公开(公告)号：NL2009210A

公开(公告)日：2013-02-19

申请号：NL2009210

申请日：2012-07-20

Applicant: ASML NETHERLANDS BV

Inventor： JAGER PIETER ,  BANINE VADIM ,  BLEEKER ARNO ,  SCHOOT HARMEN ,  STEVENS LUCAS ,  VERMEULEN JOHANNES ,  WUISTER SANDER

IPC: G03F7/20

公开(公告)号：NL2008426A

公开(公告)日：2012-10-09

申请号：NL2008426

申请日：2012-03-07

Applicant: ASML NETHERLANDS BV

Inventor： JAGER PIETER ,  BANINE VADIM ,  ONVLEE JOHANNES ,  STEVENS LUCAS ,  WUISTER SANDER ,  IOSAD NIKOLAY

IPC: G03F7/20

公开(公告)号：NL2006261A

公开(公告)日：2011-08-29

申请号：NL2006261

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： ONVLEE JOHANNES ,  JAGER PIETER ,  ZWET ERWIN

IPC: G03F7/20

公开(公告)号：NL2006259A

公开(公告)日：2011-08-24

申请号：NL2006259

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： MULCKHUYSE WOUTER ,  JAGER PIETER ,  ONVLEE JOHANNES ,  ZWET ERWIN

IPC: G03F7/20

公开(公告)号：NL2006258A

公开(公告)日：2011-08-24

申请号：NL2006258

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： ZWET ERWIN ,  JAGER PIETER ,  ONVLEE JOHANNES ,  FRITZ ERIK

IPC: G03F7/20

公开(公告)号：NL2010204A

公开(公告)日：2013-10-15

申请号：NL2010204

申请日：2013-01-30

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO ,  CASTENMILLER THOMAS ,  JAGER PIETER ,  MULDER HEINE ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA ,  PHILIPS DANNY ,  BEERENS RUUD ,  TIMMERMANS ROGER

IPC: G03F7/20 ,  H01L21/68

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.

公开(公告)号：NL2007918A

公开(公告)日：2012-06-21

申请号：NL2007918

申请日：2011-12-02

Applicant: ASML NETHERLANDS BV

Inventor： MULCKHUYSE WOUTER ,  ZWET ERWIN ,  JAGER PIETER

IPC: G03F7/20

公开(公告)号：NL2007789A

公开(公告)日：2012-06-11

申请号：NL2007789

申请日：2011-11-15

Applicant: ASML NETHERLANDS BV

Inventor： ZWET ERWIN ,  JAGER PIETER ,  ONVLEE JOHANNES ,  MAN HENDRIK

IPC: G03F7/20

Abstract: A system to control the focus of a mask-less lithographic apparatus, the apparatus including a projection system to project an image of a programmable patterning device onto a substrate. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is configured to project an image of the programmable patterning device onto the at least one lens. A second actuator system is configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate.

公开(公告)号：NL2006260A

公开(公告)日：2011-08-24

申请号：NL2006260

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： ONVLEE JOHANNES ,  JAGER PIETER ,  ZWET ERWIN

IPC: G03F7/20

Abstract: A lithographic apparatus includes two or more optical columns configured to project a beam on a target portion of a substrate, each of the two or more optical columns including one or more radiation sources (906) to provide the beam, and a projection system (920, 924, 930) to project the beam onto the target portion; a scanning movement actuator configured to move the substrate with a scanning speed in a scanning direction with respect to the two or more optical columns; and two or more position measurement devices (944) configured to determine a position of the respective two or more optical columns with respect to a reference object (940).

公开(公告)号：NL2006257A

公开(公告)日：2011-08-24

申请号：NL2006257

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： ZWET ERWIN ,  JAGER PIETER ,  ONVLEE JOHANNES ,  FRITZ ERIK ,  DEKKER ALBERT ,  SPIERDIJK JOHANNUS PETRUS FRANSISCUS ,  MAN HENDRIK

IPC: G03F7/20