中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

127 records (took 0.019 seconds)

    Multi-axis Magnetic Lens for Focusing a Plurality of Charged Particle Beams
    51.
    发明申请
    Multi-axis Magnetic Lens for Focusing a Plurality of Charged Particle Beams 有权
    用于聚焦多个带电粒子束的多轴磁镜

    公开(公告)号：US20150179384A1

    公开(公告)日：2015-06-25

    申请号：US14572052

    申请日：2014-12-16

    Applicant: Hermes-Microvision, Inc.

    Inventor： Zhongwei Chen ,  Weiming Ren ,  Xuerang Hu ,  Xuedong Liu

    IPC: H01J3/20

    CPC classification number: H01J3/20 ,  H01J37/141 ,  H01J37/143 ,  H01J2237/1405 ,  Y10T29/49075

    Abstract: A multi-axis magnetic lens with stable performance in focusing a plurality of charged particle beams is provided. The multi-axis magnetic lens comprises a plurality of magnetic dub-lens modules. On the one hand, the multi-axis magnetic lens employs an annular permanent-magnet unit to provide a basic and stable magnetic flux to the plurality of magnetic sub-lens modules. One the other hand, the multi-axis magnetic lens uses a plurality of subsidiary coils to provide additional and adjustable magnetic flux to the plurality of magnetic sub-lens modules respectively. The invention also proposes a method to turn off or adjust the basic and stable magnetic flux for some applications. Hence, this invention will benefit the applications which need to execute in a long time period while keeping a high stabilization in performance.

    Abstract translation: 提供了一种在聚焦多个带电粒子束时具有稳定性能的多轴磁性透镜。 多轴磁性透镜包括多个磁性复数透镜模块。 一方面，多轴磁性透镜采用环形永磁体单元，以向多个磁性子透镜模块提供基本稳定的磁通量。 另一方面，多轴磁性透镜使用多个辅助线圈来分别向多个磁性子透镜模块提供附加和可调节的磁通量。 本发明还提出了在一些应用中关闭或调节基本和稳定磁通的方法。 因此，本发明将有益于需要在长时间内执行的应用，同时保持高性能稳定性。

    System and Method for Controlling Charge-up in an Electron Beam Apparatus
    53.
    发明申请
    System and Method for Controlling Charge-up in an Electron Beam Apparatus 有权
    用于控制电子束装置中电荷的系统和方法

    公开(公告)号：US20150060665A1

    公开(公告)日：2015-03-05

    申请号：US14512672

    申请日：2014-10-13

    Applicant: Hermes Microvision Inc.

    Inventor： Weiming Ren ,  Zhongwei Chen

    IPC: H01J37/02 ,  H01J37/28

    CPC classification number: H01J37/026 ,  H01J37/14 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/0045 ,  H01J2237/0262 ,  H01J2237/1405 ,  H01J2237/2801 ,  H01J2237/2803

    Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.

    Abstract translation: 本发明提供了用于控制电子束装置中的充电的装置和相应的实施例，其可以在成像扫描的帧周期内在样品表面上产生后不久就消除正电荷。 该方法是使从样品表面发射的二次电子的一些或全部返回到中和积聚在其上的正电荷，从而在有限的时间段内达到电荷平衡。 这些实施例使用控制电极产生延迟场，以将具有低动能的一些二次电子反射回样品表面。

    Electromagnetic lens for electron beam exposure apparatus
    54.
    发明授权
    Electromagnetic lens for electron beam exposure apparatus 有权
    用于电子束曝光装置的电磁透镜

    公开(公告)号：US08957389B2

    公开(公告)日：2015-02-17

    申请号：US14090943

    申请日：2013-11-26

    Applicant: Advantest Corporation

    Inventor： Akio Yamada

    IPC: H01J37/141

    CPC classification number: H01J37/141 ,  H01J2237/1405 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/31774

    Abstract: There is provided an electromagnetic lens which includes an electromagnetic coil wound to be rotationally symmetrical about an optical axis of an electron beam, and a pole piece covering the electromagnetic coil, in which: a gap is integrally formed in either one of an inner wall formed at an inner circumference side of the pole piece and a lower end wall formed in an end portion at an emission side of the electron beam, or a boundary portion between the two walls; the inner wall is formed to be thinnest at a portion close to the gap and to gradually become thicker as a distance from the gap increases; and the electromagnetic lens is formed such that a width in a radial direction thereof is more increased as being closer to the gap along with the change of the thickness of the inner wall.

    Abstract translation: 提供了一种电磁透镜，其包括卷绕成围绕电子束的光轴旋转对称的电磁线圈和覆盖电磁线圈的极片，其中：在形成的内壁中的任一个中一体形成间隙 在极片的内周侧和形成在电子束的发射侧的端部中的下端壁或两个壁之间的边界部分; 内壁形成为在靠近间隙的部分处最薄，并且随着与间隙的距离增加而逐渐变厚; 并且电磁透镜形成为使得随着内壁的厚度的变化，其径向方向上的宽度更靠近间隙而增加。

    System and method for controlling charge-up in an electron beam apparatus
    55.
    发明授权
    System and method for controlling charge-up in an electron beam apparatus 有权
    用于控制电子束装置中的电荷的系统和方法

    公开(公告)号：US08907281B2

    公开(公告)日：2014-12-09

    申请号：US14081465

    申请日：2013-11-15

    Applicant: Hermes Microvision, Inc.

    Inventor： Weiming Ren ,  Zhongwei Chen

    IPC: H01J37/26 ,  H01J37/14 ,  H01J37/29

    CPC classification number: H01J37/026 ,  H01J37/14 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/0045 ,  H01J2237/0262 ,  H01J2237/1405 ,  H01J2237/2801 ,  H01J2237/2803

    Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.

    Abstract translation: 本发明提供了用于控制电子束装置中的充电的装置和相应的实施例，其可以在成像扫描的帧周期内在样品表面上产生后不久就消除正电荷。 该方法是使从样品表面发射的二次电子的一些或全部返回到中和积聚在其上的正电荷，从而在有限的时间段内达到电荷平衡。 这些实施例使用控制电极产生延迟场，以将具有低动能的一些二次电子反射回样品表面。

    Permanent Magnet Based High Performance Multi-Axis Immersion Electron Lens Array with Low Axial Leakage Field
    56.
    发明申请
    Permanent Magnet Based High Performance Multi-Axis Immersion Electron Lens Array with Low Axial Leakage Field 审中-公开
    具有低轴向泄漏场的永磁高性能多轴浸没电子透镜阵列

    公开(公告)号：US20140326895A1

    公开(公告)日：2014-11-06

    申请号：US14196190

    申请日：2014-03-04

    Applicant: Tao Luo

    Inventor： Tao Luo

    IPC: H01J37/14 ,  H01J3/20

    CPC classification number: H01J37/14 ,  H01J3/20 ,  H01J37/143 ,  H01J37/145 ,  H01J2237/1405

    Abstract: An apparatus includes a magnetic adjustment lens positioned at the electron beam path between the electron source and sample, the magnetic adjustment lens excited by an electric coil, and a permanent magnet lens positioned below the magnetic adjustment lens to focus the electron beam onto the sample surface, the permanent magnet lens excited by one or more permanent ring magnets enclosed except on a bottom surface by a magnetic field conductor. The magnetic adjustment lens may be excited to eliminate magnetic field leakage of the permanent magnet lens.

    Abstract translation: 一种设备包括位于电子源和样品之间的电子束路径处的磁调节透镜，由电线圈激励的磁调节透镜和位于磁调节透镜下方的永磁体透镜，以将电子束聚焦到样品表面上 由一个或多个永久环形磁体激励的永磁体透镜，除了在磁场表面之外被磁场导体所包围。 可以激励磁调节透镜以消除永磁体透镜的磁场泄漏。

    CHROMATIC ABERRATION CORRECTOR AND ELECTRON MICROSCOPE
    57.
    发明申请
    CHROMATIC ABERRATION CORRECTOR AND ELECTRON MICROSCOPE 有权
    紫外线校正和电子显微镜

    公开(公告)号：US20140158901A1

    公开(公告)日：2014-06-12

    申请号：US14102838

    申请日：2013-12-11

    Applicant: JEOL Ltd.

    Inventor： Hidetaka Sawada ,  Fumio Hosokawa

    IPC: H01J37/153

    CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/12 ,  H01J2237/1405 ,  H01J2237/1534

    Abstract: The chromatic aberration corrector (100) has a first multipole element (110) for producing a first electromagnetic field and a second multipole element (120) for producing a second electromagnetic field. The first multipole element (110) first, second, and third portions (110a, 110b, 110c) arranged along an optical axis (OA) having a thickness and producing a quadrupole field in which an electric quadrupole field and a magnetic quadrupole field are superimposed. In the first and third portions (110a, 110c), the electric quadrupole field is set stronger than the magnetic quadrupole field. In the second portion (110b), the magnetic quadrupole field is set stronger than the electric quadrupole field. The second portion (110b) produces a two-fold astigmatism component that is opposite in sign to two-fold astigmatism components produced by the first portion (110a) and third portion (110c).

    Abstract translation: 色差校正器（100）具有用于产生第一电磁场的第一多极元件（110）和用于产生第二电磁场的第二多极元件（120）。 第一多极元件（110）沿着具有厚度并且产生四极场的光轴（OA）布置的第一，第二和第三部分（110a，110b，110c），其中电四极场和四极磁场被叠加 。 在第一和第三部分（110a，110c）中，电四极场被设置为比四极四极场强。 在第二部分（110b）中，将四极四极场设置得比电四极场强。 第二部分（110b）产生与由第一部分（110a）和第三部分（110c）产生的两折像散分量相反的双折射散光成分。

    ELECTRON LENS AND THE ELECTRON BEAM DEVICE
    58.
    发明申请
    ELECTRON LENS AND THE ELECTRON BEAM DEVICE 审中-公开
    电子镜头和电子束装置

    公开(公告)号：US20130134322A1

    公开(公告)日：2013-05-30

    申请号：US13814190

    申请日：2011-10-25

    Applicant: Hiroshi Yasuda

    Inventor： Hiroshi Yasuda

    IPC: H01J3/20

    CPC classification number: H01J3/24 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/20 ,  H01J37/143 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/1405

    Abstract: There provided a device for effectively drawing a fine pattern using a permanent magnet. The device has an outer cylinder 201 composed of a cylindrical ferromagnet with a Z axis as a central axis, a cylindrical permanent magnet 202 located inside the outer cylinder and polarized along the Z axis direction, a correction coil 204 located inside the cylindrical permanent magnet with a gap from the cylindrical permanent magnet, for adjusting a magnetic field strength generated by the cylindrical permanent magnet along the Z axis direction, and a coolant passage 203 located in the gap between the cylindrical permanent magnet and the correction coil, for allowing a coolant to flow therethrough and controlling temperature changes in the cylindrical permanent magnet.

    Abstract translation: 提供了一种用于使用永磁体有效地绘制精细图案的装置。 该装置具有由Z轴作为中心轴的圆柱形铁磁体构成的外筒201，位于外筒内部并沿着Z轴方向极化的圆柱形永磁体202，位于筒状永久磁铁内部的校正线圈204， 用于调整由圆柱形永磁体沿Z轴方向产生的磁场强度的圆柱形永磁体的间隙和位于圆柱形永磁体和校正线圈之间的间隙中的冷却剂通道203，用于允许冷却剂 流过其中并控制圆筒形永磁体的温度变化。

    Magnetic domain imaging system
    59.
    发明授权
    Magnetic domain imaging system 有权
    磁畴成像系统

    公开(公告)号：US08158940B2

    公开(公告)日：2012-04-17

    申请号：US12781121

    申请日：2010-05-17

    Applicant: Takeshi Tomita

    Inventor： Takeshi Tomita

    IPC: H01J37/26 ,  H01J37/147 ,  H01J3/14

    CPC classification number: H01J37/266 ,  H01J37/147 ,  H01J2237/1405 ,  H01J2237/2008 ,  H01J2237/2588

    Abstract: A magnetic domain imaging system is offered which permits application of a strong magnetic field to a specimen. The imaging system includes a transmission electron microscope having an objective lens. The specimen that is magnetic in nature is placed in the upper polepiece of the objective lens. An electron beam transmitted through the specimen is imaged and displayed on a display device. A field application coil assembly for applying a magnetic field to the specimen and two deflection coil assemblies for bringing the beam deflected by the field applied to the specimen back to the optical axis are mounted in the upper polepiece.

    Abstract translation: 提供了磁场成像系统，其允许对样本施加强磁场。 成像系统包括具有物镜的透射电子显微镜。 本质上是磁性的样品被放置在物镜的上极片中。 通过试样透射的电子束被成像并显示在显示装置上。 用于向样本施加磁场的场应用线圈组件和用于将由施加到样本的磁场偏转的光束引导到光轴的两个偏转线圈组件安装在上极靴中。

Patent Agency Ranking