公开(公告)号：SG156572A1

公开(公告)日：2009-11-26

申请号：SG2009023359

申请日：2009-04-03

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  CUIJPERS MARTINUS AGNES WILLEM ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  DE JONGH ROBERTUS JOHANNES MARINUS ,  RENKENS MICHAEL JOZEF MATHIJS ,  VAN DER WIJST MARC WILHELMUS MARIA ,  WIJCKMANS MAURICE WILLEM JOZEF ETIENNE ,  TOUSAIN ROBERTUS LEONARDUS ,  FAASSEN RONALD PETRUS HENDRICUS ,  KOEVOETS ADRIANUS HENDRIK

Abstract: A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including: a first actuator to exert an actuation force on the table, the first actuator being connected to a first balance mass constructed and arranged to absorb a reaction force of the first actuator, wherein the positioning system includes a controller and a second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the first balance mass.

公开(公告)号：SG152185A1

公开(公告)日：2009-05-29

申请号：SG2008078487

申请日：2008-10-21

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  LOOPSTRA ERIK ROELOF ,  VAN DER WIJST MARC WILHELMUS MARIA ,  DE PEE JOOST ,  DE HOON CORNELIUS ADRIANUS LAMBERTUS ,  BOSCHKER STIJN

Abstract: A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.

公开(公告)号：NL1036167A1

公开(公告)日：2009-05-25

申请号：NL1036167

申请日：2008-11-07

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  WIJST MARC WILHELMUS MARIA VAN ,  GEERKE JOHAN HENDRIK ,  PEE JOOST DE ,  BEIJERS CLEMENTIUS ANDREAS JOHANNES ,  NIJHUIS MARCO HENDRIKUS HERMAN ,  DEBIESME FRANCOIS XAVIER

IPC: H01L21/68 ,  G03F9/00

公开(公告)号：SG129279A1

公开(公告)日：2007-02-26

申请号：SG200401493

申请日：2004-02-26

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS

IPC: G05D3/12 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G05B19/00 ,  G05D3/00

Abstract: A controller, especially in a lithographic apparatus, for controlling a position of a mass, e.g. a substrate table (12), by means of a control force. The controller receives a feedback position signal from said mass (12) and calculates an estimated mass (m) from said feedback position signal and from said control force. Then, the controller uses the estimated mass (m) and a desired mass acceleration to determine the control force needed to accelerate the mass (12), and move it to a desired position.

公开(公告)号：SG123690A1

公开(公告)日：2006-07-26

申请号：SG200507863

申请日：2005-12-06

Applicant: ASML NETHERLANDS BV

Inventor： HOUKES MARTIJN ,  BUTLER HANS ,  COX HENRIKUS HERMAN MARIE

Abstract: A lithographic apparatus includes a first movable element (such as an immersion liquid supply system), which is in operation in contact with a surface of a second movable element (such as a substrate table). Further, the lithographic apparatus includes a second element controller (such as a substrate table controller) to control a position quantity of the second movable element. Disturbance forces caused by, e.g., movements of the first and second movable elements with respect to each other, due to capillary forces disturb a position of the first and second movable elements. To at least partly correct a position of the second movable element due to such disturbance forces, the lithographic apparatus includes a feedforward control path to provide a disturbance force feedforward signal to the second element controller, the feedforward control path including a disturbance force estimator to estimate a disturbance force from a position quantity of the first movable element.

公开(公告)号：SG110195A1

公开(公告)日：2005-04-28

申请号：SG200405761

申请日：2004-09-16

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS

IPC: G03F7/20 ,  G05D3/12 ,  H01L21/027

Abstract: A lithographic apparatus including a position control system to control a position of a moveable object is presented, The position control system includes a position controller, an object represented as an object filter, a position feedback circuit, and an acceleration control system. The acceleration control system includes a subtractor and a first filter in a first circuit branch and a second filter in a second circuit branch. A position controller signal output from the position controller is input into the subtractor of the acceleration control system. An external disturbance force, however, is directly exerted upon the object. Thus, a first transfer function from the input of the subtractor to the acceleration of the object for the position controller force may be different than a second transfer function from the input of the object to the acceleration of the object for the disturbance force. Preferably, the first transfer function is identical to a transfer function for the position controller force in case no acceleration control system is present in the position control system.

公开(公告)号：NL2014008A

公开(公告)日：2015-07-20

申请号：NL2014008

申请日：2014-12-18

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  HOON CORNELIUS ADRIANUS LAMBERTUS ,  KERP INGMAR AUGUST ,  MEIJERS PIETER JOHANNES GERTRUDIS ,  OOMS WESLEY ,  STARREVELD JEROEN PIETER ,  HOOPEN DERK ,  DUIJNHOVEN MARTINUS ,  HAGE EDWARD ,  DRAAIJER EVERT HENDRIK JAN

IPC: G03F7/20 ,  H01L21/683

公开(公告)号：SG180091A1

公开(公告)日：2012-05-30

申请号：SG2011073129

申请日：2011-10-06

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  OUDE NIJHUIS MARCO HENDRIKUS HERMANUS

Abstract: The invention relates to a lithographic apparatus including a support frame which is supported by a base via a vibration isolation system; a projection system arranged to transfer a pattern from a patterning device onto a substrate, wherein the projection system includes a first frame which is spring-supported by the support frame; and an active damping system configured to damp movement of the first frame, including: a first sensor system configured to provide a first sensor output representative of absolute movement of the first frame, a first actuator system arranged to apply a force between the first frame and the support frame, and a control system configured to provide a drive signal to the first actuator system based on the first sensor output.FIG 2

公开(公告)号：NL2005735A

公开(公告)日：2011-06-27

申请号：NL2005735

申请日：2010-11-22

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  VERMEULEN JOHANNES ,  WIJST MARC ,  STARREVELD JEROEN ,  HOON CORNELIUS ADRIANUS LAMBERTUS ,  DEBIESME FRANCOIS

IPC: G03F7/00

公开(公告)号：DE602007011160D1

公开(公告)日：2011-01-27

申请号：DE602007011160

申请日：2007-07-24

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  HOUKES MARTIJN ,  VAN DER TOORN JAN-GERARD CORNELIS ,  SIMONS WILHELMUS FRANCISCUS JOHANNES

IPC: G03F7/20