公开(公告)号：AT542837T

公开(公告)日：2012-02-15

申请号：AT08170128

申请日：1999-02-19

Applicant: SUMITOMO BAKELITE CO ,  IBM

Inventor： JAYARAMAN SAIKUMAR ,  GOODALL BRIAN L ,  RHODES LARRY F ,  SHICK ROBERT A ,  VICARI RICHARD ,  ALLEN ROBERT D ,  OPITZ JULIANN ,  SOORIYAKUMARAN RATNAM ,  WALLOW THOMAS

IPC: C08F32/08 ,  C08F4/70 ,  C08F4/80 ,  C08F232/08 ,  C08G61/06 ,  C08G61/08 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039

Abstract: The invention relates to a cyclic 2,3-addition polymer obtained from a monomer composition consisting of one or more polycyclic monomers having a pendant aromatic substituent, in combination with a monomer selected from the group consisting of one or more polycyclic monomers having a pendant acid labile substituent. The invention further relates to a photoresist composition comprising a photoacid initiator, an optional dissolution inhibitor, and said cyclic 2,3-addition polymer.

公开(公告)号：HK1035199A1

公开(公告)日：2001-11-16

申请号：HK01105885

申请日：2001-08-21

Applicant: IBM ,  SUMITOMO BAKELITE CO

Inventor： JAYARAMAN SAIKUMAR ,  GOODALL BRIAN L ,  RHODES LARRY F ,  SHICK ROBERT A ,  VICARI RICHARD ,  ALLEN ROBERT D ,  OPITZ JULIANN ,  SOORIYAKUMARAN RATNAM ,  WALLOW THOMAS

IPC: C08F4/80 ,  C08F32/08 ,  C08F232/08 ,  C08G61/06 ,  C08G61/08 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C08F ,  C08G ,  G03F

Abstract: The invention relates to a cyclic 2,3-addition polymer obtained from a monomer composition consisting of one or more polycyclic monomers having a pendant aromatic substituent, in combination with a monomer selected from the group consisting of one or more polycyclic monomers having a pendant acid labile substituent. The invention further relates to a photoresist composition comprising a photoacid initiator, an optional dissolution inhibitor, and said cyclic 2,3-addition polymer.

公开(公告)号：AT264352T

公开(公告)日：2004-04-15

申请号：AT99909541

申请日：1999-02-19

Applicant: SUMITOMO BAKELITE CO ,  IBM

Inventor： JAYARAMAN SAIKUMAR ,  BENEDIKT GEORGE M ,  RHODES LARRY F ,  VICARI RICHARD ,  ALLEN ROBERT D ,  DIPIETRO RICHARD A ,  SOORIYAKUMARAN RATNAM ,  WALLOW THOMAS

IPC: G03F7/038 ,  C08F32/00 ,  C08F36/00 ,  C08G61/02 ,  C08G61/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.

公开(公告)号：DE10118902A1

公开(公告)日：2002-03-14

申请号：DE10118902

申请日：2001-04-18

Applicant: IBM

Inventor： WALLOW THOMAS I ,  ALLEN ROBERT D ,  BROCK PHILLIP JOE ,  DI PIETRO RICHARD ANTHONY ,  ITO HIROSHI ,  TRUONG HOA DAO ,  VARANASI PUSHKARA RAO

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/40 ,  H01L21/027 ,  G03F7/038

Abstract: Acid-catalyzed positive photoresist compositions which are imageable with 193 nm radiation (and possibly other radiation) and are developable to form photoresist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing cyclic olefin polymer having a cyclic olefin monomer having a lactone moiety, the monomer having no oxygen atoms intervening between the lactone moiety and a ring of the cyclic olefin. Preferred lactone moieties are spirolactones (having a 5 or 6 membered ring) directly to a cyclic olefin ring.

公开(公告)号：HK1036290A1

公开(公告)日：2001-12-28

申请号：HK01106633

申请日：2001-09-20

Applicant: IBM

Inventor： JAYARAMAN SAIKUMAR ,  BENEDIKT GEORGE M ,  RHODES LARRY F ,  ALLEN ROBERT D ,  DIPIETRO RICHARD A ,  SOORIYAKUMARAN RATNAM ,  WALLOW THOMAS

IPC: C08G20060101 ,  G03F7/038 ,  C08F32/00 ,  C08F36/00 ,  C08G61/02 ,  C08G61/08 ,  G03F20060101 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.

公开(公告)号：CA1325353C

公开(公告)日：1993-12-21

申请号：CA557770

申请日：1988-01-29

Applicant: IBM

Inventor： ALLEN ROBERT D ,  FRECHET JEAN M J ,  TWIEG ROBERT J ,  WILLSON CARLTON G

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: of the Invention NEGATIVE RESIST COMPOSITIONS Heat stable, negative resist compositions are provided for use, particularly in deep ultraviolet light x-ray and electron beams. The composition comprises an acid generating onium salt photoinitiator, a source of polyfunctional activated aromatic rings and a source of polyfunctional carbonium ions, with at least one of said sources being a polymer.

公开(公告)号：AU2003303304A1

公开(公告)日：2004-08-23

申请号：AU2003303304

申请日：2003-09-11

Applicant: IBM

Inventor： WONG RANEE W ,  CHEN KUANG-JUNG ,  VARANASI PUSHKARA RAO ,  ALLEN ROBERT D ,  BROCK PHILLIP ,  HOULE FRANCES ,  SOORIYAKUMARAN RATNAM ,  KHOJASTEH MAHMOUD M

IPC: G03F7/039 ,  G03F7/075 ,  G03F7/09 ,  G03F7/38

Abstract: The silicon-containing resist compositions which have low silicon outgassing and high resolution lithographic performance, especially in bilayer or multilayer lithographic applications using 193 nm or shorter wavelength imaging radiation are enabled by the presence of an imaging polymer having silicon-containing, non-acid-labile pendant groups. The resist compositions of the invention are preferably further characterized by the substantial absence of silicon-containing acid-labile moieties.

公开(公告)号：DE10009183A1

公开(公告)日：2000-09-28

申请号：DE10009183

申请日：2000-02-26

Applicant: IBM

Inventor： VARANASI PUSHKARA RAO ,  MANISCALCO JOSEPH F ,  LAWSON MARGARET C ,  MEWHERTER ANN MARIE ,  JORDHAMO GEORGE M ,  ALLEN ROBERT D ,  OPITZ JULIANN ,  ITO HIROSHI ,  WALLOW THOMAS I ,  PIETRO RICHARD A DE

IPC: C08F232/00 ,  C08K5/00 ,  C08L45/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

Abstract: Photoresist composition comprises: (a) a cyclic olefin polymer, (b) a photosensitive acid generating compound and (c) a hydrophobic additive selected from non-steroidal alicyclic and multi-alicyclic components and a saturated steroid component.

公开(公告)号：AU3524800A

公开(公告)日：2000-09-28

申请号：AU3524800

申请日：2000-03-09

Applicant: GOODRICH CO B F ,  IBM

Inventor： JAYARAMAN SAIKUMAR ,  GOODALL BRIAN L ,  VICARI RICHARD ,  LIPIAN JOHN-HENRY ,  ALLEN ROBERT D ,  OPITZ JULIANN ,  WALLOW THOMAS I

IPC: C08G61/08 ,  C08G61/12 ,  G03F7/004 ,  G03F7/039

公开(公告)号：AU2872499A

公开(公告)日：1999-09-06

申请号：AU2872499

申请日：1999-02-19

Applicant: GOODRICH CO B F ,  IBM

Inventor： JAYARAMAN SAIKUMAR ,  BENEDIKT GEORGE M ,  RHODES LARRY F ,  VICARI RICHARD ,  ALLEN ROBERT D ,  DIPIETRO RICHARD A ,  SOORIYAKUMARAN RATNAM ,  WALLOW THOMAS

IPC: G03F7/038 ,  C08F32/00 ,  C08F36/00 ,  C08G61/02 ,  C08G61/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: The present invention relates to cyclic polymers and their use in photolithographic applications. The cyclic polymers contain a pendant acid labile functional group and a functional group containing a protected hydroxyl moiety. The polymers are post modified by deprotecting the pendant hydroxyl moiety and reacting the deprotected hydroxyl containing moiety with a coreactant. The post-functionalized polymers find application in chemically amplified photoresist compositions.