公开(公告)号：NL2006180A

公开(公告)日：2011-09-13

申请号：NL2006180

申请日：2011-02-11

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  JACOBS JOHANNES ,  YOUSEFI MIRVAIS ,  ENGELMANN MICHAEL ,  HARMSMA PETER

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/68

公开(公告)号：NL2005259A

公开(公告)日：2011-03-30

申请号：NL2005259

申请日：2010-08-24

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  BANINE VADIM ,  JEUNINK ANDRE ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE

IPC: G03F7/00

Abstract: A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.

公开(公告)号：NL2003414A

公开(公告)日：2010-04-08

申请号：NL2003414

申请日：2009-09-01

Applicant: ASML NETHERLANDS BV

Inventor： CORBEIJ WILHELMUS ,  BOEF ARIE ,  MOS EVERHARDUS

IPC: G01N21/47 ,  G03F7/40

Abstract: A method and apparatus for measurement of a characteristic of a substrate. A target is present on the substrate and a measurement is performed during a scanning movement of the substrate. The scanning movement of the substrate is a linear movement and the measurement includes obtaining a reflected image of the target using a pulsed light source, the duration of a single light pulse being less than 100 psec. A lithographic apparatus includes such a measurement apparatus, and a device manufacturing method includes such a measurement method.

公开(公告)号：NL2009273A

公开(公告)日：2013-03-04

申请号：NL2009273

申请日：2012-08-03

Applicant: ASML NETHERLANDS BV

Inventor： MATHIJSSEN SIMON ,  BOEF ARIE

IPC: G03F7/20

公开(公告)号：NL2009239A

公开(公告)日：2013-03-04

申请号：NL2009239

申请日：2012-07-27

Applicant: ASML NETHERLANDS BV

Inventor： JAGER PIETER ,  BLEEKER ARNO ,  BOEF ARIE ,  LOOPSTRA ERIK ,  PANDEY NITESH

IPC: G03F7/20

公开(公告)号：NL2008110A

公开(公告)日：2012-08-21

申请号：NL2008110

申请日：2012-01-12

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  BEEMS MARCEL ,  CADEE THEODORUS ,  LAFARRE RAYMOND

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2006692A

公开(公告)日：2011-06-09

申请号：NL2006692

申请日：2011-04-29

Applicant: ASML NETHERLANDS BV

Inventor： VAINIR YURI ,  BANINE VADIM ,  BOEF ARIE ,  SCACCABAROZZI LUIGI

IPC: G03F7/20 ,  H01L21/66

公开(公告)号：NL2005332A

公开(公告)日：2011-04-14

申请号：NL2005332

申请日：2010-09-08

Applicant: ASML NETHERLANDS BV

Inventor： VERSTAPPEN LEONARDUS ,  BOEF ARIE

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL2005192A

公开(公告)日：2011-02-28

申请号：NL2005192

申请日：2010-08-05

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  BLEEKER ARNO ,  BOEF ARIE ,  KOOLEN ARMAND ,  PELLEMANS HENRICUS ,  PLUG REINDER ,  COENE WILLEM

IPC: G03F7/20 ,  G01N21/47

Abstract: A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.

公开(公告)号：NL2004949A

公开(公告)日：2011-02-22

申请号：NL2004949

申请日：2010-06-23

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  BANINE VADIM ,  WUISTER SANDER ,  SCACCABAROZZI LUIGI

IPC: G03F7/00

Abstract: In an aspect, an inspection method for detecting the presence or absence of a defect on an object, the object comprising a recess having a physical depth, is disclosed. The method includes directing radiation at the object, the radiation having a wavelength that is substantially equal to twice an optical depth of the recess, detecting radiation that is re-directed by the object or a defect on the object, and determining the presence or absence of a defect from the re-directed radiation.