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    CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD
    35.
    发明申请
    CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD 有权
    充电颗粒光束写字装置和充电颗粒光束写字方法

    公开(公告)号：US20160336141A1

    公开(公告)日：2016-11-17

    申请号：US15145398

    申请日：2016-05-03

    Applicant: NuFlare Technology, Inc.

    Inventor： Haruyuki NOMURA

    IPC: H01J37/14 ,  H01J37/317

    CPC classification number: H01J37/14 ,  H01J37/063 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/0451 ,  H01J2237/0458 ,  H01J2237/0653

    Abstract: A charged particle beam writing apparatus includes a limiting aperture member at the downstream side of the emission source, arranged such that its height position can be selectively adjusted, according to condition, to be one of the n-th height position (n being an integer of 1 or more) based on the n-th condition depending on at least one of the height position of the emission source and an emission current value, and the (n+m)th height position (m being an integer of 1 or more) based on the (n+m)th condition depending on at least one of the height position of the emission source and the emission current value, and a shaping aperture member at the downstream side of the electron lens and the limiting aperture member to shape the charged particle beam by letting a part of the charged particle beam pass through a second opening.

    Abstract translation: 带电粒子束写入装置包括在发射源的下游侧的限制孔径构件，其布置成使得其高度位置可以根据条件被选择性地调节为第n高度位置之一（n为整数） 基于根据发光源的高度位置和发射电流值中的至少一个的第n个条件，并且第（n + m）个高度位置（m是1或更大的整数） ）基于取决于发射源的高度位置和发射电流值中的至少一个的第（n + m）条件，以及在电子透镜的下游侧的成形孔构件和限制孔径构件 带电粒子束通过使一部分带电粒子束通过第二个开口。

    ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLY
    37.
    发明申请
    ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLY 审中-公开
    离子束处理装置，电极组件以及清洁电极组件的方法

    公开(公告)号：US20160056016A1

    公开(公告)日：2016-02-25

    申请号：US14878206

    申请日：2015-10-08

    Applicant: CANON ANELVA CORPORATION

    Inventor： Yasushi Yasumatsu ,  Naoyuki Okamoto ,  Masashi Tsujiyama ,  Fumihito Suzuki

    IPC: H01J37/305 ,  H01J37/063 ,  B08B3/08 ,  H01J37/317

    CPC classification number: H01J37/3053 ,  B08B3/08 ,  H01J27/024 ,  H01J37/063 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/061 ,  H01J2237/0815 ,  H01J2237/083 ,  H01J2237/3151

    Abstract: Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.

    Abstract translation: 提供了一种离子束处理装置，其包括离子产生室，处理室和通过将在离子产生室中产生的离子提取到处理室来形成离子束的电极。 所述电极包括靠近所述离子产生室设置的第一电极，并设置有离子通道孔以允许所述离子通过，以及邻近所述第一电极设置并且比所述第一电极更靠近所述处理室设置的第二电极，以及 设置有允许离子通过的离子通道孔。 该装置还包括分别对第一电极和第二电极施加不同电位的功率单元，以便加速由离子产生室中的离子发生器产生的离子。 第一电极的材料与第二电极的材料不同。

    Electron gun, method of controlling same, and electron beam additive manufacturing machine
    38.
    发明授权
    Electron gun, method of controlling same, and electron beam additive manufacturing machine 有权
    电子枪，控制方法以及电子束添加剂制造机

    公开(公告)号：US09269520B2

    公开(公告)日：2016-02-23

    申请号：US14621526

    申请日：2015-02-13

    Applicant: JEOL Ltd.

    Inventor： Takashi Satoh

    IPC: H01J29/58 ,  H01J3/08 ,  H01J3/02 ,  H01J37/063 ,  H01J37/305 ,  B23K15/00 ,  B23K15/06 ,  B33Y30/00

    CPC classification number: H01J3/08 ,  B22F3/1055 ,  B23K15/002 ,  B23K15/0026 ,  B23K15/0086 ,  B23K15/06 ,  B33Y30/00 ,  H01J3/02 ,  H01J3/024 ,  H01J3/027 ,  H01J37/063 ,  H01J37/305 ,  H01J2237/06308 ,  H01J2237/065 ,  H01J2237/3128 ,  Y02P10/295

    Abstract: There is disclosed a method of controlling an electron gun without causing decreases in brightness of the electron beam if a current-limiting aperture cannot be used. The electron gun (10) has a cathode (11), a Wehnelt electrode (12), a control electrode (13), an anode (14), and a controller (22). The Wehnelt electrode (12) has a first opening (12c) in which the tip of the cathode is inserted, and focuses thermal electrons emitted from the tip of the cathode (11). The thermal electrons emitted from the tip of the cathode (11) are caused to pass into a second opening (13c) by the control electrode (13). The anode (14) accelerates the thermal electrons emitted from the cathode (11) such that the thermal electrons passed through the second opening (13c) pass through a third opening (14b) and impinge as an electron beam (B1) on a powdered sample (8). The controller (22) sets the bias voltage and the control voltage based on combination conditions of the bias voltage and control voltage to maintain the brightness of the beam constant.

    Abstract translation: 如果不能使用限流孔，则公开了一种控制电子枪而不引起电子束亮度降低的方法。 电子枪（10）具有阴极（11），Wehnelt电极（12），控制电极（13），阳极（14）和控制器（22）。 Wehnelt电极（12）具有插入阴极顶端的第一开口（12c），并聚焦从阴极（11）的尖端发射的热电子。 从阴极（11）的顶端发射的热电子被控制电极（13）通入第二开口（13c）。 阳极（14）加速从阴极（11）发射的热电子，使得穿过第二开口（13c）的热电子通过第三开口（14b）并作为电子束（B1）撞击在粉末样品上 （8）。 控制器（22）基于偏置电压和控制电压的组合条件设置偏置电压和控制电压，以保持光束的亮度恒定。

    Electron gun used in particle beam device
    39.
    发明授权
    Electron gun used in particle beam device 有权
    电子枪用于粒子束装置

    公开(公告)号：US08890444B2

    公开(公告)日：2014-11-18

    申请号：US12653549

    申请日：2009-12-15

    Applicant: Armin Heinz Hayn ,  Mohamed El-Gomati

    Inventor： Armin Heinz Hayn ,  Mohamed El-Gomati

    IPC: H01J29/51 ,  H01J37/063

    CPC classification number: H01J37/063 ,  H01J2237/06308 ,  H01J2237/06341 ,  H01J2237/06375

    Abstract: An electron gun used in a particle beam device, for example in an electron microscope, has a relatively good brightness and may be operated under vacuum conditions which can be easily achieved (i.e., for example, at a residual pressure of about 10−6 or 10−7 mbar). The electron gun comprises an electron source having an electron emission surface. Furthermore, the electron gun comprises a first electrode configured to control a path of electrons emitted from the electron emission surface, a second electrode which is configured to suppress emissions of electrons from a side surface of the electron source and a third electrode configured to accelerate electrons emitted from the electron source to a final energy. A first voltage, a second voltage and a third voltage are adjusted to avoid any crossover of electrons emitted from the electron emission surface.

    Abstract translation: 用于粒子束装置的电子枪例如在电子显微镜中具有相对较好的亮度，并且可以在容易实现的真空条件下操作（例如，在约10-6的残留压力或 10-7毫巴）。 电子枪包括具有电子发射表面的电子源。 此外，电子枪包括被配置为控制从电子发射表面发射的电子的路径的第一电极，被配置为抑制来自电子源的侧表面的电子的发射的第二电极和被构造成加速电子的第三电极 从电子源发射到最终能量。 调整第一电压，第二电压和第三电压以避免从电子发射表面发射的电子的任何交叉。

    Charged particle source with integrated energy filter
    40.
    发明授权
    Charged particle source with integrated energy filter 有权
    带集成能量滤波器的带电粒子源

    公开(公告)号：US08461525B2

    公开(公告)日：2013-06-11

    申请号：US13198640

    申请日：2011-08-04

    Applicant: Alexander Henstra

    Inventor： Alexander Henstra

    IPC: H01J3/26 ,  H01J40/00

    CPC classification number: H01J37/05 ,  H01J3/027 ,  H01J3/04 ,  H01J37/063 ,  H01J2237/045 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/1534

    Abstract: A particle source in which energy selection occurs by sending a beam of electrically charged particles eccentrically through a lens so that energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit in an energy selecting diaphragm, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam will have a reduced energy spread. The energy dispersed spot is imaged on the slit by a deflector. When positioning the energy dispersed spot on the slit, central beam is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector is avoided.

    Abstract translation: 通过使透过透镜偏心地发送带电粒子的束使能量分散发生在由透镜形成的图像中而发生能量选择的粒子源。 通过将该图像投影到能量选择隔膜的狭缝上，可以仅允许能谱范围的有限部分中的粒子通过。 因此，通过的光束将具有减小的能量扩展。 能量分散点通过偏转器在狭缝上成像。 当将能量分散点定位在狭缝上时，中心束从轴线偏转到其被能量选择隔膜停止的程度。 因此避免了在隔膜之后的区域中由该光束产生的反射和污染。 避免了来自中心束的电子的电子 - 电子相互作用，与偏转器区域中的能量过滤光束相互作用。

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