公开(公告)号：NL2004831A

公开(公告)日：2010-12-20

申请号：NL2004831

申请日：2010-06-07

Applicant: ASML NETHERLANDS BV

Inventor： SCHOOT JAN ,  VRIES GOSSE

IPC: G03F7/20

公开(公告)号：NL2011457A

公开(公告)日：2014-04-16

申请号：NL2011457

申请日：2013-09-17

Applicant: ASML NETHERLANDS BV

Inventor： SCHOOT JAN ,  BOTMA HAKO ,  DAM MARINUS ,  HOL SVEN ANTOIN JOHAN ,  BUIS EDWIN ,  VRIES GOSSE ,  REKKERS ERIK

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2009061A

公开(公告)日：2012-07-18

申请号：NL2009061

申请日：2012-06-25

Applicant: ASML NETHERLANDS BV

Inventor： SCHOOT JAN ,  KEMPEN ANTONIUS

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2007634A

公开(公告)日：2012-06-15

申请号：NL2007634

申请日：2011-10-20

Applicant: ASML NETHERLANDS BV

Inventor： SCHOOT JAN ,  BOUCHOMS IGOR ,  DIJSSELDONK ANTONIUS ,  EURLINGS MARKUS

IPC: G03F7/20

公开(公告)号：NL2004303A

公开(公告)日：2010-09-06

申请号：NL2004303

申请日：2010-02-25

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  INGEN SCHENAU KOEN ,  SCHOOT JAN ,  WAGNER CHRISTIAN ,  VRIES GOSSE

IPC: G03F7/20

公开(公告)号：NL2011453A

公开(公告)日：2014-03-24

申请号：NL2011453

申请日：2013-09-17

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  SCHOOT JAN ,  SENGERS TIMOTHEUS ,  VALENTIN CHRISTIAAN ,  DIJSSELDONK ANTONIUS

IPC: G03F7/20

公开(公告)号：NL2010185A

公开(公告)日：2013-08-01

申请号：NL2010185

申请日：2013-01-25

Applicant: ASML NETHERLANDS BV

Inventor： KOEVOETS ADRIANUS ,  DONDERS SJOERD ,  SCHOOT JAN ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA

IPC: G03F7/20

公开(公告)号：NL2009372A

公开(公告)日：2013-04-02

申请号：NL2009372

申请日：2012-08-28

Applicant: ASML NETHERLANDS BV

Inventor： SCHOOT JAN ,  GREEVENBROEK HENDRIKUS ,  IVANOV VLADIMIR ,  YAKUNIN ANDREI ,  KREUWEL HERMANUS

IPC: G03F7/20

Abstract: EUV exposure dose in a lithographic apparatus is controlled pulse to pulse by varying a conversion efficiency with which a pulse of EUV radiation is generated from an excitation of a fuel material by a corresponding pulse of excitation laser radiation. Conversion efficiency can be varied in several different ways, by varying the proportion of a fuel material that intersects a laser beam, and/or by varying a quality of the interaction. Mechanisms to vary the conversion efficiency can be based on variation of a laser pulse timing, variation of pre-pulse energy, and/or variable displacement of a main laser beam in one or more directions. Steps to maintain symmetry of the generated EUV radiation can be included.

公开(公告)号：NL2007864A

公开(公告)日：2011-12-22

申请号：NL2007864

申请日：2011-11-25

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  IVANOV VLADIMIR ,  SCHOOT JAN ,  KRIVTSUN VLADIMIR ,  SWINKELS GERARDUS ,  MEDVEDEV VIACHESLAV

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2005724A

公开(公告)日：2011-06-27

申请号：NL2005724

申请日：2010-11-19

Applicant: ASML NETHERLANDS BV

Inventor： INGEN SCHENAU KOEN ,  SCHOOT JAN ,  VRIES GOSSE

IPC: G03F7/20