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    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.
    12.
    发明专利
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. 未知

    公开(公告)号：NL2006190A

    公开(公告)日：2011-09-13

    申请号：NL2006190

    申请日：2011-02-11

    Applicant: ASML NETHERLANDS BV

    Inventor： VALENTIN CHRISTIAAN LOUIS ,  VERMEULEN JOHANNES ,  GROOT ANTONIUS ,  MUNNIG SCHMIDT ROBERT-HAN ,  BREE BARTHOLOMEUS

    IPC: G03F7/20

    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.

    IMPRINT LITHOGRAPHY APPARATUS.
    15.
    发明专利
    IMPRINT LITHOGRAPHY APPARATUS. 未知

    公开(公告)号：NL2004680A

    公开(公告)日：2011-01-10

    申请号：NL2004680

    申请日：2010-05-06

    Applicant: ASML NETHERLANDS BV

    Inventor： VERMEULEN JOHANNES ,  JEUNINK ANDRE ,  KRUIJT-STEGEMAN YVONNE

    IPC: G03F7/00

    Abstract: An imprint lithography apparatus is disclosed. The apparatus includes an electromagnetic Lorentz actuator arrangement configured to move an imprint template arrangement, the electromagnetic Lorentz actuator arrangement comprising: an array of magnets; and an array of conductors, each conductor configured to carry an electric current, one of the array of magnets or the array of conductors being moveable and connected to the imprint template arrangement, and the other of the array of magnets or the array of conductors extending at least partially around or forming a part of a substrate holder; the array of magnets and the array of conductors together being in a configuration which facilitates moving of the moveable one of the array of magnets or the array of conductors in six degrees of freedom, such that the imprint template arrangement is also movable in six degrees of freedom.

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.
    18.
    发明专利
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. 未知

    公开(公告)号：NL2003528A

    公开(公告)日：2010-04-26

    申请号：NL2003528

    申请日：2009-09-23

    Applicant: ASML NETHERLANDS BV

    Inventor： LAFARRE RAYMOND ,  VERMEULEN JOHANNES ,  ZUIDEMA PATRICK

    IPC: G03F9/00

    Abstract: A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate. The apparatus is provided with a clamp, including a support part configured to support the patterning device or the substrate and a temperature control part configured to control the temperature of the patterning device or the substrate. The clamp is constructed to mechanically isolate the temperature control part from the support part with a flexible connector so that vibrations, shrink and expansion of the temperature control part will not influence the patterning device and/or the substrate.

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