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公开(公告)号：WO2022174991A1
公开(公告)日：2022-08-25
申请号：PCT/EP2022/050490
申请日：2022-01-12
Applicant: ASML NETHERLANDS B.V.
Inventor： SMORENBURG, Petrus, Wilhelmus , REININK, Johan , REIJNDERS, Marinus, Petrus , NIENHUYS, Han-Kwang , O'DWYER, David , ROOBOL, Sander, Bas , PORTER, Christina, Lynn , EDWARD, Stephen
Abstract: An assembly and method for separating first radiation and second radiation in the far field, wherein the first radiation and the second radiation have non-overlapping wavelengths, The assembly comprises a capillary structure, wherein the first radiation and the second radiation propagate coaxially along at least a portion of the capillary structure, and an optical structure configured to control the spatial distribution of the first radiation outside of the capillary structure, through interference, such that the intensity of the first radiation in the far field is reduced along an optical axis of the second radiation.
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公开(公告)号：WO2021180493A1
公开(公告)日：2021-09-16
申请号：PCT/EP2021/054953
申请日：2021-02-26
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN WEPEREN, Ilse , NIENHUYS, Han-Kwang , COENEN, Teis, Johan
IPC: G03F7/20
Abstract: Methods and apparatus for determining a parameter of a structure fabricated in or on a substrate and compensated for a drift error. The methods comprising: illuminating, at a plurality of times, at least part of the structure with electromagnetic radiation, the at least part of the structure being at a first orientation; sensing, at the plurality of times, a plurality of average reflectances of the at least part of the structure; and determining, based on the plurality of average reflectances, an estimation of the parameter at one or more further times.
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公开(公告)号：WO2017108311A1
公开(公告)日：2017-06-29
申请号：PCT/EP2016/078482
申请日：2016-11-23
Applicant: ASML NETHERLANDS B.V.
Inventor： BANINE, Vadim, Yevgenyevich , ENDENDIJK, Wilfred, Edward , NIENHUYS, Han-Kwang , DONKER, Rilpho, Ludovicus , LOOPSTRA, Erik, Roelof
CPC classification number: G03F7/70991 , G03F7/7005 , G03F7/70208 , H01S3/0903
Abstract: A system comprises a first radiation source configured to provide a first radiation beam, at least one splitter configured to split the first radiation beam into a first plurality of sub-beams, a second radiation source configured to provide a second radiation beam, at least one further splitter configured to split the second radiation beam into a second plurality of sub-beams, and a switch assembly, wherein the switch assembly is configured to receive a first sub-beam which is one of the first plurality of sub-beams; receive a second sub-beam which is one of the second plurality of sub-beams, in a first configuration to transmit the first sub-beam along a desired path, and in a second configuration to transmit the second sub-beam along said desired path.
Abstract translation: 系统包括配置成提供第一辐射束的第一辐射源，配置成将第一辐射束分成第一多个子束的第一分离器，配置成提供第二辐射束的第二辐射源， 第二辐射束，被配置为将第二辐射束分成第二多个子束的至少一个另外的分束器，以及开关组件，其中开关组件被配置为接收作为第一子束之一的第一子束 多个子光束; 以第一配置接收作为所述第二多个子束中的一个的第二子束，以沿期望路径传输所述第一子束，并且在第二配置中沿着所述期望路径传输所述第二子束
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公开(公告)号：WO2016155979A1
公开(公告)日：2016-10-06
申请号：PCT/EP2016/054764
申请日：2016-03-07
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/70316 , G02B5/10 , G02B26/0816 , G02B26/10 , G03F7/702
Abstract: An optical element comprises a body and at least one reflective surface provided on the body for receiving a radiation beam so as to form a beam spot region and a reflected radiation beam, wherein the body is generally disc-shaped and is configured to be moved by a movement mechanism such that the beam spot region periodically moves over the reflective surface, and the at least one reflective surface comprises an at least partially paraboloid surface.
Abstract translation: 光学元件包括主体和设置在主体上的至少一个反射表面，用于接收辐射束，以便形成束点区域和反射辐射束，其中主体大致为圆盘形并且被构造成通过 移动机构，使得束斑区域周期性地在反射表面上移动，并且所述至少一个反射表面包括至少部分抛物面。
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公开(公告)号：WO2016150612A2
公开(公告)日：2016-09-29
申请号：PCT/EP2016/052818
申请日：2016-02-10
Applicant: ASML NETHERLANDS B.V.
Inventor： NIENHUYS, Han-Kwang
CPC classification number: G02B5/10 , G02B17/0892 , G02B19/0004 , G02B19/0023 , G02B26/0816 , G03F7/70058
Abstract: A radiation beam expander comprises a diverging optic and a converging optic. The diverging optic comprises one or more mirrors for receiving a radiation beam and increasing a divergence of the radiation beam. The converging optic comprising one or more mirrors arranged to receive the radiation beam and to reduce the divergence of the radiation beam. At least one of the one or more mirrors of the diverging optic and/or the converging optic is provided with an actuator arranged to control a curvature of the mirror. This allows the optical power of the diverging optic and/or the converging optic to be controlled independently of the angle at which a radiation beam is incident on the mirrors of said diverging optic or the converging optic. This allows the radiation beam expander to control the divergence of the radiation beam after the diverging and converging optics independently of the orientations and relative positions of the mirrors of the diverging and converging optics.
Abstract translation: 辐射光束扩展器包括发散光学部件和会聚光学部件。 发散光学器件包括用于接收辐射束并增加辐射束发散的一个或多个反射镜。 会聚光学器件包括一个或多个反射镜，其布置成接收辐射束并减小辐射束的发散。 发散光学器件和/或会聚光学器件的一个或多个反射镜中的至少一个设置有用于控制反射镜曲率的致动器。 这允许发散光学器件和/或会聚光学器件的光功率独立于辐射光束入射在所述发散光学器件或会聚光学器件的反射镜上的角度而被控制。 这允许辐射光束扩展器独立于发散和会聚光学器件的反射镜的取向和相对位置来控制发散和会聚光学器件之后的辐射束的发散。
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Patent Agency Ranking
公开(公告)号：WO2016139055A2
公开(公告)日：2016-09-09
申请号：PCT/EP2016/053216
申请日：2016-02-16
Applicant: ASML NETHERLANDS B.V.
Inventor： NIENHUYS, Han-Kwang , BOGAART, Erik, Willem , DONKER, Rilpho, Ludovicus , KRUIZINGA, Borgert , LOOPSTRA, Erik, Roelof , BOTMA, Hako , DE VRIES, Gosse, Charles , FRIJNS, Olav, Waldemar, Vladimir , BASELMANS, Johannes, Jacobus, Matheus
IPC: G03F7/20
CPC classification number: G03F7/70191 , G02B5/0221 , G02B5/0268 , G02B5/0284 , G03F7/70025 , G03F7/7005 , G03F7/70075 , G03F7/70991 , H01S3/2308 , H05G2/008
Abstract: A radiation system comprising a beam splitting apparatus configured to receive a main radiation beam and split the main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.
Abstract translation: 包括配置成接收主辐射束并将主辐射束分成多个分支辐射束的分束装置和配置成接收输入辐射束并输出辐射的辐射改变装置的辐射系统， 修改的辐射束，其中所述辐射改变装置被配置为提供输出的改进的辐射束，所述输出的改进的辐射束在与所接收的输入辐射束相比时具有增加的集光率，其中所述辐射改变装置被布置成使得所接收的输入辐射束 通过所述辐射改变装置是主辐射束并且所述辐射改变装置被配置为向所述分束装置提供改变的主辐射束，或者其中所述辐射改变装置被设置成使得由所述辐射接收的所述输入辐射束 改变装置是从分束装置输出的分支辐射束。
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公开(公告)号：WO2016134892A2
公开(公告)日：2016-09-01
申请号：PCT/EP2016/051174
申请日：2016-01-21
Applicant: ASML NETHERLANDS B.V.
Inventor： DE VRIES, Gosse, Charles , DONKER, Rilpho, Ludovicus , NIENHUYS, Han-Kwang , VAN OOSTEN, Anton, Bernhard , KRUIZINGA, Borgert
CPC classification number: G03F7/70158 , G02B5/1861 , G02B27/4222 , G02B27/4255 , G03F7/702 , G03F7/70558 , G03F7/70991
Abstract: An apparatus for receiving an input radiation beam at a beam receiving location and outputting from the beam receiving location one or more output radiation beams. The apparatus comprises: an optical element; and a movement mechanism. The optical element comprises a plurality of portions for receiving the input radiation beam. The movement mechanism is operable to move the plurality of portions so as selectively position each of the plurality of portions at the beam receiving location. When one of the plurality of portions is disposed in the beam receiving location it is configured to receive the input radiation beam and to scatter the input radiation beam so as to form the one or more output radiation beams. A direction of each of the one or more output radiation beams formed by each of the plurality of portions is substantially the same as a direction of a corresponding output radiation beam formed by each of the other portions. One or more properties of each of the plurality of portions differs from that of the other portions such that a power of at least one of the one or more output radiation beams formed by each of the plurality of portions is different to that of the corresponding output radiation beam formed by at least one of the other portions.
Abstract translation: 一种用于在光束接收位置接收输入辐射光束并从光束接收位置输出一个或多个输出辐射光束的设备。 该设备包括：光学元件; 和一个运动机制。 光学元件包括用于接收输入辐射束的多个部分。 移动机构可操作以移动多个部分，从而选择性地将多个部分中的每一个定位在光束接收位置处。 当多个部分中的一个部分布置在光束接收位置时，其被配置为接收输入辐射束并散射输入辐射束以形成一个或多个输出辐射束。 由多个部分中的每一个形成的一个或多个输出辐射束中的每一个的方向基本上与由其他部分中的每一个形成的对应的输出辐射束的方向相同。 多个部分中的每个部分的一个或多个特性不同于其他部分的特性，使得由多个部分中的每个部分形成的一个或多个输出辐射束中的至少一个的功率不同于对应输出 辐射束由至少一个其他部分形成。
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公开(公告)号：WO2014020003A1
公开(公告)日：2014-02-06
申请号：PCT/EP2013/065947
申请日：2013-07-30
Applicant: ASML NETHERLANDS B.V.
Inventor： BANINE, Vadim , MINNAERT, Arthur , MUITJENS, Marcel , YAKUNIN, Andrei , SCACCABAROZZI, Luigi , MALLMANN, Hans , BAL, Kursat , LUIJTEN, Carlo , NIENHUYS, Han-Kwang , HUIJBERTS, Alexander , GASSELING, Paulus , RIZO DIAGO, Pedro , VAN KAMPEN, Maarten , VAN AERLE, Nick
CPC classification number: G03F7/70191 , G03F7/70308 , G03F7/70575 , G21K1/10
Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which is provided in the projection system (PSW) and adjacent the substrate table (WT). The spectral purity filter is preferably a membrane (14) formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.
Abstract translation: 公开了一种设置有光谱纯度滤光片的光刻设备，其设置在投影系统（PSW）中并且邻近衬底台（WT）。 光谱纯度滤光片优选为由多晶硅，多层材料，碳纳米管材料或石墨烯形成的膜（14）。 膜可以设置有保护性盖层和/或薄金属透明层。
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公开(公告)号：WO2021180540A1
公开(公告)日：2021-09-16
申请号：PCT/EP2021/055316
申请日：2021-03-03
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN WEPEREN, Ilse , NIENHUYS, Han-Kwang , COENEN, Teis, Johan
IPC: G03F7/20
Abstract: Methods and apparatus for determining a parameter of a structure fabricated in or on a substrate and compensated for a drift error. The methods comprising: illuminating, at a plurality of times, at least part of the structure with electromagnetic radiation, the at least part of the structure being at a first orientation; sensing, at the plurality of times, a plurality of average reflectances of the at least part of the structure; and determining, based on the plurality of average reflectances, an estimation of the parameter at one or more further times.
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公开(公告)号：WO2021078534A1
公开(公告)日：2021-04-29
申请号：PCT/EP2020/078350
申请日：2020-10-09
Applicant: ASML NETHERLANDS B.V.
Inventor： NIKIPELOV, Andrey , BANINE, Vadim, Yevgenyevich , BLOM, Sander , DE VRIES, Gosse, Charles , NIENHUYS, Han-Kwang , SBRIZZAI, Fabio
Abstract: A membrane cleaning apparatus for removing particles from a membrane comprises: a membrane support; a controlled environment chamber and cleaning substance delivery mechanism. The particles of the cleaning substance delivered to membrane sublime in the controlled environment without leaving residue. The combination of masks, apertures and gas drag in the controlled environment allow to provide cleaning substance particles with speed in the range about 1-100 m/s (preferably about 3-30 m/s) and size in the range about 1-100 um (preferably 1-10 um) to the membrane, such that two-phase flow cleans but does not rupture the thin and fragile membrane.
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