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    Charged particle vortex wave generation
    61.
    发明授权
    Charged particle vortex wave generation 有权
    带电粒子涡流产生

    公开(公告)号：US09018596B2

    公开(公告)日：2015-04-28

    申请号：US14366564

    申请日：2012-12-19

    Applicant: Universiteit Antwerpen

    Inventor： Johan Verbeeck ,  Gustaaf Van Tendeloo

    IPC: H01J37/04 ,  H01J37/26 ,  H01J3/02 ,  H01J37/06 ,  H01J37/08 ,  H01J37/256

    CPC classification number: H01J37/04 ,  H01J3/02 ,  H01J3/021 ,  H01J37/06 ,  H01J37/08 ,  H01J37/256 ,  H01J37/261 ,  H01J2237/06383 ,  H01J2237/2614

    Abstract: A device for imparting an orbital angular momentum to a charged particle wave propagating along a beam axis in a charged particle beam generating apparatus is described. The device comprises a support element having a target region adapted for transmitting a charged particle wave propagating along a beam axis and an induction means for inducing a magnetic flux along an elongated profile having a free end portion located in the target region and the induction means is adapted for providing a magnetic flux in the elongated profile in order to induce an angular gradient, relative to the beam axis, of the phase of the charged particle wave when transmitted through the target region. A corresponding method is also disclosed, as well as the use thereof in electron microscopy.

    Abstract translation: 描述了一种用于对带电粒子束产生装置中沿着光束轴传播的带电粒子波进行轨道角动量的装置。 该装置包括支撑元件，该支撑元件具有适于传输沿着光束轴传播的带电粒子波的目标区域和用于沿着具有位于目标区域中的自由端部分的细长轮廓感应磁通量的感应装置，并且感应装置是 适于在细长轮廓中提供磁通量，以便当透射通过目标区域时引起带电粒子波相位相对于光束轴的角度梯度。 还公开了相应的方法，以及其在电子显微镜中的应用。

    SELF-SUSTAINED NON-AMBIPOLAR DIRECT CURRENT (DC) PLASMA AT LOW POWER
    63.
    发明申请
    SELF-SUSTAINED NON-AMBIPOLAR DIRECT CURRENT (DC) PLASMA AT LOW POWER 有权
    低功耗自保持非直流电流（DC）等离子体

    公开(公告)号：US20150041432A1

    公开(公告)日：2015-02-12

    申请号：US14168565

    申请日：2014-01-30

    Applicant: Tokyo Electron Limited

    Inventor： Zhiying Chen ,  Lee Chen ,  Merritt Funk

    IPC: H01J37/32 ,  C23C16/505 ,  H01J37/08 ,  C23C16/50 ,  H01J37/06

    CPC classification number: H01J37/32899 ,  H01J37/30 ,  H01J37/32082 ,  H01J37/3233

    Abstract: A processing system is disclosed, having an electron beam source chamber that excites plasma to generate an electron beam, and an ion beam source chamber that houses a substrate and also excites plasma to generate an ion beam. The processing system also includes a dielectric injector coupling the electron beam source chamber to the ion beam source chamber that simultaneously injects the electron beam and the ion beam and propels the electron beam and the ion beam in opposite directions. The voltage potential gradient between the electron beam source chamber and the ion beam source chamber generates an energy field that is sufficient to maintain the electron beam and ion beam as a plasma treats the substrate so that radio frequency (RF) power initially applied to the processing system to generate the electron beam can be terminated thus improving the power efficiency of the processing system.

    Abstract translation: 公开了一种处理系统，其具有激发等离子体以产生电子束的电子束源室和容纳衬底并且还激发等离子体以产生离子束的离子束源室。 处理系统还包括将电子束源室耦合到离子束源室的电介质注入器，其同时注入电子束和离子束，并以相反方向推进电子束和离子束。 电子束源室和离子束源室之间的电压电位梯度产生足以维持作为等离子体的电子束和离子束的能量场，以使射频（RF）功率最初施加到处理 可以终止产生电子束的系统，从而提高处理系统的功率效率。

    Pattern data conversion for lithography system
    65.
    发明授权
    Pattern data conversion for lithography system 有权
    光刻系统的图案数据转换

    公开(公告)号：US08710465B2

    公开(公告)日：2014-04-29

    申请号：US13293426

    申请日：2011-11-10

    Applicant: Teunis Van De Peut ,  Marco Jan-Jaco Weiland

    Inventor： Teunis Van De Peut ,  Marco Jan-Jaco Weiland

    IPC: H01J37/06 ,  H01J37/07 ,  G21K5/10

    CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70291 ,  G03F7/70508

    Abstract: A method and system for exposing a target according to pattern data in a maskless lithography machine generating a plurality of exposure beamlets for exposing the target. The method comprises providing input pattern data in a vector format, rendering and quantizing the input pattern data to generate intermediate pattern data, and re-sampling and re-quantizing the intermediate pattern data to generate output pattern data. The output pattern data is supplied to the lithography machine, and the beamlets generated by the lithography machine are modulated on the basis of the output pattern data.

    Abstract translation: 一种用于在无掩模光刻机中根据图案数据曝光目标的方法和系统，其生成用于曝光目标的多个曝光子束。 该方法包括以矢量格式提供输入图形数据，渲染和量化输入图案数据以产生中间图案数据，并重新采样和重新量化中间图案数据以产生输出图案数据。 将输出图案数据提供给光刻机，并且基于输出图案数据调制由光刻机产生的子束。

    ION IMPLANTATION WITH CHARGE AND DIRECTION CONTROL
    66.
    发明申请
    ION IMPLANTATION WITH CHARGE AND DIRECTION CONTROL 有权
    离子植入与充电和方向控制

    公开(公告)号：US20130140987A1

    公开(公告)日：2013-06-06

    申请号：US13308614

    申请日：2011-12-01

    Applicant: Chih-Hong Hwang ,  Chun-Lin Chang ,  Nai-Han Cheng ,  Chi-Ming Yang ,  Chin-Hsiang Lin

    Inventor： Chih-Hong Hwang ,  Chun-Lin Chang ,  Nai-Han Cheng ,  Chi-Ming Yang ,  Chin-Hsiang Lin

    IPC: H01J37/06

    CPC classification number: H01J37/026 ,  H01J3/02 ,  H01J3/022 ,  H01J3/26 ,  H01J37/06 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/31705

    Abstract: The present disclosure provides for various advantageous methods and apparatus of controlling electron emission. One of the broader forms of the present disclosure involves an electron emission element, comprising an electron emitter including an electron emission region disposed between a gate electrode and a cathode electrode. An anode is disposed above the electron emission region, and a voltage set is disposed above the anode. A first voltage applied between the gate electrode and the cathode electrode controls a quantity of electrons generated from the electron emission region. A second voltage applied to the anode extracts generated electrons. A third voltage applied to the voltage set controls a direction of electrons extracted through the anode.

    Abstract translation: 本公开提供了控制电子发射的各种有利的方法和装置。 本公开的更广泛形式之一涉及电子发射元件，其包括电子发射器，其包括设置在栅电极和阴极之间的电子发射区。 阳极设置在电子发射区域的上方，并且在阳极上设置电压组。 施加在栅电极和阴极之间的第一电压控制从电子发射区产生的电子量。 施加到阳极的第二电压提取产生的电子。 施加到电压组的第三电压控制通过阳极提取的电子的方向。

    Probe system comprising an electric-field-aligned probe tip and method for fabricating the same
    67.
    发明授权
    Probe system comprising an electric-field-aligned probe tip and method for fabricating the same 有权
    包括电场对准探针尖端的探针系统及其制造方法

    公开(公告)号：US07735147B2

    公开(公告)日：2010-06-08

    申请号：US12088223

    申请日：2006-10-10

    Applicant: Sungho Jin ,  Li-Han Chen ,  I-Chen Chen

    Inventor： Sungho Jin ,  Li-Han Chen ,  I-Chen Chen

    IPC: H01J37/06

    CPC classification number: H01J9/025 ,  C01B32/162 ,  C01B32/18 ,  G01Q60/38 ,  G01Q60/56 ,  G01Q70/12 ,  G11B9/1409 ,  H01J1/3044 ,  H01J2201/30407 ,  H01J2201/30469 ,  Y10T428/11

    Abstract: A mechanically stable and oriented scanning probe tip comprising a carbon nanotube having a base with gradually decreasing diameter, with a sharp tip at the probe tip. Such a tip or an array of tips is produced by depositing a catalyst metal film on a substrate (10 & 12 in FIG. 1(a)), depositing a carbon dot (14 in FIG. 1(b)) on the catalyst metal film, etching away the catalyst metal film (FIG. 1(c)) not masked by the carbon dot, removing the carbon dot from the catalyst metal film to expose the catalyst metal film (FIG. 1(d)), and growing a carbon nanotube probe tip on the catalyst film (16 in FIG. 1(e)). The carbon probe tips can be straight, angled, or sharply bent and have various technical applications.

    Abstract translation: 一种机械稳定和取向的扫描探针尖端，其包括具有逐渐减小的直径的基底的碳纳米管，在探针尖端具有尖锐的尖端。 通过在基板（图1（a）中的10和12）上沉积催化剂金属膜，在催化剂金属上沉积碳点（图1（b）中的14））来产生尖端或尖端阵列 蚀刻不被碳点掩蔽的催化剂金属膜（图1（c）），从催化剂金属膜除去碳点以暴露催化剂金属膜（图1（d）），并生长 催化剂膜上的碳纳米管探针尖端（图1（e）中的16））。 碳探针尖端可以是直的，有角度的或急剧弯曲的，并具有各种技术应用。

    Carbon nanotube electron gun
    69.
    发明申请
    Carbon nanotube electron gun 有权
    碳纳米管电子枪

    公开(公告)号：US20080237483A1

    公开(公告)日：2008-10-02

    申请号：US11811674

    申请日：2007-06-11

    Applicant: Cattien V. Nguyen ,  Bryan P. Ribaya

    Inventor： Cattien V. Nguyen ,  Bryan P. Ribaya

    IPC: H01J37/073 ,  H01J37/06 ,  H01J9/02

    CPC classification number: H01J37/073 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/065 ,  H01J37/3174 ,  H01J2201/30469 ,  H01J2237/061 ,  H01J2237/0635 ,  H01J2237/26 ,  Y10S977/742

    Abstract: An electron gun, an electron source for an electron gun, an extractor for an electron gun, and a respective method for producing the electron gun, the electron source and the extractor are disclosed. Embodiments provide an electron source utilizing a carbon nanotube (CNT) bonded to a substrate for increased stability, reliability, and durability. An extractor with an aperture in a conductive material is used to extract electrons from the electron source, where the aperture may substantially align with the CNT of the electron source when the extractor and electron source are mated to form the electron gun. The electron source and extractor may have alignment features for aligning the electron source and the extractor, thereby bringing the aperture and CNT into substantial alignment when assembled. The alignment features may provide and maintain this alignment during operation to improve the field emission characteristics and overall system stability of the electron gun.

    Abstract translation: 公开了一种电子枪，电子枪用电子源，电子枪提取器，电子枪，电子源和提取器的制造方法。 实施例提供了利用结合到基板上的碳纳米管（CNT）的电子源，以提高稳定性，可靠性和耐久性。 使用具有导电材料中的孔的提取器从电子源提取电子，其中当提取器和电子源配合形成电子枪时，孔可以基本上与电子源的CNT对准。 电子源和提取器可以具有用于对准电子源和提取器的对准特征，从而在组装时使孔和CNT基本对准。 对准特征可以在操作期间提供并保持该对准，以改善电子枪的场发射特性和整体系统稳定性。

    Electron beam generator for multiple columns
    70.
    发明授权
    Electron beam generator for multiple columns 有权
    多列电子束发生器

    公开(公告)号：US07423390B2

    公开(公告)日：2008-09-09

    申请号：US11703848

    申请日：2007-02-08

    Applicant: Takamasa Sato

    Inventor： Takamasa Sato

    IPC: H01J37/06

    CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/06 ,  H01J37/304 ,  H01J2237/061

    Abstract: An electron beam generator for multiple columns includes: a plurality of cathodes, to which a single acceleration voltage supply applies a negative acceleration voltage, and which thus generates thermoelectrons; a grid for each of the plurality of cathodes, the grid converging the thermoelectrons emitted to form a beam of electrons; a grid voltage supply for giving the grid a potential which is negative relative to a potential of the cathode; and a control circuit for each cathode, for controlling the potential of the grid. The control circuit includes a current direction restricting element connected between a positive electrode of the grid voltage supply and the cathode, and a grid current supplied from the grid voltage supply is caused to flow to the cathode through the current direction restricting element.

    Abstract translation: 用于多列的电子束发生器包括：多个阴极，单个加速电压电源施加负加速电压，从而产生热电子; 用于多个阴极中的每一个的栅格，所述栅格会聚发射的热电子以形成电子束; 电网电压源，用于给予电网相对于阴极的电位为负的电位; 以及用于每个阴极的控制电路，用于控制电网的电位。 控制电路包括连接在电网电源的正电极和阴极之间的电流方向限制元件，并且通过电流方向限制元件使从电网电源供给的电网电流流向阴极。

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