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公开(公告)号：DE112014004266T5
公开(公告)日：2016-06-23
申请号：DE112014004266
申请日：2014-08-01
Applicant: IBM
Inventor： ALLEN ROBERT DAVID , BAJJURI KRISHNA MOHAN , BREYTA GREGORY , HEDRICK JAMES LUPTON , LARSON CARL ERIC
Abstract: Vorgesehen wird ein Verfahren zur Depolymerisation von Polyester aus gebrauchten Produkten, wie Getränkeflaschen, zur Herstellung eines hochreinen Reaktionsprodukts. Für die Depolymerisationsreaktion werden die Polyester mit einem Alkohol mit 2 bis 5 Kohlenstoffen und einem Amin-Organokatalysator bei einer Temperatur von etwa 150 °C bis etwa 250 °C miteinander reagiert. In einer Anwendung ermöglicht die Verwendung eines Organokatalysators mit einem Siedepunkt, der wesentlich unter dem Siedepunkt des Alkohol-Reaktants liegt, das einfache Recycling des Amin-Organokatalysators. In einer anderen Anwendung ermöglicht die Durchführung der Depolymerisationsreaktion unter Druck bei einer Temperatur über der des Alkohols beschleunigte Depolymerisationsraten und die Rückgewinnung des Organokatalysators ohne weitere Wärmezufuhr. In einer weiteren Anwendung erzeugt die glykolitische Depolymerisation von Poly(ethylenterephthalat)(PET) aus gebrauchten Getränkeflaschen ein reines Reaktionsprodukt von Bis(2-hydroxyethyl)terephthalat (BHET), was wiederum zur Herstellung eines hochreinen PET in Getränkeflaschenqualität verwendet werden kann, in einem Closed Loop-Prozess mit minimalem Ausstoß und Abfall.
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公开(公告)号：GB2485283B
公开(公告)日：2014-11-26
申请号：GB201119451
申请日：2010-08-23
Applicant: IBM
Inventor： NELSON ALSHAKIM , BROCK PHILLIP JOE , SOORIYAKUMARAN RATNAM , DAVIS BLAKE , MILLER ROBERT DENNIS , ALLEN ROBERT DAVID , LIN QINGHUANG
IPC: C09D183/04 , C08G77/04 , C08L83/04 , C09D183/14 , H01L21/312
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公开(公告)号：GB2487129A
公开(公告)日：2012-07-11
申请号：GB201200145
申请日：2010-09-14
Applicant: IBM
Inventor： SOORIYAKUMARAN RATNAM , ALLEN ROBERT DAVID , BROCK PHILLIP JOE , SWANSON SALLY ANN , FRIZ ALEXANDER , HUANG WU-SONG , CHEN KUANG-JUNG , TRUONG HOA
IPC: C09D143/04 , G03F7/00 , G03F7/075
Abstract: Coating compositions include a polymer including (I) wherein R1 is a silicon containing moiety, R2 is an acid stable lactone functionality, and R3 is an acid labile lactone functionality; X1, X2, X3 are independently H or CH3; and m and o are non-zero positive integers and n is zero or a positive integer representing the number of repeat units; a photoacid generator; and a solvent. Also disclosed are methods for forming a pattern in the coating composition containing the same.
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公开(公告)号：DE602006012076D1
公开(公告)日：2010-03-18
申请号：DE602006012076
申请日：2006-08-21
Applicant: IBM
Inventor： ALLEN ROBERT DAVID , DIPIETRO RICHARD ANTHONY , TRUONG HOA , BROCK PHILLIP JOE , SOORIYAKUMARAN RATNAM
Abstract: A dissolution modification agent suitable for use in a photoresist composition including a polymer, a photoacid generator and casting solvent. The dissolution modification agent is insoluble in aqueous alkaline developer and inhibits dissolution of the polymer in the developer until acid is generated by the photoacid generator being exposed to actinic radiation, whereupon the dissolution modifying agent, at a suitable temperature, becomes soluble in the developer and allows the polymer to dissolve in the developer. The DMAs are glucosides, cholates, citrates and adamantanedicarboxylates protected with acid-labile ethoxyethyl, tetrahydrofuranyl, and angelicalactonyl groups.
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Patent Agency Ranking
公开(公告)号：AU9219998A
公开(公告)日：1999-04-05
申请号：AU9219998
申请日：1998-09-03
Applicant: GOODRICH CO B F , IBM
Inventor： GOODALL BRIAN L , JAYARAMAN SAIKUMAR , SHICK ROBERT A , RHODES LARRY F , ALLEN ROBERT DAVID , PIETRO RICHARD ANTHONY DI , WALLOW THOMAS
Abstract: The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
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公开(公告)号：DE69123873T2
公开(公告)日：1997-07-17
申请号：DE69123873
申请日：1991-04-16
Applicant: IBM
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公开(公告)号：DE69120858T2
公开(公告)日：1997-01-23
申请号：DE69120858
申请日：1991-04-16
Applicant: IBM
Inventor： ALLEN ROBERT DAVID , WALLRAFF GREGORY MICHAEL , SIMPSON LOGAN LLOYD , HINSBERG WILLIAM DINAN III
IPC: G03F7/004 , G03F7/029 , G03F7/039 , H01L21/027 , C08L33/06
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公开(公告)号：DE3773061D1
公开(公告)日：1991-10-24
申请号：DE3773061
申请日：1987-06-26
Applicant: IBM
Inventor： ALLEN ROBERT DAVID , CHIONG KAOLIN N , CHOW MING-FEA , MACDONALD SCOTT ARTHUR , YANG JER-MING , WILLSON CARLTON GRANT
IPC: H01L21/027 , G03F7/038 , G03F7/20 , G03F7/26 , G03F7/38
Abstract: The present invention is concerned with a method of converting a single resist layer into a multilayered resist. The upper portion of the single resist layer can be patternwise converted into a chemically different composition or structure having altered absorptivity toward radiation. The difference in radiation absorptivity within the patterned upper portion of the resist enables subsequent use of blanket irradiation of the resist surface to create differences in chemical solubility between areas having the altered absorptivity toward radiation and non-altered areas. The difference in chemical solubility enables wet development of the patterned resist.
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公开(公告)号：DE3861251D1
公开(公告)日：1991-01-24
申请号：DE3861251
申请日：1988-02-09
Applicant: IBM
Inventor： ALLEN ROBERT DAVID , FRECHET JEAN M J , TWIEG ROBERT JAMES , WILLSON CARLTON GRANT
IPC: G03F7/004 , G03F7/029 , G03F7/038 , G03F7/039 , H01L21/027
Abstract: Heat stable, negative resist compositions are provided for use, particularly in deep ultraviolet light x-ray and electron beams. The composition comprises an acid generting onium salt photoinitiator, a source of polyfunctional activated aromatic rings and a source of polyfunctional carbonium ions, with at least one of said sources being a polymer.
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