公开(公告)号：EP2642507A3

公开(公告)日：2015-09-02

申请号：EP13159842.7

申请日：2013-03-19

Applicant: FEI COMPANY

Inventor： Utlaut, Mark ,  Kellogg, Sean ,  Parker, N. William ,  Graupera, Anthony ,  Zhang, Shouyin ,  Brundage, Philip ,  Kinion, Doug

IPC: H01J37/08 ,  H01J37/304 ,  H01J37/305

CPC classification number: H01J37/08 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/022 ,  H01J2237/0225 ,  H01J2237/31749

Abstract: A method and apparatus for actively monitoring conditions of a plasma source for adjustment and control of the source and to detect the presence of unwanted contaminant species in a plasma reaction chamber (220). Preferred embodiments include a spectrometer (252) used to quantify components of the plasma. A system controller is provided that uses feedback loops based on spectral analysis of the plasma to regulate the ion composition of the plasma source. The system also provides end pointing means based on spectral analysis to determine when cleaning of the plasma source is completed.

公开(公告)号：EP2741075A3

公开(公告)日：2015-01-07

申请号：EP13195225.1

申请日：2013-12-02

Applicant: FEI COMPANY

Inventor： Botman, Aurélien ,  Randolph, Steven ,  Utlaut, Mark

IPC: G01N23/225

CPC classification number: B05D1/26 ,  C25D5/024 ,  C25F3/14 ,  G01N23/225 ,  Y10T137/0324

Abstract: Methods of dispensing a small amount of liquid onto a work piece includes in some embodiments known providing a microscopic channel for the liquid to flow from the nanodispenser. In some embodiments, dispensing the liquid includes dispensing the liquid using a nanodispenser have at least one slit extending to the tip. Some methods include controlling the rate of evaporation or the rate of liquid flow to establish an equilibrium producing a bubble of a desired size.

公开(公告)号：EP2600381A3

公开(公告)日：2015-01-07

申请号：EP12194645.3

申请日：2012-11-28

Applicant: FEI COMPANY

Inventor： Kellogg, Sean ,  Graupera, Anthony ,  Parker, N. William ,  Wells, Andrew ,  Utlaut, Mark ,  Skoczylas, Walter ,  Schwind, Gregory ,  Zhang, Shouyin ,  Smith, Noel

IPC: H01J37/08 ,  H01J37/04 ,  H01J27/02 ,  H01J27/16

CPC classification number: H01J37/32605 ,  H01J9/02 ,  H01J27/16 ,  H01J37/04 ,  H01J37/08 ,  H01J2237/032

Abstract: An inductively coupled plasma charged particle source (100, 200, 300, 400, 500, 600) for focused ion beam systems includes a plasma reaction chamber (102, 202, 302, 402, 502, 602) with a removably attached source electrode (106, 206, 306, 406, 506, 606). A fastening mechanism (104, 204, 304, 404, 504) connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.

Abstract translation: 用于聚焦离子束系统的电感耦合等离子体带电粒子源（100,200,300,400,500,600）包括具有可移除地附接的源电极（102,202,302,402,502,602）的等离子体反应室 106,206,306,406,506,606）。 紧固机构（104,204,304,404,504）将源电极与等离子体反应室连接，并且允许形成导热的真空密封。 使用可移除的源电极，现在可以提高等离子体源管的可维护性和再利用性。

公开(公告)号：EP2741075A2

公开(公告)日：2014-06-11

申请号：EP13195225.1

申请日：2013-12-02

Applicant: FEI COMPANY

Inventor： Botman, Aurélien ,  Randolph, Steven ,  Utlaut, Mark

IPC: G01N23/225

CPC classification number: B05D1/26 ,  C25D5/024 ,  C25F3/14 ,  G01N23/225 ,  Y10T137/0324

Abstract: Methods of dispensing a small amount of liquid onto a work piece includes in some embodiments known providing a microscopic channel for the liquid to flow from the nanodispenser. In some embodiments, dispensing the liquid includes dispensing the liquid using a nanodispenser have at least one slit extending to the tip. Some methods include controlling the rate of evaporation or the rate of liquid flow to establish an equilibrium producing a bubble of a desired size.

Abstract translation: 将少量液体分配到工件上的方法包括在一些实施方案中已知提供用于使液体从纳米分配器流出的微观通道。 在一些实施例中，分配液体包括使用具有延伸到尖端的至少一个狭缝的纳米分配器来分配液体。 一些方法包括控制蒸发速率或液体流速以建立产生所需尺寸的气泡的平衡。

公开(公告)号：EP2674742A3

公开(公告)日：2014-02-12

申请号：EP13171169.9

申请日：2013-06-10

Applicant: FEI COMPANY

Inventor： Wells, Andrew ,  Parker, N. William ,  Chandler, Clive ,  Utlaut, Mark

IPC: G01N1/32

CPC classification number: G01N1/32 ,  H01J37/3023 ,  H01J37/3056 ,  H01J2237/31745

Abstract: A method and system for creating a substantially planar face in a substrate, the method including directing one or more beams at a first surface of a substrate to remove material from a first location in the substrate, the beam being offset from a normal to the first surface by a nonzero curtaining angle; sweeping the one or more beams in a plane that is perpendicular to the first surface to mill one or more initial cuts in the substrate, the initial cuts exposing a second surface that is substantially perpendicular to the first surface; rotating the substrate through a nonzero rotation angle about an axis other than an axis that is normal to the first beam or parallel to the first beam; directing the first beam at the second surface to remove additional material from the substrate without changing the first nonzero curtaining angle; and scanning the one or more beams in a pattern across the second surface to mill one or more finishing cuts in the substrate.

公开(公告)号：EP2191927B1

公开(公告)日：2014-01-08

申请号：EP09176974.5

申请日：2009-11-25

Applicant: FEI COMPANY

Inventor： Straw, Marcus ,  Toth, Milos ,  Utlaut, Mark ,  Randolph, Steven ,  Lysaght, Michael

IPC: B23K26/18 ,  B23K26/36 ,  B23K26/06 ,  G03F7/004 ,  G03F7/20

CPC classification number: G21G5/00 ,  B23K26/0624 ,  B23K26/0661 ,  B23K26/18 ,  B23K2201/40 ,  B23K2201/42 ,  G03F7/70383 ,  H01J37/228 ,  H01J2237/31749

公开(公告)号：EP2680295A2

公开(公告)日：2014-01-01

申请号：EP13173909.6

申请日：2013-06-27

Applicant: FEI COMPANY

Inventor： Graupera, Anthony ,  Parker, N. William ,  Utlaut, Mark

IPC: H01J37/244 ,  H01J37/28

CPC classification number: H01J37/256 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2448

Abstract: A split grid multi-channel secondary particle detector for a charged particle beam system includes a first grid segment and a second grid segment, each having independent bias voltages creating an electric field such that the on-axis secondary particles that are emitted from the target are directed to one of the grids. The bias voltages of the grids can be changed or reversed so that each grid can be used to detect the secondary particles and the multi-channel particle detector as a whole can extend its lifetime.

Abstract translation: 用于带电粒子束系统的分裂网格多通道二次粒子检测器包括第一栅格区段和第二栅极区段，每个区段具有独立的偏置电压，产生电场，使得从靶发射的轴上二次颗粒为 指向其中一个网格。 网格的偏置电压可以改变或反转，因此每个网格可以用于检测二次粒子，并且多通道粒子检测器作为一个整体可以延长其寿命。

公开(公告)号：EP2511935A1

公开(公告)日：2012-10-17

申请号：EP12164205.2

申请日：2012-04-16

Applicant: FEI Company

Inventor： Tuggle, David ,  Parker, N. William ,  Utlaut, Mark

IPC: H01J37/05

CPC classification number: H01J37/05 ,  H01J37/317 ,  H01J2237/053 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/31749

Abstract: A mass filter for an ion beam system includes at least two stages (306U,306L) and reduces chromatic aberration. One embodiment includes two symmetrical mass filter stages, the combination of which reduces or eliminates chromatic aberration, and entrance and exit fringing field errors. Embodiments can also prevent neutral particles from reaching the sample surface and avoid crossovers in the beam path. In one embodiment, the filter can pass a single species of ion from a source that produces multiple species. In other embodiments, the filter can pass a single ion species with a range of energies and focus the multi-energetic ions at the same point on the substrate surface.

Abstract translation: 用于离子束系统的质量过滤器包括至少两个级（306U，306L）并且减少色差。 一个实施例包括两个对称质量过滤器级，其组合减少或消除色差，以及入射和出射边缘场误差。 实施例还可以防止中性粒子到达样品表面，并避免光束路径中的交叉。 在一个实施方案中，过滤器可以从产生多种物质的源传递单种离子。 在其它实施例中，过滤器可以通过具有一定能量范围的单个离子种类并将多能量离子聚焦在衬底表面上的相同点。

公开(公告)号：EP2482061A2

公开(公告)日：2012-08-01

申请号：EP12152791.5

申请日：2012-01-27

Applicant: FEI Company

Inventor： Parker, N. William ,  Utlaut, Mark

IPC: G01N23/225 ,  H01J37/28 ,  G01N21/64

CPC classification number: G01N21/6428 ,  G01N21/6458 ,  G01N21/6486 ,  G01N23/225 ,  H01J37/228 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/206 ,  H01J2237/2443 ,  H01J2237/24455 ,  H01J2237/2448 ,  H01J2237/2803 ,  H01J2237/2857

Abstract: A method and system for the imaging and localization of fluorescent markers such as fluorescent proteins or quantum dots within biological samples is disclosed. The use of recombinant genetics technology to insert "reporter" genes into many species is well established. In particular, green fluorescent proteins (GFPs) and their genetically-modified variants ranging from blue to yellow, are easily spliced into many genomes at the sites of genes of interest (Gols), where the GFPs are expressed with no apparent effect on the functioning of the proteins of interest (Pols) coded for by the Gols. One goal of biologists is more precise localization of Pols within cells. The invention is a method and system for enabling more rapid and precise Pol localization using charged particle beam-induced damage to GFPs. Multiple embodiments of systems for implementing the method are presented, along with an image processing method relatively immune to high statistical noise levels. Fig. 3

Abstract translation: 一种用于成像和荧光标记物的定位方法和系统：如荧光蛋白或生物样品中的量子点是游离缺失盘。 插入“记者”的基因分为许多种类，利用重组遗传学技术已经非常成熟。 特别是绿色荧光蛋白（GFP）及其转基因变种，从蓝色到黄色，很容易被拼接成许多基因在其中的GFP过表达与功能上没有明显效果的利息（GOLS），基因位点 感兴趣的（极）由GOLS编码蛋白质。 生物学家的一个目标是细胞内的极的更精确的定位。 本发明是用于使用到的GFP极带电粒子束诱导的损伤实现更快速和精确定位的方法和系统。 的用于实现该方法系统的多个实施例是，与图像处理方法相对不受高统计噪声水平沿。 图3

公开(公告)号：EP1524681A3

公开(公告)日：2006-06-21

申请号：EP04077809.4

申请日：2004-10-13

Applicant: FEI COMPANY

Inventor： Gerlach, Robert L. ,  Utlaut, Mark

IPC: H01J37/317

CPC classification number: H01J37/3056 ,  B82Y10/00 ,  H01J37/3007 ,  H01J37/3178 ,  H01J2237/045 ,  H01J2237/31744 ,  H01J2237/31755

Abstract: The present invention provides improved angular aperture schemes for generating shaped beam spots having a desired geometric shape from rectangular, elliptical, and semi-elliptical apertures having one sharp edge. A sharper beam edge can be generated by offsetting the rectangular or elliptical aperture in combination with under or over focus. In the spherical aberration limit, under-focused semi-circle apertures provide a sharp, flat edge. The sharp edge can be made resolute enough for precision milling applications, and at the same time, the spot can be made large enough with enough overall current and current density to efficiently mill away material in either a production or laboratory environment. Depending on the particular beam spot that is desired, combinations of techniques including defocusing, aperture offsetting, and stigmation adjustment, can be used in both spherical aberration dominant and chromatic aberration dominant environments to achieve a desired beam for a desired application.