公开(公告)号：DE3672469D1

公开(公告)日：1990-08-09

申请号：DE3672469

申请日：1986-11-18

Applicant: IBM

Inventor： FRECHET JEAN M J ,  ITO HIROSHI ,  MACDONALD SCOTT ARTHUR ,  WILLSON CARLTON GRANT

IPC: G03C5/00 ,  G03F7/039 ,  G03F7/26 ,  G03F7/30 ,  G03F7/36 ,  G03F7/38 ,  H01L21/027

公开(公告)号：DE3272766D1

公开(公告)日：1986-09-25

申请号：DE3272766

申请日：1982-11-23

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  MCKEAN DENNIS RICHARD ,  MILLER ROBERT DENNIS ,  TOMPKINS TERRY CADY ,  TWIEG ROBERT JAMES ,  WILLSON CARLTON GRANT

IPC: G03C1/72 ,  C08L61/00 ,  C08L61/04 ,  G03F7/022 ,  H01L21/027 ,  G03F7/08

Abstract: Positive resists are formed from a soluble phenolic resin and a sensitizer which is a diester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diastereoisomers.

公开(公告)号：DE3272761D1

公开(公告)日：1986-09-25

申请号：DE3272761

申请日：1982-11-10

Applicant: IBM

Inventor： CHENG YING YING ,  GRANT BARBARA DIANNE ,  PEDERSON LESTER ARLYN ,  WILLSON CARLTON GRANT

IPC: G03F7/26 ,  C08L61/00 ,  C08L61/04 ,  C08L61/06 ,  C08L61/10 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/10

Abstract: A resist sensitive to electron beam (and x-ray) radiation but resistant to reactive ion etching is formulated from a novolac resin and a sensitizer which is a terpolymer of sulfur dioxide, an olefinic hydrocarbon and an unsaturated ether.

公开(公告)号：AU551589B2

公开(公告)日：1986-05-08

申请号：AU8189882

申请日：1982-03-25

Applicant: IBM

Inventor： JAIN KANTILAL ,  WILLSON CARLTON GRANT

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/30 ,  H01S3/30 ,  G03F7/02 ,  H01S3/22

公开(公告)号：DE3264735D1

公开(公告)日：1985-08-22

申请号：DE3264735

申请日：1982-03-25

Applicant: IBM

Inventor： JAIN KANTILAL ,  WILLSON CARLTON GRANT

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/30 ,  H01S3/30 ,  H01L21/268 ,  G02B27/00 ,  G02F2/02 ,  G03F7/26

公开(公告)号：DE69230684T2

公开(公告)日：2000-08-17

申请号：DE69230684

申请日：1992-10-23

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  WILLSON CARLTON GRANT ,  MCDONALD SCOTT ARTHUR ,  CONLEY WILLARD EARL ,  KWONG RANEE WAI-LING ,  SCHLOSSER HUBERT ,  LINEHAN LEO LAWRENCE ,  SACHDEV HARBANS SINGH

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  G03F7/039 ,  G03F7/26 ,  G03F7/36 ,  G03F7/38 ,  H01L21/027 ,  H01L21/30

Abstract: Dry developable top surface imageable photoresist compositions which comprise, in admixture, a film-forming aromatic polymer resin activated to electrophilic substitution, an acid catalyzable agent capable of bing inserted into the aromatic polymer resin, and a radiation degradable acid generating compound and processes for generating positive tone resist images on substrates therewith.

公开(公告)号：DE69230684D1

公开(公告)日：2000-03-23

申请号：DE69230684

申请日：1992-10-23

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  WILLSON CARLTON GRANT ,  MCDONALD SCOTT ARTHUR ,  CONLEY WILLARD EARL ,  KWONG RANEE WAI-LING ,  SCHLOSSER HUBERT ,  LINEHAN LEO LAWRENCE ,  SACHDEV HARBANS SINGH

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  G03F7/039 ,  G03F7/26 ,  G03F7/36 ,  G03F7/38 ,  H01L21/027 ,  H01L21/30

Abstract: Dry developable top surface imageable photoresist compositions which comprise, in admixture, a film-forming aromatic polymer resin activated to electrophilic substitution, an acid catalyzable agent capable of bing inserted into the aromatic polymer resin, and a radiation degradable acid generating compound and processes for generating positive tone resist images on substrates therewith.

公开(公告)号：DE69301999T2

公开(公告)日：1996-10-10

申请号：DE69301999

申请日：1993-11-22

Applicant: IBM

Inventor： CAMERON JAMES FIELD ,  FRECHET JEAN M J ,  LEUNG MAN-KIT ,  NIESERT CLAUS-PETER ,  MACDONALD SCOTT ARTHUR ,  WILLSON CARLTON GRANT

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: Provided is an improved lithographic photoresist composition comprising a photosensitive base generator. The composition is useful in the manufacture of integrated circuits.

公开(公告)号：DE3750937T2

公开(公告)日：1995-07-13

申请号：DE3750937

申请日：1987-06-16

Applicant: IBM

Inventor： BRUNSVOLD WILLIAM ROSS ,  CROCKATT DALE MURRAY ,  CHOW MING-FEA ,  FRECHET JEAN-MARIE JOSEPH ,  CONLEY WILLARD EARL ,  HEFFERSON GEORGE JOSEPH ,  ITO HIROSHI ,  IWAMOTO NANCY ELLEN ,  WILLSON CARLTON GRANT

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

公开(公告)号：ES2065882T3

公开(公告)日：1995-03-01

申请号：ES87108644

申请日：1987-06-16

Applicant: IBM

Inventor： BRUNSVOLD WILLIAM ROSS ,  CROCKATT DALE MURRAY ,  CHOW MING-FEA ,  FRECHET JEAN-MARIE JOSEPH ,  CONLEY WILLARD EARL ,  HEFFERSON GEORGE JOSEPH ,  ITO HIROSHI ,  IWAMOTO NANCY ELLEN ,  WILLSON CARLTON GRANT

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027