公开(公告)号：NL2004085A

公开(公告)日：2010-09-14

申请号：NL2004085

申请日：2010-01-13

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  SWINKELS GERARDUS ,  ZUTPHEN TOM ,  LABETSKI DZMITRY

IPC: G03F7/20 ,  H05G2/00

Abstract: A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section of the trajectory downstream of a plasma initiation site.

公开(公告)号：NL2005034A

公开(公告)日：2010-09-13

申请号：NL2005034

申请日：2010-07-06

Applicant: ASML NETHERLANDS BV

Inventor： LABETSKI DZMITRY ,  LOOPSTRA ERIK ,  KEMPEN ANTONIUS

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2009241A

公开(公告)日：2013-03-05

申请号：NL2009241

申请日：2012-07-27

Applicant: ASML NETHERLANDS BV

Inventor： KEMPEN ANTONIUS ,  LOOPSTRA ERIK ,  RENTROP CORNE ,  GRAAF DENNIS ,  GUBBELS FRITS ,  HAYES GREGORY RICHARD ,  WIEL BART

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2009197A

公开(公告)日：2013-02-27

申请号：NL2009197

申请日：2012-07-17

Applicant: ASML NETHERLANDS BV

Inventor： EIJK JAN ,  LOOPSTRA ERIK ,  PASCH ENGELBERTUS ,  VERMEULEN JOHANNES

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：SG183434A1

公开(公告)日：2012-09-27

申请号：SG2012062014

申请日：2011-01-31

Applicant: ASML NETHERLANDS BV

Inventor： LABETSKI DZMITRY ,  BANINE VADIM ,  LOOPSTRA ERIK ,  YAKUNIN ANDREI

Abstract: A radiation source for generating extreme ultraviolet radiation for a lithographic apparatus has a debris mitigation device comprising a nozzle arranged at or near an intermediate focus (IF) of the beam of radiation. The nozzle serves to direct a flow of gas (330) towards the radiation source or collector optic in order to deflect particulate debris (43) emitted by the radiation source.

公开(公告)号：NL2007861A

公开(公告)日：2011-12-19

申请号：NL2007861

申请日：2011-11-24

Applicant: ASML NETHERLANDS BV

Inventor： WAGNER CHRISTIAN ,  LOOPSTRA ERIK

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：AT536567T

公开(公告)日：2011-12-15

申请号：AT09165403

申请日：2009-07-14

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  SCHIMMEL HENDRIKUS

IPC: G03F7/20 ,  H05G2/00

Abstract: A radiation source is configured to generate radiation. The radiation source includes a fuel droplet generator (6) constructed and arranged to generate a stream of droplets of fuel (34) that are directed to a plasma generation site (32); a laser constructed and arranged to generate a laser beam (4) that is directed to the plasma generation site, an angle between the direction of movement of the stream of droplets and the direction of the laser beam being less than about 90°; and a collector (8) constructed and arranged to collect radiation generated by a plasma formed at the plasma formation site when the beam of radiation and a droplet collide. The collector is configured to reflect the radiation substantially along an optical axis of the radiation source. The laser beam is directed to the plasma generation site through an aperture provided in the collector.

公开(公告)号：NL2007628A

公开(公告)日：2011-11-23

申请号：NL2007628

申请日：2011-10-20

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  PEKELDER SVEN ,  NIENHUYS HAN-KWANG

IPC: G03F7/20

公开(公告)号：NL2006601A

公开(公告)日：2011-06-09

申请号：NL2006601

申请日：2011-04-14

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  LOOPSTRA ERIK ,  CADEE THEODORUS ,  AKKERMANS JOHANNES ,  SCACCABAROZZI LUIGI

IPC: G03F7/20 ,  H01L21/687

公开(公告)号：NL2006106A

公开(公告)日：2011-02-17

申请号：NL2006106

申请日：2011-01-31

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  BANINE VADIM ,  IVANOV VLADIMIR ,  MOORS JOHANNES ,  SWINKELS GERARDUS ,  KEMPEN ANTONIUS ,  YAKUNIN ANDREI

IPC: G03F7/20