公开(公告)号：NL2013885A

公开(公告)日：2015-06-08

申请号：NL2013885

申请日：2014-11-27

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ALEXANDROVICH ,  BANINE VADIM YEVGENYEVICH ,  JAGER PIETER WILLEM HERMAN ,  VRIES GOSSE CHARLES ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  GRIMMINCK LEONARDUS ADRIANUS GERARDUS ,  KATALENIC ANDELKO ,  AKKERMANS JOHANNES ANTONIUS GERARDUS ,  LOOPSTRA ERIK ROELOF ,  ENGELEN WOUTER JOEP ,  BARTRAIJ PETRUS RUTGERUS ,  COENEN TEIS JOHAN ,  ROOT WILHELMUS PATRICK ELISABETH MARIA

IPC: G03F7/20 ,  H01S3/00

Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.

公开(公告)号：CA3003766A1

公开(公告)日：2017-05-11

申请号：CA3003766

申请日：2016-11-03

Applicant: ASML NETHERLANDS BV

Inventor： DE JAGER PIETER WILLEM HERMAN ,  BIJLSMA SIPKE JACOB ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  NIKIPELOV ANDREY ALEXANDROVICH ,  TEN KATE NICOLAAS ,  DERKSEN ANTONIUS THEODORUS ANNA MARIA ,  VERSPAY JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  LANSBERGEN ROBERT GABRIEL MARIA ,  KASTELIJN AUKJE ARIANNE ANNETTE

IPC: G21G1/12 ,  G21K5/04 ,  G21K5/08 ,  G21K5/10

Abstract: A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).

公开(公告)号：SG173389A1

公开(公告)日：2011-08-29

申请号：SG2011051877

申请日：2007-07-04

Applicant: ASML NETHERLANDS BV

Inventor： FRIJNS OLAV WALDEMAR VLADIMIR

Abstract: A method to align a discharge axis of a discharge radiation source with respect to optics of the lithographic apparatus includes creating a discharge in a substance in a discharge space between an anode and a cathode to form a plasma so as to generate electromagnetic radiation. The discharge is triggered by irradiating an area on a surface proximate the discharge space with an energetic beam. The position of the area is controlled in response to a property of the radiation in the lithographic apparatus and/or the temperature of a collector of the lithographic apparatus. Controlling the position of the area which is irradiated improves alignment of the discharge axis with the different lithographic modules, such as the contamination barrier, the illumination system, the substrate table and/or the projection system.[Figure 2b]

公开(公告)号：NL2010108A

公开(公告)日：2013-07-22

申请号：NL2010108

申请日：2013-01-10

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  MOORS ROEL ,  SCHOOT JAN ,  VERHAGEN MARTINUS ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  KRIVTSUN VLADIMIR ,  SWINKELS GERARDUS ,  RIEPEN MICHEL ,  SCHIMMEL HENDRIKUS ,  MEDVEDEV VIACHESLAV

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：SG153664A1

公开(公告)日：2009-07-29

申请号：SG2007016173

申请日：2003-09-17

Applicant: ASML NETHERLANDS BV

Inventor： STEVENS LUCAS HENRICUS JOHANNES ,  SIDELKOV YURII VICTOROVITCH ,  KOLOSHNIKOV VSEVOLOD GRIGOREVITECH ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALAEEVITCH ,  KIEFT ERIK RENE ,  ROELEF LOOPSTRA ERIK ,  GAYAZOV ROBERT RAFILEVITCH ,  FRIJNS OLAV WALDEMAR VLADIMIR

IPC: G21K5/00 ,  F28D15/02 ,  G03F7/20 ,  G21K5/02 ,  G21K5/08 ,  H01L21/027 ,  H05G2/00 ,  H05H1/24 ,  G03B27/42 ,  G21K5/10 ,  H01J37/08

Abstract: Radiation Source, Lithographic Apparatus, and Device Manufacturing Method. A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. To improve heat dissipation, the radiation source comprises a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected.To improve the exact timing of the pinch formation and thus the pulse of EUV radiation, the radiation source comprises a triggering device.To improve the conversion efficiency, the radiation source is constructed to have a low inductance, and operated in a self- triggering regime.