中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

28 records (took 0.031 seconds)

    Method of measuring lithographic projection apparatus
    11.
    发明专利
    Method of measuring lithographic projection apparatus 有权
    测量抛光投影装置的方法

    公开(公告)号：JP2009260344A

    公开(公告)日：2009-11-05

    申请号：JP2009094474

    申请日：2009-04-09

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STAALS FRANK ,  HOFMANS GERARDUS CAROLUS JOHAN ,  LAAN HANS VAN DER ,  MAGNUSSON SVEN GUNNAR KRISTER

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03B27/32 ,  G03B27/42 ,  G03F7/70633 ,  G03F7/70641

    Abstract: PROBLEM TO BE SOLVED: To provide a method having verification structures that enable to determine the distribution of each of a contrast setting, a dose setting, and a focus setting. SOLUTION: A method of measuring a lithographic projection apparatus includes imaging a verification mark of a patterning device onto a radiation-sensitive layer held by a substrate table of a lithographic apparatus, wherein the verification mark 100 includes at least a first, a second and a third verification structures 110, 120 and 130 that have a mutually different sensitivity profile for a dose setting, a focus setting and a contrast setting. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种具有能够确定对比度设置，剂量设置和聚焦设置中的每一个的分布的验证结构的方法。 解决方案：测量光刻投影设备的方法包括将图案形成装置的验证标记成像到由光刻设备的衬底台保持的辐射敏感层上，其中验证标记100至少包括第一， 第二和第三验证结构110,120和130具有用于剂量设置，聚焦设置和对比度设置的相互不同的灵敏度分布。 版权所有（C）2010，JPO＆INPIT

    Method and lithographic apparatus for acquiring height data relating to substrate surface
    12.
    发明专利
    Method and lithographic apparatus for acquiring height data relating to substrate surface 有权
    用于获取与基板表面相关的高度数据的方法和平面设备

    公开(公告)号：JP2009239274A

    公开(公告)日：2009-10-15

    申请号：JP2009049995

    申请日：2009-03-04

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STAALS FRANK ,  MINNAERT ARTHUR WINFRIED EDUAR ,  TEUNISSEN PAULUS ANTONIUS ANDR

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F9/7003 ,  G03F9/7034

    Abstract: PROBLEM TO BE SOLVED: To provide a method of positioning a target portion of a substrate with respect to a focal plane of a projection system. SOLUTION: The method includes measuring a height of at least a portion of the substrate using a level sensor, and generating height data. A correction height which is specified and/or precalculated is used to calculate corrected height data. Use of the precalculated correction height may be partially based upon process stack data. The position of a substrate table is controlled using the correction height partially based upon a process stack layer, specially upon a process stack layer in a target area. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种相对于投影系统的焦平面定位基板的目标部分的方法。 解决方案：该方法包括使用液位传感器测量至少一部分基板的高度，并产生高度数据。 使用指定和/或预先计算的校正高度来计算校正高度数据。 使用预先计算的校正高度可以部分地基于过程堆栈数据。 使用校正高度部分地基于处理堆叠层来控制衬底台的位置，特别是在目标区域中的处理堆叠层上。 版权所有（C）2010，JPO＆INPIT

    Method and lithographic apparatus for measuring and acquiring height data relating to substrate surface
    13.
    发明专利
    Method and lithographic apparatus for measuring and acquiring height data relating to substrate surface 有权
    用于测量和获取与基板表面相关的高度数据的方法和平面设备

    公开(公告)号：JP2009239273A

    公开(公告)日：2009-10-15

    申请号：JP2009049994

    申请日：2009-03-04

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STAALS FRANK ,  TEUNISSEN PAULUS ANTONIUS ANDR ,  VAN DOORN RONALD ALBERT JOHN

    IPC: H01L21/027 ,  G01B11/02 ,  G03F7/20

    CPC classification number: G03F7/70758 ,  G03F7/70725

    Abstract: PROBLEM TO BE SOLVED: To maintain a wafer surface at a suitable focus position by measuring the position and direction of the wafer surface relative to a projection optical system during exposure, and adjusting a vertical position and a horizontal tilt of a wafer table. SOLUTION: A lithographic apparatus includes a level sensor for use in positioning a target portion of a substrate with respect to a focal plane of the projection system, a pair of actuators, configured to move a substrate table of the lithographic apparatus, and a controller for moving the substrate relative to the level sensor by controlling the actuators. The controller combines motions of the first and second actuators to produce a combined movement having a speed higher than a maximum speed of at least one of the actuators individually. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：通过在曝光期间测量晶片表面相对于投影光学系统的位置和方向，并且调整晶片台的垂直位置和水平倾斜来将晶片表面保持在适当的焦点位置 。 光刻设备包括用于相对于投影系统的焦平面定位基板的目标部分的液位传感器，配置成移动光刻设备的基板台的一对致动器，以及 控制器，用于通过控制致动器来移动基板相对于液位传感器。 控制器组合第一和第二致动器的运动，以产生具有高于致动器中的至少一个致动器的最大速度的组合运动。 版权所有（C）2010，JPO＆INPIT

    LITHOGRAPHIC APPARATUS.
    15.
    发明专利
    LITHOGRAPHIC APPARATUS. 未知

    公开(公告)号：NL2008272A

    公开(公告)日：2012-09-11

    申请号：NL2008272

    申请日：2012-02-10

    Applicant: ASML NETHERLANDS BV

    Inventor： PASCH ENGELBERTUS ,  EUSSEN EMIEL ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  OTTENS JOOST JEROEN ,  STAALS FRANK ,  MACHT LUKASZ JERZY ,  DRENT WILLIAM ,  BOGAART ERIK WILLEM

    IPC: G03F7/20 ,  H01L21/68

    Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

Patent Agency Ranking