公开(公告)号：NL2011237A

公开(公告)日：2014-02-04

申请号：NL2011237

申请日：2013-07-30

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  MINNAERT ARTHUR ,  MUITJENS MARCEL ,  YAKUNIN ANDREI ,  SCACCABAROZZI LUIGI ,  MALLMANN HANS ,  BAL KURSAT ,  LUIJTEN CARLO ,  NIENHUYS HAN-KWANG ,  HUIJBERTS ALEXANDER ,  GASSELING PAULUS ,  RIZO DIAGO PEDRO ,  KAMPEN MAARTEN ,  AERLE NICK

IPC: G03F7/20

公开(公告)号：NL2005463A

公开(公告)日：2011-06-20

申请号：NL2005463

申请日：2010-10-06

Applicant: ASML NETHERLANDS BV

Inventor： SCACCABAROZZI LUIGI ,  BANINE VADIM ,  IVANOV VLADIMIR ,  YAKUNIN ANDREI

IPC: G03F7/20 ,  G01N21/94

Abstract: A system and method are used to detect thermal radiation from a mask. Debris particles on the mask heat up, but do not cool down as quickly as the surrounding mask. Due to the temperature difference, the wavelength of radiation emitted by particles and the mask differs. Thus by detecting the thermal radiation, it is possible to detect the presence of particles deposited on the mask. If particles are detected, the mask can be cleaned.

公开(公告)号：NL2004539A

公开(公告)日：2010-12-23

申请号：NL2004539

申请日：2010-04-13

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： BOEF ARIE ,  VLADIMIRSKY YULI ,  SHMAREV YEVGENIY ,  SCACCABAROZZI LUIGI ,  THARALDSEN ROBERT ,  JACOBS RICHARD

IPC: G01N21/95 ,  H01L21/66 ,  H01L23/544

公开(公告)号：NL2005554A

公开(公告)日：2010-12-07

申请号：NL2005554

申请日：2010-10-21

Applicant: ASML NETHERLANDS BV

Inventor： IVANOV VLADIMIR ,  ANTSIFEROV PAVEL ,  SIDELNIKOV YURII ,  SCACCABAROZZI LUIGI

IPC: G03F7/20

公开(公告)号：NL2007108A

公开(公告)日：2012-02-06

申请号：NL2007108

申请日：2011-07-14

Applicant: ASML NETHERLANDS BV

Inventor： KOOLE ROELOF ,  BANINE VADIM ,  SCACCABAROZZI LUIGI ,  YILDIRIM OKTAY

IPC: G03F7/20

Abstract: An article such as an EUV lithography reticle is inspected to detect contaminant particles. The method comprises applying a fluorescent dye material to the article, illuminating the article with radiation at wavelengths suitable for exciting the fluorescent dye, monitoring the article for emission of second radiation by the fluorescent dye at a wavelength different from the first radiation, and generating a signal representing contamination in the event of detecting the second radiation. In one example, measures such as low-affinity coatings may be applied to the reticle to reduce affinity for the dye molecules, while the dye molecules will bind by physical or chemical adsorption to the contaminant particles. Dyes may be selected to have fluorescence behavior enhanced by hydrophobicity or hydrophilicity, and contaminant surfaces treated by buffer coatings accordingly.

公开(公告)号：NL2005748A

公开(公告)日：2011-01-06

申请号：NL2005748

申请日：2010-11-24

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  BANINE VADIM ,  BRULS RICHARD ,  IVANOV VLADIMIR ,  NEERHOF HENDRIK ,  YAKUNIN ANDREI ,  SCACCABAROZZI LUIGI

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2005516A

公开(公告)日：2011-06-21

申请号：NL2005516

申请日：2010-10-14

Applicant: ASML NETHERLANDS BV

Inventor： SCACCABAROZZI LUIGI ,  BANINE VADIM ,  IVANOV VLADIMIR ,  YAKUNIN ANDREI

IPC: G01N21/94 ,  G03F7/20

公开(公告)号：NL2006601A

公开(公告)日：2011-06-09

申请号：NL2006601

申请日：2011-04-14

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  LOOPSTRA ERIK ,  CADEE THEODORUS ,  AKKERMANS JOHANNES ,  SCACCABAROZZI LUIGI

IPC: G03F7/20 ,  H01L21/687

公开(公告)号：NL2003405A

公开(公告)日：2010-03-30

申请号：NL2003405

申请日：2009-08-28

Applicant: ASML NETHERLANDS BV

Inventor： SCACCABAROZZI LUIGI ,  BANINE VADIM ,  KOSTER NORBERTUS ,  MOORS JOHANNES ,  KAMPEN MAARTEN ,  RAJU RAMASAMY ,  LYTLE WAYNE MATHEW ,  RUZIC DAVID NEIL ,  NEUMANN MARTIN JOHN

IPC: B08B7/00 ,  G03F7/20

公开(公告)号：SG176740A1

公开(公告)日：2012-01-30

申请号：SG2011090974

申请日：2010-07-02

Applicant: ASML NETHERLANDS BV

Inventor： IVANOV VITALII ,  DEN BOEF ARIE ,  BANINE VADIM ,  SCACCABAROZZI LUIGI ,  IOSAD NIKOLAY

IPC: G03F1/00

Abstract: Methods and systems for inspection of an object include the use of spectroscopic techniques for the detection of unwanted particles on an object's surface, based on the different responses of the unwanted particles as compared with the object to be inspected due to their different materials. Time resolved spectroscopy and/or energy resolved spectroscopy of secondary photon emission from the surface of the object can be used to obtain Raman and photoluminescence spectra. The objects to be inspected can for example be a patterning device as used in a lithographic process, for example a reticle, in which case the presence of metal, metal oxide or organic particles can be detected, for example. The methods and apparatus are highly sensitive, for example, being able to detect small particles (sub 100 nm, particularly sub 50 nm) on the patterned side of an EUV reticle.