公开(公告)号：NL2009117A

公开(公告)日：2013-02-06

申请号：NL2009117

申请日：2012-07-04

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  DIJKSMAN JOHAN

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2007160A

公开(公告)日：2012-02-28

申请号：NL2007160

申请日：2011-07-21

Applicant: ASML NETHERLANDS BV

Inventor： MARK MARTINUS ,  MAUCZOK RUEDIGER ,  GIESBERS JACOBUS ,  BANINE VADIM ,  JEUNINK ANDRE ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  KLOOTWIJK JOHAN ,  KOOLE ROELOF ,  PEETERS EMIEL ,  HEESCH CHRIS

IPC: G03F7/00

公开(公告)号：NL2006454A

公开(公告)日：2011-11-07

申请号：NL2006454

申请日：2011-03-23

Applicant: ASML NETHERLANDS BV

Inventor： DIJKSMAN JOHAN ,  BOEF ARIE ,  WUISTER SANDER ,  MARK MARTINUS

IPC: G03F7/00

Abstract: A method of aligning a substrate and an imprint template is disclosed. The method includes directing an alignment radiation beam towards an imprint template alignment mark and an adjacent substrate alignment mark, the imprint template alignment mark and the substrate alignment mark each including a grating which extends in a first direction and a grating which extends in a second direction, providing relative movement between the imprint template and the substrate in the first direction and in the second direction, using an intensity detector to detect the intensity of alignment radiation redirected in the zero-order direction by the imprint template alignment mark and the substrate alignment mark during the relative movement in the first direction and in the second direction, and determining an aligned position of the imprint template alignment mark and the substrate alignment mark based upon the detected intensity.

公开(公告)号：NL2004735A

公开(公告)日：2011-01-10

申请号：NL2004735

申请日：2010-05-18

Applicant: ASML NETHERLANDS BV

Inventor： KRUIJT-STEGEMAN YVONNE ,  KOEVOETS ADRIANUS ,  SCHIFFART CATHARINUS ,  BANINE VADIM ,  BOEF ARIE ,  JEUNINK ANDRE ,  RENKENS MICHAEL ,  SCHOTHORST GERARD ,  DIJKSMAN JOHAN ,  SCHOORMANS CAROLUS ,  WUISTER SANDER

IPC: G03F7/00

公开(公告)号：NL2006929A

公开(公告)日：2012-02-13

申请号：NL2006929

申请日：2011-06-14

Applicant: ASML NETHERLANDS BV

Inventor： SCHIFFART CATHARINUS ,  HARDEMAN TOON ,  SCHOTHORST GERARD ,  JEUNINK ANDRE ,  RENKENS MICHAEL ,  FOCKERT GEORGE ,  BAARS GREGOR ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE ,  JANSEN NORBERT

IPC: G03F7/00

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：NL2006747A

公开(公告)日：2012-01-30

申请号：NL2006747

申请日：2011-05-09

Applicant: ASML NETHERLANDS BV

Inventor： DIJKSMAN JOHAN ,  PIERIK ANKE ,  WUISTER SANDER ,  KOOLE ROELOF

IPC: G03F7/00

公开(公告)号：NL2005007A

公开(公告)日：2011-03-01

申请号：NL2005007

申请日：2010-06-30

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER ,  BANINE VADIM ,  DIJKSMAN JOHAN ,  KRUIJT-STEGEMAN YVONNE ,  LAMMERS JEROEN ,  KOOLE ROLF

IPC: G03F7/00

公开(公告)号：SG11201404756VA

公开(公告)日：2014-10-30

申请号：SG11201404756V

申请日：2013-02-07

Applicant: ASML NETHERLANDS BV

Inventor： KEMPEN ANTONIUS ,  DIJKSMAN JOHAN ,  MESTROM WILBERT

IPC: G03F7/20 ,  B01L3/02 ,  B41J2/045 ,  H05G2/00

公开(公告)号：NL2012721A

公开(公告)日：2014-06-24

申请号：NL2012721

申请日：2014-04-30

Applicant: ASML NETHERLANDS BV

Inventor： WINKELS KOEN ,  DIJKSMAN JOHAN ,  LASSISE ADAM ,  PIJNENBURG JOHANNES ,  YAKUNIN ANDREI

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2009359A

公开(公告)日：2013-03-26

申请号：NL2009359

申请日：2012-08-24

Applicant: ASML NETHERLANDS BV

Inventor： SCHIMMEL HENDRIKUS ,  DIJKSMAN JOHAN ,  LABETSKI DZMITRY

IPC: G03F7/20 ,  H05G2/00