公开(公告)号：JP2009272635A

公开(公告)日：2009-11-19

申请号：JP2009112566

申请日：2009-05-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIREKS DANIEL JOSEPH MARIA ,  DANNY MARIA HUBERTUS PHILIPS ,  CLEMENS JOHANNES GERARDUS VAN ,  STEFFENS KOEN ,  VAN PUTTEN ARNOLD JAN

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  Y10T29/49401 ,  Y10T137/8593

Abstract: PROBLEM TO BE SOLVED: To disclose a fluid handling structure for taking measures for increasing speed at which the breakdown of a meniscus occurs is taken. SOLUTION: The measures include shapes of a plurality of fluid extraction openings of the fluid handling structure, and shapes and density of a plurality of fluid supply openings. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开了采取用于提高发生弯液面的击穿的速度提高措施的流体处理结构。 解决方案：措施包括流体处理结构的多个流体提取开口的形状，以及多个流体供应开口的形状和密度。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008147652A

公开(公告)日：2008-06-26

申请号：JP2007309567

申请日：2007-11-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RIEPEN MICHEL ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LIEBREGTS PAULUS MARTINUS MARI ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JO ,  DIREKS DANIEL JOSEPH MARIA ,  BERKVENS PAUL PETRUS JOANNES ,  MONDT EVA ,  BRANDS GERT-JAN GERARDUS JOHAN ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system for hooking a liquid meniscus at a predetermined position in a space between the final element and the substrate of a projection system. SOLUTION: Disclosed is a liquid immersion system used for a liquid immersion lithography in which a liquid meniscus between the liquid immersion system and its substrate is substantially hooked at a predetermined position by meniscus hook formation. The meniscus hook formation has a plurality of discrete outlets arranged in polygonal shape. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种液体供应系统，用于在投影系统的最终元件和基板之间的空间中的预定位置处钩住液体弯液面。 解决方案：公开了一种用于液浸光刻的液浸系统，其中液浸系统及其基板之间的液体弯液面通过弯液面钩形成在预定位置基本上钩挂。 弯液面钩形结构具有以多边形排列的多个分立出口。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2012069980A

公开(公告)日：2012-04-05

申请号：JP2011249628

申请日：2011-11-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIREKS DANIEL JOSEPH MARIA ,  DANNY MARIA HUBERTUS PHILIPS ,  CLEMENS JOHANNES GERARDUS VAN DEN DUNGEN ,  STEFFENS KOEN ,  ARNOLD YANG VAN PUTTEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  Y10T29/49401 ,  Y10T137/8593

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling structure where a measure has been taken in order to increase a speed at which meniscus destruction arises.SOLUTION: A meniscus fixation device is provided with a plurality of separate openings 50. Although these openings 50 are each illustrated as a circle, it is not necessary to be so. The openings 50 surround a space that is a destination to which the fluid handling structure supplies a fluid. That is, the openings 50 are spaced continuously substantially on the circumference of the space. The openings 50 are arranged so that a shape having a corner (that is, a shape having a corner 52) may be formed in a plan view. This is a square shape having a curved marginal part or side 54. The marginal part 54 has a negative radius. That is, in a section apart from the corner 52, it curves toward a center of the shape having the corner.

Abstract translation: 要解决的问题：提供一种流体处理结构，其中采取措施以增加出现弯液面破坏的速度。 解决方案：弯液面固定装置设置有多个单独的开口50.尽管这些开口50各自被示出为圆形，但是不必如此。 开口50包围作为流体处理结构供应流体的目的地的空间。 也就是说，开口50基本上在空间的圆周上连续间隔开。 开口部50被配置成能够以平面图形成具有角部（即具有角部52的形状）的形状。 这是具有弯曲的边缘部分或侧面54的正方形。边缘部分54具有负的半径。 也就是说，在与拐角52分开的部分中，它朝向具有拐角的形状的中心弯曲。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011146738A

公开(公告)日：2011-07-28

申请号：JP2011083005

申请日：2011-04-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LIEBREGTS PAULUS MARTINUS MARIA ,  FIEN MENNO ,  LOOPSTRA ERIK R ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN

IPC: H01L21/027

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography device which is properly protected from a negative effect resulting for ultraviolet radiation and/or immersion liquid, for example. SOLUTION: A lithography device having a detachable sticky film with a coating on at least part thereof is disclosed. A liquid supply system with a liquid confinement structure extended along at least part of a boundary of a space between a projection system and a substrate support is disclosed. The film with coating exists on at least part of the liquid confinement structure. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻装置，其被适当地保护免受例如紫外线辐射和/或浸液的负面影响。 公开了一种光刻设备，其具有在其至少部分上具有涂层的可拆卸粘性膜。 公开了一种具有液体限制结构的液体供应系统，其沿着投影系统和基板支撑件之间的空间的边界的至少一部分延伸。 具有涂层的膜存在于液体限制结构的至少一部分上。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010251744A

公开(公告)日：2010-11-04

申请号：JP2010085599

申请日：2010-04-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  STEFFENS KOEN ,  KANEKO TAKESHI ,  CORCORAN GREGORY MARTIN MASON

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a device capable of removing undesired droplets from a surface of a substrate and/or a substrate table more effectively and efficiently. SOLUTION: A fluid handling system for an immersion lithography apparatus has a fluid removal device to remove immersion liquid from an immersion space, and a droplet removal device to remove a droplet of immersion liquid, wherein: the droplet removal device is located further from an optical axis than the fluid removal device, and the droplet removal device includes a porous member which faces, e.g., the substrate being exposed and/or the substrate table. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供能够更有效和高效地从基板和/或基板台的表面去除不需要的液滴的装置。 解决方案：用于浸没式光刻设备的流体处理系统具有用于从浸没空间中去除浸没液体的流体去除装置和用于去除浸液的液滴的液滴去除装置，其中：液滴去除装置位于更远处 从液体去除装置的光轴，并且液滴去除装置包括面向例如正在暴露的基板和/或基板台的多孔构件。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010219510A

公开(公告)日：2010-09-30

申请号：JP2010029605

申请日：2010-02-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HUBERTUS MULKENS JOHANNES C ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  MOERMAN RICHARD ,  RIEPEN MICHEL ,  SERGEI SHULEPOV ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  CROMWIJK JAN WILLEM ,  MEIJERS RALPH JOSEPH ,  FABRIZIO EVANGELISTA ,  BESSEMS DAVID ,  LI HUA ,  JOCHEMSEN MARINUS ,  GUNTHER PIETER LEIN JOSEPH ,  BELL FRANCISCUS WILHELMUS ,  WITBERG ERIK ,  SMITS MARCUS AGNES JOHANNES ,  MA ZHENHUA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a method of controlling the same, and a device manufacturing method, wherein defects of imaging are reduced or eliminated. SOLUTION: The method includes the steps of: moving a substrate table supporting a substrate relative to a projection system; and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, and/or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate. The step of adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation onto a target portion of the substrate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其控制方法以及减少或消除成像缺陷的器件制造方法。 解决方案：该方法包括以下步骤：相对于投影系统移动支撑衬底的衬底台; 以及在所述基板的边缘处或附近的预定区域内的目标成像期间调整所述基板台和所述投影系统之间的扫描速度，和/或调整所述基板的边缘处或其附近的预定区域中的相邻目标位置之间的步进速度 衬底的边缘。 调整扫描和/或步进速度的步骤可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010103532A

公开(公告)日：2010-05-06

申请号：JP2009237996

申请日：2009-10-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CLEMENS JOHANNES GERARDUS VAN DEN DUNGEN ,  DANNY MARIA HUBERTUS PHILIPS ,  STEFFENS KOEN ,  GUNTHER WILFRED MATHIJS ,  BESSEMS DAVID

IPC: H01L21/027 ,  H01L21/683

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling system which reduces the possibility that, for example, bubbles are formed and/or invade into a liquid immersion space. SOLUTION: In a fluid handling structure, a means for dealing with and/or preventing the formation of bubbles in a liquid immersion liquid is taken particularly in relation to the dimension and intervals of the array of the opening on the bottom surface of the fluid handling structure. A lithography apparatus is also provided. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种降低例如气泡形成和/或侵入液浸空间的可能性的流体处理系统。 解决方案：在流体处理结构中，特别是关于液浸液体中的开口阵列的尺寸和间隔的处理和/或防止在液浸液体中形成气泡的装置， 流体处理结构。 还提供了一种光刻设备。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009272640A

公开(公告)日：2009-11-19

申请号：JP2009113348

申请日：2009-05-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIREKS DANIEL JOSEPH MARIA ,  DANNY MARIA HUBERTUS PHILIPS ,  CLEMENS JOHANNES GERARDUS VAN ,  STEFFENS KOEN ,  VAN PUTTEN ARNOLD JAN ,  MAIKEL ADRIANUS CORNELIS SCHEP ,  BERKVENS PAUL PETRUS JOANNES

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To disclose a fluid handling structure where the size and structure of a fluid extraction opening are designated to reduce vibration transmitted to the fluid handling structure as a result of two-phase extraction. SOLUTION: The area of respective fluid extraction openings, the total area of all of the fluid extraction openings, and/or the space between adjacent fluid extraction openings can be controlled. When vibration decreases, precision in exposure is improved. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开流体处理结构，其中指定流体提取开口的尺寸和结构以减少作为两相抽出的结果传递到流体处理结构的振动。 解决方案：可以控制各个流体提取开口的面积，所有流体提取开口的总面积和/或相邻流体提取开口之间的空间。 当振动降低时，曝光精度提高。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：SG164338A1

公开(公告)日：2010-09-29

申请号：SG2010009934

申请日：2010-02-12

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  KEMPER NICOLAAS RUDOLF ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  MOERMAN RICHARD ,  RIEPEN MICHEL ,  SHULEPOV SERGEI ,  BRANDS GERT-JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  CROMWIJK JAN WILLEM ,  MEIJERS RALPH JOSEPH ,  EVANGELISTA FABRIZIO ,  BESSEMS DAVID ,  LI HUA ,  JOCHEMSEN MARINUS ,  GUNTER PIETER LEIN JOSEPH ,  BELL FRANCISCUS WILHELMUS ,  WITBERG ERIK ,  SMITS MARCUS AGNES JOHANNES ,  MA ZHENHUA

Abstract: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

公开(公告)号：NL2004808A

公开(公告)日：2011-01-12

申请号：NL2004808

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： PATEL HRISHIKESH ,  STEFFENS KOEN ,  LEMPENS HAN ,  LIEROP MATHIEUS ,  METSENAERE CHRISTOPHE ,  SPRUYTENBURG PATRICK ,  VERSTRAETE JORIS ,  BLOKS RUUD ,  MIRANDA MARCIO ,  JACOBS JOHANNES ,  LIEBREGTS PAULUS ,  HAM RONALD ,  SIMONS WILHELMUS ,  DIRECKS DANIEL ,  JANSSEN FRANCISCUS ,  BERKVENS PAUL ,  BRANDS GERT-JAN

IPC: G03F7/20

Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.