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公开(公告)号：CA3008050A1
公开(公告)日：2017-06-22
申请号：CA3008050
申请日：2016-12-02
Applicant: ASML NETHERLANDS BV
Inventor： BROUNS DERK SERVATIUS GERTRUDA , JANSSEN PAUL , KAMALI MOHAMMAD REZA , PETER MARIA , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
Abstract: A membrane assembly (80) for EUV lithography, the membrane assembly comprising: a planar membrane (40); a border (81) configured to hold the membrane; and a frame assembly (50) connected to the border and configured to attach to a patterning device (MA) for EUV lithography; wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
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公开(公告)号：CA3021916A1
公开(公告)日：2017-11-02
申请号：CA3021916
申请日：2017-04-12
Applicant: ASML NETHERLANDS BV
Inventor： NASALEVICH MAXIM ALEKSANDROVICH , ABEGG ERIK ACHILLES , BANERJEE NIRUPAM , BLAUW MICHIEL ALEXANDER , BROUNS DERK SERVATIUS GERTRUDA , JANSSEN PAUL , KRUIZINGA MATTHIAS , LENDERINK EGBERT , MAXIM NICOLAE , NIKIPELOV ANDREY , NOTENBOOM ARNOUD WILLEM , PILIEGO CLAUDIA , PETER MARIA , RISPENS GIJSBERT , SCHUH NADJA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERBURG ANTONIUS WILLEM , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID , VOORTHUIJZEN WILLEM-PIETER , ZDRAVKOV ALEKSANDAR NIKOLOV
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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公开(公告)号：CA3008474A1
公开(公告)日：2017-06-22
申请号：CA3008474
申请日：2016-12-02
Applicant: ASML NETHERLANDS BV
Inventor： VAN ZWOL PIETER-JAN , DE GRAAF DENNIS , JANSSEN PAUL , PETER MARIA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and comprising a stack comprising: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine
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公开(公告)号：CA2997135A1
公开(公告)日：2017-03-09
申请号：CA2997135
申请日：2016-08-26
Applicant: ASML NETHERLANDS BV
Inventor： HOUWELING ZOMER SILVESTER , CASIMIRI ERIC WILLEM FELIX , DRUZHININA TAMARA , JANSSEN PAUL , KUIJKEN MICHAEL ALFRED JOSEPHUS , LEENDERS MARTINUS HENDRIKUS ANTONIUS , OOSTERHOFF SICCO , PETER MARIA , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
IPC: G03F1/62
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
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