-
21.发明专利
公开(公告)号：NL2003396A
公开(公告)日：2010-03-29
申请号：NL2003396
申请日：2009-08-26
Applicant: ASML NETHERLANDS BV , KONINK PHILIPS ELECTRONICS B V
Inventor： SOER WOUTER , YAKUNIN ANDREI , JAK MARTIN , MATHEW DENNY , KETTELARIJ HENK , HEUVEL ERIC , KUIJPERS PETER
Abstract: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures configured to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. Each aperture has been manufactured by an anisotropic etching process.
-
22.发明专利
公开(公告)号：NL2013557A
公开(公告)日：2014-12-01
申请号：NL2013557
申请日：2014-10-02
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY , BOOGAARD ARJEN , KUZNETSOV ALEXEY , YAKUNIN ANDREI
IPC: G03F7/20
-
公开(公告)号：NL2012861A
公开(公告)日：2014-07-10
申请号：NL2012861
申请日：2014-05-22
Applicant: ASML NETHERLANDS BV
Inventor： NIKIPELOV ANDREY , IVANOV VLADIMIR , SEROGLAZOV PAVEL , YAKUNIN ANDREI
-
公开(公告)号：NL2011533A
公开(公告)日：2014-05-06
申请号：NL2011533
申请日：2013-10-01
Applicant: ASML NETHERLANDS BV
Inventor： GREEVENBROEK HENDRIKUS , BADIE RAMIN , BANINE VADIM , DIJKSMAN JOHAN , KEMPEN ANTONIUS , YAKUNIN ANDREI , WINKELS KOEN GERHARDUS
-
公开(公告)号：SG186072A1
公开(公告)日：2013-01-30
申请号：SG2012086955
申请日：2011-03-17
Applicant: ASML NETHERLANDS BV
Inventor： YAKUNIN ANDREI , BANINE VADIM , LOOPSTRA ERIK , VAN DER SCHOOT HARMEN , STEVENS LUCAS , VAN KAMPEN MAARTEN
Abstract: A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane (44) is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles (54) through the membrane. A particle trapping structure (52) is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles (58) from inside the chamber to outside the chamber.
-
Patent Agency Ranking
公开(公告)号：SG183528A1
公开(公告)日：2012-10-30
申请号：SG2012063822
申请日：2011-02-03
Applicant: ASML NETHERLANDS BV
Inventor： MEDVEDEV VIACHESLAV , BANINE VADIM , KRIVTSUN VLADIMIR , SOER WOUTER , YAKUNIN ANDREI
Abstract: A reflector includes a multi layer mirror structure configured to reflect radiation at a first wavelength, and one or more additional layers. The absorbance and refractive index at a second wavelength of the multi layer mirror structure and the one or more additional layers, and the thickness of the multi layer mirror structure and the one or more additional layers, are configured such that radiation of the second wavelength which is reflected from a surface of the reflector interferes in a destructive manner with radiation of the second wavelength which is reflected from within the reflector.
-
公开(公告)号：NL2007853A
公开(公告)日：2011-12-19
申请号：NL2007853
申请日：2011-11-24
Applicant: ASML NETHERLANDS BV
-
公开(公告)号：NL2005833A
公开(公告)日：2011-01-10
申请号：NL2005833
申请日：2010-12-08
Applicant: ASML NETHERLANDS BV
Inventor： KRIVTSUN VLADIMIR , YAKUNIN ANDREI , MEDVEDEV VIACHESLAV
IPC: G03F7/20
-
公开(公告)号：NL2004994A
公开(公告)日：2010-08-09
申请号：NL2004994
申请日：2010-06-29
Applicant: ASML NETHERLANDS BV
Inventor： TIMOSHKOV VADIM , YAKUNIN ANDREI , OSORIO OLIVEROS EDGAR
-
公开(公告)号：NL2004969A
公开(公告)日：2010-08-02
申请号：NL2004969
申请日：2010-06-25
Applicant: ASML NETHERLANDS BV
Inventor： BANINE VADIM , LABETSKI DZMITRY , YAKUNIN ANDREI
-
-
-
-
-
-
-
-
-
Search Results
53
records
(took 0.022 seconds)
