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公开(公告)号：WO2017186486A1
公开(公告)日：2017-11-02
申请号：PCT/EP2017/058721
申请日：2017-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , LENDERINK, Egbert , MAXIM, Nicolae , NIKIPELOV, Andrey , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , PÉTER, Mária , RISPENS, Gijsbert , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , ZDRAVKOV, Alexandar, Nikolov
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
Abstract translation: 公开了用于EUV光刻的膜。 在一种布置中，膜包括具有以下顺序的层的堆叠体：包含第一金属的氧化物的第一封盖层; 基层，其包含含有第二金属和选自Si，B，C和N的附加元素的化合物; 以及包含第三金属的氧化物的第二覆盖层，其中第一金属不同于第二金属，第三金属与第一金属相同或不同。
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公开(公告)号：WO2015044182A2
公开(公告)日：2015-04-02
申请号：PCT/EP2014/070335
申请日：2014-09-24
Applicant: ASML NETHERLANDS B.V.
Inventor： BANINE, Vadim , BARTRAIJ, Petrus , VAN GORKOM, Ramon , AMENT, Lucas , DE JAGER, Pieter , DE VRIES, Gosse , DONKER, Rilpho , ENGELEN, Wouter , FRIJNS, Olav , GRIMMINCK, Leonardus , KATALENIC, Andelko , LOOPSTRA, Erik , NIENHUYS, Han-Kwang , NIKIPELOV, Andrey , RENKENS, Michael , JANSSEN, Franciscus , KRUIZINGA, Borgert
IPC: G03F7/20
CPC classification number: G21K1/067 , G01N2021/95676 , G02B5/1814 , G02B5/1823 , G02B5/1838 , G02B5/1861 , G02B27/0025 , G02B27/0938 , G02B27/10 , G02B27/1086 , G02B27/12 , G02B27/14 , G02B27/142 , G02B27/146 , G02B27/4272 , G03F1/84 , G03F7/70025 , G03F7/70208 , G03F7/70566 , G03F7/70891 , G03F7/70991 , G21K2201/065 , H01S3/0903 , H05H7/04
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
Abstract translation:
在光刻系统内使用的传送系统。 该光束输送系统包括光学元件，该光学元件被布置成接收来自辐射源的辐射束并沿一个或多个方向反射辐射的部分以形成一个或多个分支辐射束以提供给一个或多个工具。
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公开(公告)号：WO2022042993A1
公开(公告)日：2022-03-03
申请号：PCT/EP2021/071266
申请日：2021-07-29
Applicant: ASML NETHERLANDS B.V.
Inventor： BANINE, Vadim, Yevgenyevich , VERMEULEN, Paul, Alexander , DE MEIJERE, Cornelis, Adrianus , MOORS, Johannes, Hubertus, Josephina , NIKIPELOV, Andrey , SALMASO, Guido , VAN DE KERKHOF, Marcus, Adrianus , YAGHOOBI, Parham
Abstract: An apparatus for reducing a partially oxidized reticle and pellicle assembly comprises: a support; a hydrogen supply; and an electron source. The support is for supporting a reticle and pellicle assembly. The hydrogen supply is operable to supply hydrogen in the vicinity of to a pellicle of a reticle and pellicle assembly when supported by the support. The electron source is operable to direct electrons so as to be incident on a pellicle of a reticle and pellicle assembly when supported by the support.
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14.发明申请
公开(公告)号：WO2021148224A1
公开(公告)日：2021-07-29
申请号：PCT/EP2020/087889
申请日：2020-12-24
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Inventor： ALBRIGHT, Ronald, Peter , BAL, Kursat , BANINE, Vadim, Yevgenyevich , BRULS, Richard, Joseph , DE VRIES, Sjoerd, Frans , FRIJNS, Olav, Waldemar, Vladimir , HUANG, Yang-Shan , HUANG, Zhuangxiong , JACOBS, Johannes, Henricus, Wilhelmus , MOORS, Johannes, Hubertus, Josephina , NENCHEV, Georgi, Nenchev , NIKIPELOV, Andrey , RAASVELD, Thomas, Maarten , RANJAN, Manish , TE SLIGTE, Edwin , UMSTADTER, Karl, Robert , UZGÖREN, Eray , VAN DE KERKHOF, Marcus, Adrianus , YAGHOOBI, Parham
IPC: G03F7/20 , H05G2/00 , G03F7/70033 , G03F7/70058 , G03F7/70916 , H05G2/008
Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.
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公开(公告)号：WO2021078534A1
公开(公告)日：2021-04-29
申请号：PCT/EP2020/078350
申请日：2020-10-09
Applicant: ASML NETHERLANDS B.V.
Inventor： NIKIPELOV, Andrey , BANINE, Vadim, Yevgenyevich , BLOM, Sander , DE VRIES, Gosse, Charles , NIENHUYS, Han-Kwang , SBRIZZAI, Fabio
Abstract: A membrane cleaning apparatus for removing particles from a membrane comprises: a membrane support; a controlled environment chamber and cleaning substance delivery mechanism. The particles of the cleaning substance delivered to membrane sublime in the controlled environment without leaving residue. The combination of masks, apertures and gas drag in the controlled environment allow to provide cleaning substance particles with speed in the range about 1-100 m/s (preferably about 3-30 m/s) and size in the range about 1-100 um (preferably 1-10 um) to the membrane, such that two-phase flow cleans but does not rupture the thin and fragile membrane.
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Patent Agency Ranking
公开(公告)号：WO2021073799A1
公开(公告)日：2021-04-22
申请号：PCT/EP2020/073669
申请日：2020-08-25
Applicant: ASML NETHERLANDS B.V.
Inventor： NIKIPELOV, Andrey , KURILOVICH, Dmitry
Abstract: A membrane cleaning apparatus for removing particles from a membrane comprises: a membrane support for supporting the membrane; and a pressure pulse generating mechanism including one or more laser energy sources configured to generate a pressure pulse in a gas. The one or more energy laser sources may be focused to generate a pressure pulse in a gaseous atmosphere. The pressure pulse serves to dislodge particles on the membrane.
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17.发明申请
公开(公告)号：WO2018114229A1
公开(公告)日：2018-06-28
申请号：PCT/EP2017/080472
申请日：2017-11-27
Applicant: ASML NETHERLANDS B.V.
Inventor： NIKIPELOV, Andrey , BANINE, Vadim, Yevgenyevich , KLUGKIST, Joost, André , NASALEVICH, Maxim, Aleksandrovich , STAS, Roland, Johannes, Wilhelmus , WRICKE, Sandro
IPC: G03F7/20
Abstract: A lithographic apparatus comprising: an object, the object comprising: a substrate and optionally a lower layer on the substrate; an upper layer; and an intermediate layer between the upper layer and the substrate, wherein a bond strength between the intermediate layer and the substrate or lower layer being greater than a bond strength between the intermediate layer and the upper layer and the intermediate layer has a Young's Modulus and/or a Poisson ratio within 20% of that of the upper layer.
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公开(公告)号：WO2020109152A1
公开(公告)日：2020-06-04
申请号：PCT/EP2019/082184
申请日：2019-11-22
Applicant: ASML NETHERLANDS B.V.
Inventor： NIKIPELOV, Andrey , KURILOVICH, Dmitry , SBRIZZAI, Fabio , VAN DE KERKHOF, Marcus, Adrianus , VAN DER WOORD, Ties, Wouter , VAN DER ZANDE, Willem, Joan , VAN DUIVENBODE, Jeroen , VLES, David, Ferdinand
Abstract: A membrane cleaning apparatus for removing particles from a membrane comprises: a membrane support; and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may comprise: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.
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公开(公告)号：WO2020078625A1
公开(公告)日：2020-04-23
申请号：PCT/EP2019/074447
申请日：2019-09-13
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DE KERKHOF, Marcus, Adrianus , NIKIPELOV, Andrey , VAN ZWOL, Pieter-Jan , DE WINTER, Laurentius, Cornelius , ENGELEN, Wouter, Joep , POLYAKOV, Alexey, Olegovich
Abstract: A first diffusor configured to receive and transmit radiation comprises a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation comprises: a first layer and a second layer. The first layer is formed from a first material, the first layer comprising a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also comprises a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusor first and second diffusors may be configured to receive and transmit EUV radiation.
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公开(公告)号：WO2020064217A1
公开(公告)日：2020-04-02
申请号：PCT/EP2019/072112
申请日：2019-08-19
Applicant: ASML NETHERLANDS B.V.
Inventor： NIKIPELOV, Andrey , VAN DE KERKHOF, Marcus, Adrianus , CASIMIRI, Eric, Willem, Felix , SALVATORE, Stefano
Abstract: A system for securing a particle to a pellicle membrane for subsequent use in a lithographic apparatus, the system comprising a particle securement device configured to secure the particle to the pellicle membrane. The particle securement device is configured to direct the electron beam or the radiation beam such that the electron beam or the radiation beam passes through the pellicle membrane before being incident on the particle.
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