公开(公告)号：GB2488250A

公开(公告)日：2012-08-22

申请号：GB201203583

申请日：2010-11-26

Applicant: IBM

Inventor： CHENG JOY ,  HINSBERG WILLIAM ,  WALLRAFF GREGORY MICHAEL ,  TRUONG HOA ,  SUNDBERG LINDA KARIN ,  ITO HIROSHI ,  SANDERS DANIEL PAUL ,  KIM HO-CHEOL ,  NA YOUNG-HYE

IPC: G03F7/16 ,  B81C1/00 ,  G03F7/20 ,  G03F7/32

Abstract: A method of forming a layered structure comprising a domain pattern of a self-assembled material comprises: disposing on a substrate a photoresist layer comprising a non-crosslinking photoresist; optionally baking the photoresist layer; pattern- wise exposing the photoresist layer to first radiation; optionally baking the exposed photoresist layer; and developing the exposed photoresist layer with a non-alkaline developer to form a negative-tone patterned photoresist layer comprising non-crosslinked developed photoresist; wherein the developed photoresist is not soluble in a given organic solvent suitable for casting a given material capable of self-assembly, and the developed photoresist is soluble in an aqueous alkaline developer and/or a second organic solvent. A solution comprising the given material capable of self-assembly dissolved in the given organic solvent is casted on the patterned photoresist layer, and the given organic solvent is removed. The casted given material is allowed to self-assemble while optionally heating and/or annealing the casted given material, thereby forming the layered structure comprising the domain pattern of the self-assembled given material.

公开(公告)号：DE69324439T2

公开(公告)日：1999-11-25

申请号：DE69324439

申请日：1993-10-29

Applicant: IBM

Inventor： BREYTA GREGORY ,  CLECAK NICHOLAS JEFFRIES ,  HINSBERG III WILLIAM DINAN ,  HOFER DONALD CLIFFORD ,  ITO HIROSHI ,  MACDONALD SCOTT ARTHUR ,  SOORIJAKUMARAN RATMAN

IPC: G03F1/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/16 ,  G03F7/38 ,  H01L21/027 ,  H01L21/47

Abstract: A lithographic imaging process is provided for use in the manufacture of integrated circuits. A substrate is coated with a polymeric film comprising a vinyl polymer, a photosensitive acid generator, and acid labile groups. It is then heated to typically just above the glass transition temperature of the polymer, but below the cleavage temperature of the acid labile groups. The film is then expose imagewise to radiation to generate free acid, and the film is once more heated, again to typically just above the glass transition temperature of the polymer, but below the cleavage temperature of the acid labile groups. Finally the image is developed. The process provides protection to the photoresist film from airborne chemical contaminants.

公开(公告)号：SG52851A1

公开(公告)日：1998-09-28

申请号：SG1996010825

申请日：1996-10-07

Applicant: IBM

Inventor： BREYTA GREGORY ,  DIPIETRO RICHARD ANTHONY ,  HOFER DONALD CLIFFORD ,  ITO HIROSHI

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  H01L21/312

Abstract: A radiation sensitive resist compsn. comprises: (a) bis (lower alkyl phenyl) iodonium camphor sulphonate; and (b) a copolymer comprising hydroxystyrene and (meth)acrylate having an acid-clearable substituent.

公开(公告)号：DE3750937T2

公开(公告)日：1995-07-13

申请号：DE3750937

申请日：1987-06-16

Applicant: IBM

Inventor： BRUNSVOLD WILLIAM ROSS ,  CROCKATT DALE MURRAY ,  CHOW MING-FEA ,  FRECHET JEAN-MARIE JOSEPH ,  CONLEY WILLARD EARL ,  HEFFERSON GEORGE JOSEPH ,  ITO HIROSHI ,  IWAMOTO NANCY ELLEN ,  WILLSON CARLTON GRANT

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

公开(公告)号：ES2065882T3

公开(公告)日：1995-03-01

申请号：ES87108644

申请日：1987-06-16

Applicant: IBM

Inventor： BRUNSVOLD WILLIAM ROSS ,  CROCKATT DALE MURRAY ,  CHOW MING-FEA ,  FRECHET JEAN-MARIE JOSEPH ,  CONLEY WILLARD EARL ,  HEFFERSON GEORGE JOSEPH ,  ITO HIROSHI ,  IWAMOTO NANCY ELLEN ,  WILLSON CARLTON GRANT

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

公开(公告)号：DE3584305D1

公开(公告)日：1991-11-14

申请号：DE3584305

申请日：1985-04-11

Applicant: IBM

Inventor： ITO HIROSHI ,  MACDONALD SCOTT ARTHUR ,  MILLER ROBERT DENNIS ,  WILLSON CARLTON GRANT

IPC: G03F7/30 ,  G03F7/038 ,  G03F7/039 ,  G03F7/26 ,  G03F7/36 ,  G03F7/38 ,  H01L21/027 ,  G03F7/09

Abstract: A negative tone resist image is produced by the successive steps of exposing a film to a pattern of radiation, the film having such a composition that after exposure to the radiation it contains a polymer which reacts with an organometallic reagent; treating the exposed film with the organometallic reagent; and developing a relief image by further treating the exposed film with an oxygen plasma.

公开(公告)号：DE3382401D1

公开(公告)日：1991-10-10

申请号：DE3382401

申请日：1983-05-02

Applicant: IBM

Inventor： ITO HIROSHI ,  WILLSON CARLTON GRANT ,  FRECHET JEAN M J

IPC: C08K5/00 ,  C08F8/00 ,  C08L33/00 ,  C08L33/02 ,  G03F7/004 ,  G03F7/021 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  H01L21/027 ,  G03F7/16 ,  G03F7/029

公开(公告)号：GB2487130B

公开(公告)日：2014-01-08

申请号：GB201200148

申请日：2010-08-31

Applicant: IBM

Inventor： ITO HIROSHI ,  TRUONG HOA ,  CHENG JOY ,  KIM HO-CHEOL

IPC: C08G63/00 ,  C08L35/00 ,  G03C1/73

Abstract: Bilayer systems include a bottom layer formed of polydimethylglutarimide, an acid labile dissolution inhibitor and a photoacid generator. The bilayer system can be exposed and developed in a single exposure and development process.

公开(公告)号：DE69618752T2

公开(公告)日：2002-09-12

申请号：DE69618752

申请日：1996-10-01

Applicant: IBM

Inventor： BREYTA GREGORY ,  DIPIETRO RICHARD A ,  HOFER DONALD C ,  ITO HIROSHI

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: A radiation sensitive resist compsn. comprises: (a) bis (lower alkyl phenyl) iodonium camphor sulphonate; and (b) a copolymer comprising hydroxystyrene and (meth)acrylate having an acid-clearable substituent.

公开(公告)号：DE69618752D1

公开(公告)日：2002-03-14

申请号：DE69618752

申请日：1996-10-01

Applicant: IBM

Inventor： BREYTA GREGORY ,  DIPIETRO RICHARD A ,  HOFER DONALD C ,  ITO HIROSHI

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: A radiation sensitive resist compsn. comprises: (a) bis (lower alkyl phenyl) iodonium camphor sulphonate; and (b) a copolymer comprising hydroxystyrene and (meth)acrylate having an acid-clearable substituent.