公开(公告)号：SG132659A1

公开(公告)日：2007-06-28

申请号：SG2006083406

申请日：2006-11-29

Applicant: ASML NETHERLANDS BV

Inventor： VAN HERPEN MAARTEN MARINUS JOH ,  KLUNDER DERK JAN WILFRED ,  MOORS JOHANNES HUBERTUS JOSEPH

Abstract: A radiation system for generating a beam of radiation is disclosed. The radiation system includes a pulsed EUV source for generating EUV radiation, and a spectral filter mounted in front of the EUV source for selectively passing a spectral range of a beam of EUV radiation from the EUV source. The spectral filter is mounted on a movable mount configured to be moved in synchronicity with the pulsed EUV source to prevent debris traveling from the EUV source from impacting the spectral filter. Accordingly, the spectral filter is kept substantially free from contamination by the debris.

公开(公告)号：DE60125105T2

公开(公告)日：2007-06-06

申请号：DE60125105

申请日：2001-07-06

Applicant: ASML NETHERLANDS BV

Inventor： BENSCHOP JOZEF PETRUS HENRICUS ,  NOORDMAN OSCAR FRANSISCUS JOZE ,  RENKENS MICHAEL JOZEFA MATHIJS ,  LOOPSTRA ERIK ROELOF ,  BANINE VADIM YEVGENYEVICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  VAN DIJSSELDONK ANTONIUS JOHAN

IPC: G01B21/00 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus includes a radiation system for supplying a projection beam PB of radiation having a propagation direction, a support structure MT for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern MA, a substrate table WT for holding a substrate and a projection system PL for projecting the patterned beam PB onto a target portion C of the substrate W, wherein the lithographic projection apparatus further comprises a sensor MM for measuring a movement of the projection beam PB perpendicular to its propagation direction and a controller CM to control a received dose of said projection beam PM on a target portion C of the substrate W in response to an output from said sensor MM.

公开(公告)号：SG131060A1

公开(公告)日：2007-04-26

申请号：SG2006063077

申请日：2006-09-12

Applicant: ASML NETHERLANDS BV

Inventor： RAKHIMOVA TATYANA VICTOROVNA ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  MOORS JOHANNES HUBERTUS JOSEPH ,  KOVALEV ALEKSANDER SERGEEVICH ,  LOPAEV DMITRIY VICTOROVICH

Abstract: A method for cleaning elements of a lithographic apparatus, for example optical elements such as a collector mirror, includes providing a gas containing nitrogen; generating nitrogen radicals from at least part of the gas, thereby forming a radical containing gas; and providing at least part of the radical containing gas to the one or more elements of the apparatus. A lithographic apparatus includes a source and an optical element, and an electrical discharge generator arranged to generate a radio frequency discharge.

公开(公告)号：DE60118669T2

公开(公告)日：2007-01-11

申请号：DE60118669

申请日：2001-08-23

Applicant: ASML NETHERLANDS BV

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  BANINE VADIM YEVGENYEVICH ,  LEENDERS MARTINUS HENDRIKUS AN ,  WERIJ HENRI GERARD CATO ,  VISSER HUGO MATTHIEU ,  HEERENS GERRIT-JAN ,  HAM ERIK LEONARDUS ,  MEILING HANS ,  LOOPSTRA EROK ROELOF ,  DONDERS SJOERD NICOLAAS LAMBER

IPC: G03F1/14 ,  G03F7/20 ,  H01L21/027 ,  H01L21/673 ,  H01L21/677

Abstract: In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.

公开(公告)号：SG113566A1

公开(公告)日：2005-08-29

申请号：SG200500186

申请日：2005-01-13

Applicant: ASML NETHERLANDS BV

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  FRANKEN JOHANNES CHRISTIAN LEO ,  MICKAN UWE ,  VOORMA HARM-JAN

IPC: G02B17/00 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus comprising an illumination system (IL) for providing a projection beam of radiation (PB), a support structure (MT) for supporting patterning means (MA), the patterning means (MA) serving to impart the projection beam (PB) with a pattern in its cross-section. The apparatus further comprises a substrate table (WT) for holding a substrate (W), a projection system (PL) for projecting the patterned beam onto a target portion of the substrate (W), and a collector (1; 101; 201) which is arranged for transmitting radiation (R), received from a first radiation source (SO), to the illumination system (IL). The apparatus comprises at least a heater (2; 102; 202) for heating the collector (1; 101; 201) when the collector receives substantially no radiation from the first radiation source (SO). The invention further provides a device manufacturing method as well as a device manufactured thereby.

公开(公告)号：DE102008041801A1

公开(公告)日：2010-03-04

申请号：DE102008041801

申请日：2008-09-03

Applicant: ZEISS CARL SMT AG ,  ASML NETHERLANDS BV

Inventor： EHM DIRK HEINRICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  YAKUNIN ANDREI M ,  BANINE VADIM YEVGENYEVICH ,  DENGEL GUENTHER

IPC: G03F7/20

Abstract: The system (1) has a lighting device (2) for illuminating structures arranged on a reticle (3), such that the structures are imaged on a wafer stage (5) by a projection lens (4). A sigma-aperture is provided in the lighting device and/or an aperture diaphragm is provided in the projection lens. A spectral filter is detachably arranged in the spectral aperture and/or aperture diaphragm, and is transparent for extreme UV-radiation. The sigma-aperture is arranged at a pupil reflector or pupil facet reflector.

公开(公告)号：NL1036769A1

公开(公告)日：2009-10-26

申请号：NL1036769

申请日：2009-03-25

Applicant: ASML NETHERLANDS BV

Inventor： SCACCABAROZZI LUIGI ,  IVANOV VLADIMIR VITALEVICH ,  KOSHELEV KONSTANTIN NIKOLAEVICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  STEVENS LUCAS HENRICUS JOHANNE ,  ANTSIFEROV PAVEL STANISLAVOVICH ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  DOROKHIN LEONID ALEXANDROVICH ,  KAMPEN MAARTEN VAN

IPC: G03F7/20

公开(公告)号：NL1035863A1

公开(公告)日：2009-02-24

申请号：NL1035863

申请日：2008-08-25

Applicant: ASML NETHERLANDS BV

Inventor： EMPEL TJARKO ADRIAAN RUDOLF VAN ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVICH ,  LOOPSTRA ERIK ROELOF ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SCHOOT JAN BERNARD PLECHELMUS ,  VIJVER YURI JOHANNES GABRIEL VAN DE ,  SWINKELS GERARDUS HUBERTUS PETRUS MARIA ,  SCHIMMEL HENDRIKUS GIJSBERTUS ,  LABETSKI DZMITRY

IPC: H05G2/00 ,  G03F7/20

公开(公告)号：DE60225216D1

公开(公告)日：2008-04-10

申请号：DE60225216

申请日：2002-09-06

Applicant: ASML NETHERLANDS BV

Inventor： LEENDERS MARTINUS HENDRIKUS AN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  LOOPSTRA ERIK ROELOF ,  GILISSEN NOUD JAN ,  EURLINGS MARKUS F A

IPC: G03F7/20 ,  G21K1/04 ,  G21K5/02 ,  H01L21/027

Abstract: An illumination intensity adjustment device includes a plurality of blades disposed in the projection beam so as to cast half-shadows extending across the illumination field. The blades can be selectively rotated to increase their width perpendicular to the projection beam to control uniformity.

公开(公告)号：DE102006044591A1

公开(公告)日：2008-04-03

申请号：DE102006044591

申请日：2006-09-19

Applicant: ZEISS CARL SMT AG ,  ASML NETHERLANDS BV

Inventor： EHM DIRK ,  MUELLENDER STEPHAN ,  STEIN THOMAS ,  MOORS JOHANNES HUBERTUS JOSEPH ,  WOLSCHRIJN BASTIAAN THEODOR ,  KRAUS DIETER ,  VERSLUIS RICHARD ,  MEIJERINK MARCUS GERHARDUS HEN

IPC: G03F7/20

Abstract: An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).