrodes, respectively, a pair of support rods formed to be extended from the pair of connection rods, respectively, and provided in a direction away from the base and towards the needle, and a filament head connecting the pair of support rods to one another and having a shape curved toward the base, and a reservoir configured to accommodate at least a portion of the filament head inside the reservoir and store a liquid metal.

公开(公告)号：US20230402266A1

公开(公告)日：2023-12-14

申请号：US18312606

申请日：2023-05-05

Applicant: VON ARDENNE Asset GmbH & Co. KG

Inventor： Falk MILDE

IPC: H01J37/32 ,  C23C16/50 ,  C23C14/34

CPC classification number: H01J37/32715 ,  H01J37/32541 ,  H01J37/32568 ,  C23C16/50 ,  C23C14/34 ,  H01J2237/201 ,  H01J2237/032 ,  H01J2237/20221 ,  H01J2237/3321

Abstract: Disclosed herein are devices, systems, and methods for transporting a substrate for vacuum processing. The transport may be provided by a substrate carrying device that includes a support area by which a substrate carrier may be moveably supported. The substrate carrying device includes a plurality of electrodes that are galvanically separated from one another. The substrate carrying device includes a plurality of substrate carrying regions arranged consecutively in series with respect to one another, each substrate carrying region including an electrode of the plurality of electrodes and also including a substrate receiving device configured to receive a substrate placed in the substrate carrying region, preferably in physical contact with the electrode.

公开(公告)号：US11754388B2

公开(公告)日：2023-09-12

申请号：US17140302

申请日：2021-01-04

Applicant: JEOL Ltd.

Inventor： Yukinori Aida

IPC: H01J37/20 ,  H01J37/30 ,  H01J37/317 ,  G01B11/06

CPC classification number: G01B11/0608 ,  H01J37/20 ,  H01J37/3007 ,  H01J37/3174 ,  H01J2237/032 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/202

Abstract: A height measuring device includes a light source that emits light in a direction oblique to a top surface of a specimen, a slit that shapes the light from the light source to form a slit image on the specimen, an imaging element that detects reflected light reflected by the specimen, and an arithmetic unit. The arithmetic unit: identifies a slit image of the reflected light reflected by the top surface of the specimen from among a plurality of slit images based on respective positions of the plurality of slit images on a detection surface of the imaging element; and determines the height of the top surface of the specimen based on the position of the slit image of the reflected light reflected by the top surface of the specimen on the detection surface.

公开(公告)号：US11705252B2

公开(公告)日：2023-07-18

申请号：US17403849

申请日：2021-08-16

Applicant: ASML Netherlands B.V.

Inventor： Alexander Hendrik Vincent Van Veen ,  Willem Henk Urbanus ,  Marco Jan-Jaco Wieland

IPC: H01J37/30 ,  G21K5/04 ,  G21K1/02 ,  H01J37/317 ,  H01J37/16 ,  H01J37/12

CPC classification number: G21K5/04 ,  G21K1/02 ,  H01J37/12 ,  H01J37/16 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/024 ,  H01J2237/0213 ,  H01J2237/0216 ,  H01J2237/0262 ,  H01J2237/032 ,  H01J2237/1207 ,  H01J2237/1215 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/30472

Abstract: The disclosure relates to an electron-optical module of an electron-optical apparatus. The electron-optical module comprises a vacuum chamber, a high voltage shielding arrangement located within the vacuum chamber, and an aperture array configured to form a plurality of beamlets from an electron beam and located within the high voltage shielding arrangement. Wherein the electron-optical module can be configured to be removable from the electron-optical apparatus.

公开(公告)号：US09807864B1

公开(公告)日：2017-10-31

申请号：US15228158

申请日：2016-08-04

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Christopher Lupoli ,  Sheri A. Durgin ,  Daniel McGillicuddy ,  Victor J. Theriault ,  Klaus Becker

IPC: H01J37/00 ,  H05H5/00 ,  H05H5/06 ,  H01J37/317

CPC classification number: H05H5/063 ,  H01J37/3171 ,  H01J2237/032 ,  H01J2237/0473 ,  H01J2237/31701

Abstract: An electrode for manipulating an ion beam. The electrode may include an insert having an ion beam aperture to conduct the ion beam therethrough, the insert comprising a first electrically conductive material; a frame disposed around the insert and comprising a second electrically conductive material; and an outer portion, the outer portion disposed around the frame and comprising a third electrically conductive material, wherein the insert is reversibly detachable from the frame, and wherein the frame is reversibly attachable from the outer portion.

公开(公告)号：US20170213696A1

公开(公告)日：2017-07-27

申请号：US15414517

申请日：2017-01-24

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Alon Litman ,  Efim Vinnitsky ,  Ofir Arzouan ,  Igor Petrov

IPC: H01J37/244 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/047 ,  H01J2237/2445 ,  H01J2237/24475 ,  H01J2237/2448

Abstract: A method for evaluating a specimen includes positioning a detector in an inserted position in which a first distance between a tip of the detector and a plane extending along a surface of the specimen is less than a distance between the plane and a tip of charged particle beam optics. While maintaining the detector at the inserted position, the surface of the specimen is scanned by a primary beam that exits from the tip of the charged particle beam optics. The detector detects x-ray photons and/or charged particles emitted or reflected from the specimen as a result of scanning the specimen with the primary beam. After completion of the scanning, the detector is positioned at a retracted position in which a second distance between the tip of the detector and the plane exceeds a distance between the tip of the charged particle beam optics and the plane.

公开(公告)号：US20170110288A1

公开(公告)日：2017-04-20

申请号：US15273864

申请日：2016-09-23

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO

IPC: H01J37/30

CPC classification number: H01J37/3007 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/032 ,  H01J2237/2007 ,  H01J2237/317

Abstract: In one embodiment, a supporting case includes a lower case member and an upper case member. The mounting substrate is pinched between a lower cylindrical supporting portion and a upper cylindrical supporting portion. Peripheral regions of the mounting substrate that are on a peripheral side with respect to a part pinched between the lower cylindrical supporting portion and the upper cylindrical supporting portion are positioned in a space defined by a bottom plate portion, a lower peripheral-wall portion, and the lower cylindrical supporting portion of the lower case member and a top lid portion, an upper peripheral-wall portion, and the upper cylindrical supporting portion of the upper case member.

公开(公告)号：US20160307726A1

公开(公告)日：2016-10-20

申请号：US15195665

申请日：2016-06-28

Applicant: EBARA CORPORATION

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC: H01J37/09 ,  G01N23/225 ,  H01J37/28 ,  H01J37/22 ,  H01J37/10

CPC classification number: H01J37/073 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J1/34 ,  H01J37/09 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Abstract translation: 用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统 在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够 基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

公开(公告)号：US09312093B1

公开(公告)日：2016-04-12

申请号：US14321921

申请日：2014-07-02

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Joerg Fober ,  Edgar Fichter ,  Kai Schubert ,  Dirk Preikszas ,  Christian Hendrich ,  Momme Mommsen ,  Michael Schnell ,  Lorenz Lechner

IPC: H01J37/26 ,  H01J37/147

CPC classification number: H01J37/1471 ,  H01J37/24 ,  H01J37/26 ,  H01J2237/0266 ,  H01J2237/032 ,  H01J2237/1504 ,  H01J2237/153

Abstract: A particle beam device comprises a beam generator for generating a particle beam having charged particles and an electrode unit having a first electrode and a second electrode, wherein the first electrode interacts with the second electrode, in particular for guiding, shaping, aligning or correcting the particle beam. Moreover, the particle beam device comprises a low-pass filter being connected with at least one of: the first electrode and the second electrode, using an electrical connection. Additionally, the particle beam device comprises a mounting unit having an opening for the passage of the particle beam, wherein the at least one low-pass filter, the first electrode and the second electrode are arranged at the mounting unit. The electrode unit may comprise more than two electrodes, for example up to 16 electrodes.

Abstract translation: 粒子束装置包括用于产生具有带电粒子的粒子束的束发生器和具有第一电极和第二电极的电极单元，其中第一电极与第二电极相互作用，特别是用于引导，成形，对准或校正 粒子束。 此外，粒子束装置包括使用电连接与第一电极和第二电极中的至少一个连接的低通滤波器。 另外，粒子束装置包括具有用于粒子束通过的开口的安装单元，其中至少一个低通滤波器，第一电极和第二电极布置在安装单元处。 电极单元可以包括多于两个电极，例如多达16个电极。

公开(公告)号：US09269533B2

公开(公告)日：2016-02-23

申请号：US14482652

申请日：2014-09-10

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Takeshi Murakami

IPC: H01J37/26 ,  H01J37/28

CPC classification number: H01J37/26 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/032 ,  H01J2237/24415 ,  H01J2237/2445 ,  H01J2237/2801

Abstract: In accordance with an embodiment, an analysis apparatus includes a secondary electron optical system, at least one detector, and a composition analysis unit. The secondary electron optical system includes a charged particle beam source and a lens. The charged particle beam source generates a charged particle beam and irradiates a sample with it. The lens controls a focal position and a trajectory of the charged particle beam using an electric field or a magnetic field. The detector detects a characteristic X-ray from the sample. The composition analysis unit analyzes a composition of a material constituting the sample from the detected characteristic X-ray. Each detector is arranged in such a manner that at least part of a detection surface thereof is placed on the same plane as an exit surface of the secondary electron optical system, or placed on the charged particle beam side of the same plane.

Abstract translation: 根据实施例，分析装置包括二次电子光学系统，至少一个检测器和组成分析单元。 二次电子光学系统包括带电粒子束源和透镜。 带电粒子束源产生带电粒子束并照射样品。 透镜使用电场或磁场控制带电粒子束的焦点位置和轨迹。 检测器检测来自样品的特征X射线。 组分分析单元从检测到的特征X射线分析构成样品的材料的组成。 每个检测器被布置成使得其检测表面的至少一部分被放置在与二次电子光学系统的出射表面相同的平面上，或者放置在同一平面的带电粒子束侧上。