公开(公告)号：SG123748A1

公开(公告)日：2006-07-26

申请号：SG200508283

申请日：2005-12-21

Applicant: ASML NETHERLANDS BV

Inventor： SIMON KLAUS

Abstract: An imprinting method is disclosed that, in embodiment, includes contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium and separating the first and second templates from the imprinted medium.

公开(公告)号：SG123681A1

公开(公告)日：2006-07-26

申请号：SG200507762

申请日：2005-12-02

Applicant: ASML NETHERLANDS BV

Inventor： SIMON KLAUS ,  BRINK VAN DEN ENNO ,  KEIJSERS GERARDUS JOHANNES JOS ,  DIJK VAN ADRIANUS HUBERTUS HEN ,  BAIJENS HUBERTUS ANTONIUS MARI

Abstract: An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for removing gas from an area between the projection system and the substrate.

公开(公告)号：SG109000A1

公开(公告)日：2005-02-28

申请号：SG200404370

申请日：2004-07-14

Applicant: ASML NETHERLANDS BV

Inventor： STREEFKERK BOB ,  DERKSEN ANTONIUS THEODORUS ANN ,  LOF JOERI ,  SIMON KLAUS ,  STRAAIJER ALEXANDER

IPC: H01L21/027 ,  G03F7/20

Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

公开(公告)号：SG152931A1

公开(公告)日：2009-06-29

申请号：SG2007177637

申请日：2004-06-08

Applicant: ASML NETHERLANDS BV

Inventor： LOF JOERI ,  BUTLER HANS ,  DONDERS SJOERD NOCOLAAS LAMBERTUS ,  KOLESNYCHENKO ALLEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA MARIA

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus is disclosed in which the space between the final element of the projection system and a sensor is filled with a liquid.

公开(公告)号：SG121829A1

公开(公告)日：2006-05-26

申请号：SG200306929

申请日：2003-11-27

Applicant: ASML NETHERLANDS BV

Inventor： SIMON KLAUS ,  LOF JOERI ,  MINNAERT ARTHUR WINFRIED EDUAR ,  SMEETS ERIK MARIE JOSE

IPC: B01J19/00 ,  B81C1/00 ,  C40B60/14 ,  G03F7/00 ,  G03F7/20

Abstract: A flowcell including a plurality of separate chambers is provided on the substrate table so that a fluid can be brought into contact with exposed areas of the substrate to interact therewith. A series of exposures and chemical processes can thereby be carried out without removing the substrate from the substrate table.

公开(公告)号：SG121819A1

公开(公告)日：2006-05-26

申请号：SG200306759

申请日：2003-11-11

Applicant: ASML NETHERLANDS BV

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGEDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK VAN FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  SMIT DE JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  SANTEN VAN HELMAR

IPC: G03F7/00 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

公开(公告)号：SG2010050110A

公开(公告)日：2014-06-27

申请号：SG2010050110

申请日：2003-11-11

Applicant: ASML NETHERLANDS BV

Inventor： LOF JOERI ,  DERKSEN ANTONIUS THEODORUS ANNA MARIA ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

公开(公告)号：AT506635T

公开(公告)日：2011-05-15

申请号：AT06255420

申请日：2006-10-21

Applicant: ASML NETHERLANDS BV

Inventor： SIMON KLAUS

IPC: G03F7/00

公开(公告)号：DE60319658T2

公开(公告)日：2009-04-02

申请号：DE60319658

申请日：2003-11-27

Applicant: ASML NETHERLANDS BV

Inventor： SIMON KLAUS ,  LOF JOERI ,  MINNAERT ARTHUR WINIFRED EDUARDUS ,  SMEETS ERIK MARIE JOSE

IPC: G03F7/20 ,  B01J19/00 ,  B81C1/00 ,  C40B60/14

Abstract: A flowcell including a plurality of separate chambers is provided on the substrate table so that a fluid can be brought into contact with exposed areas of the substrate to interact therewith. A series of exposures and chemical processes can thereby be carried out without removing the substrate from the substrate table.

公开(公告)号：SG135052A1

公开(公告)日：2007-09-28

申请号：SG2006002281

申请日：2003-11-11

Applicant: ASML NETHERLANDS BV

Inventor： LOF JOERI ,  DERKSEN ANTONIUS THEODORUS ANN ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: In a lithographic projection apparatus a seal member surrounds a space between the final element of a projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said seal member and the surface of said substrate to contain liquid in the space.