公开(公告)号：NL2004497A

公开(公告)日：2010-11-02

申请号：NL2004497

申请日：2010-04-01

Applicant: ASML NETHERLANDS BV

Inventor： THOMAS IVO ,  LANDHEER SIEBE ,  MEESTER ARNOUT ,  MIRANDA MARCIO ,  TANASA GHEORGHE

IPC: G03F7/20

公开(公告)号：NL2004907A

公开(公告)日：2010-12-20

申请号：NL2004907

申请日：2010-06-17

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES ,  JANSEN HANS ,  BRUIJSTENS JEROEN ,  THOMAS IVO ,  KUSTERS GERARDUS ,  MIRANDA MARCIO ,  TANASA GHEORGHE

IPC: G03F7/20

公开(公告)号：NL2003392A

公开(公告)日：2010-03-18

申请号：NL2003392

申请日：2009-08-25

Applicant: ASML NETHERLANDS BV

Inventor： BRUIJSTENS JEROEN ,  BRULS RICHARD ,  JANSEN HANS ,  LANDHEER SIEBE ,  MEESTER ARNOUT ,  THOMAS IVO ,  MIRANDA MARCIO ,  TANASA GHEORGHE

IPC: G03F7/20

公开(公告)号：SG159467A1

公开(公告)日：2010-03-30

申请号：SG2009054792

申请日：2009-08-17

Applicant: ASML NETHERLANDS BV

Inventor： TANASA GHEORGHE ,  TEN KATE NICOLAAS ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  PHILIPS DANNY MARIA HUBERTUS ,  SCHEPERS MAIKEL ADRIANUS CORNERLIS ,  VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS

Abstract: A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to resist the flow of liquid out of the space between the fluid handling structure and the substrate, and a second opening, which opens into an area radially outwardly of the space, to provide a flow of fluid from the fluid handling structure onto a top surface of the substrate and/or substrate table radially outwardly of the space. A controller may be provided such that flow of fluid towards a center of the substrate table is greater than the flow of fluid in a direction away from the center of the substrate table. [Figure 6]

公开(公告)号：NL2003395A

公开(公告)日：2010-03-18

申请号：NL2003395

申请日：2009-08-26

Applicant: ASML NETHERLANDS BV

Inventor： BRUIJSTENS JEROEN ,  LEE MAURICE ,  TANASA GHEORGHE ,  NOORDAM LAMBERTUS DOMINICUS ,  BRULS RICHARD ,  JANSEN HANS ,  LANDHEER SIEBE ,  JORRITSMA LAURENTIUS ,  MEESTER ARNOUT ,  JANSEN BAUKE ,  THOMAS IVO ,  MIRANDA MARCIO

IPC: G03F7/20

公开(公告)号：NL1036709A1

公开(公告)日：2009-10-27

申请号：NL1036709

申请日：2009-03-13

Applicant: ASML NETHERLANDS BV

Inventor： WATSO ROBERT DOUGLAS ,  DOMMELEN YOURI JOHANNES LAURENTIUS MARIA VAN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  MERTENS JEROEN JOHANNES SOPHIA ,  STEIJAERT PETER PAUL ,  JONG ANTHONIUS MARTINUS CORNELIS PETRUS DE ,  WINKEL JIMMY MATHEUS WILHELMUS ,  SENA JOAO PAULO DA PAZ ,  LEE MAURICE MARTINUS JOHANNES ,  LIER HENRICUS MARTINUS DOROTHE ,  TANASA GHEORGHE

IPC: G03F7/20