公开(公告)号：NL1035816A1

公开(公告)日：2009-03-16

申请号：NL1035816

申请日：2008-08-12

Applicant: ASML NETHERLANDS BV

Inventor： BERKVENS PAUL PETRUS JOANNES ,  GRAAF ROELOF FREDERIK DE ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HAM RONALD VAN DER ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG126922A1

公开(公告)日：2006-11-29

申请号：SG200602941

申请日：2006-05-02

Applicant: ASML NETHERLANDS BV

Inventor： STREEFKER BOB ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  GRAAF DE ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS A ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MERTENS JEROEN JOHANNES SOPHIA ,  TOORN VAN DER JAN-GERARD C ,  RIEPEN MICHEL

公开(公告)号：NL1036253A1

公开(公告)日：2009-06-11

申请号：NL1036253

申请日：2008-11-28

Applicant: ASML NETHERLANDS BV

Inventor： STEFFENS KOEN ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HAM RONALD VAN DER ,  DIRECKS DANIEL JOZEF MARIA ,  BRANDS GERT-JAN GERARDUS JOHAN

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：SG147422A1

公开(公告)日：2008-11-28

申请号：SG2008075251

申请日：2006-05-02

Applicant: ASML NETHERLANDS BV

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  DE GRAAF ROELOF FREDERIK ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  VAN DER TOORN JAN-GERARD CORNELIS ,  RIEPEN MICHEL

Abstract: Lithographic Apparatus and Device Manufacturing Method An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.