公开(公告)号：EP2511935B1

公开(公告)日：2015-06-03

申请号：EP12164205.2

申请日：2012-04-16

Applicant: FEI Company

Inventor： Tuggle, David ,  Parker, N. William ,  Utlaut, Mark

IPC: H01J37/05

CPC classification number: H01J37/05 ,  H01J37/317 ,  H01J2237/053 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/31749

公开(公告)号：EP2191927A1

公开(公告)日：2010-06-02

申请号：EP09176974.5

申请日：2009-11-25

Applicant: FEI COMPANY

Inventor： Straw, Marcus ,  Toth, Milos ,  Utlaut, Mark ,  Randolph, Steven ,  Lysaght, Michael

IPC: B23K26/18 ,  B23K26/36 ,  B23K26/06 ,  G03F7/004 ,  G03F7/20

CPC classification number: G21G5/00 ,  B23K26/0624 ,  B23K26/0661 ,  B23K26/18 ,  B23K2201/40 ,  B23K2201/42 ,  G03F7/70383 ,  H01J37/228 ,  H01J2237/31749

Abstract: Improved method of and system for substrate micromachining is described. Preferred embodiments of the present invention provide improved methods for the utilization of charged particle beam masking and laser ablation. A combination of the advantages of charged particle beam mask fabrication and ultra short pulse laser ablation are used to significantly reduce substrate processing time and improve lateral resolution and aspect ratio of features machined by laser ablation to preferably smaller than the diffraction limit of the machining laser.

Abstract translation: 描述了一种用于微机械加工的基材的改进的方法和系统。 本发明的消融的优选实施例提供了带电粒子束掩模和激光的利用的改进方法。 的带电粒子束掩模制造和超短脉冲激光烧蚀的优点的组合使用显着地降低基片的处理时间，提高横向分辨率和通过激光烧蚀到优选比加工激光的衍射极限更小的加工特征的纵横比。

公开(公告)号：EP2680295A3

公开(公告)日：2014-07-16

申请号：EP13173909.6

申请日：2013-06-27

Applicant: FEI COMPANY

Inventor： Graupera, Anthony ,  Parker, N. William ,  Utlaut, Mark

IPC: H01J37/244 ,  H01J37/28

CPC classification number: H01J37/256 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2448

Abstract: A split grid multi-channel secondary particle detector for a charged particle beam system includes a first grid segment and a second grid segment, each having independent bias voltages creating an electric field such that the on-axis secondary particles that are emitted from the target are directed to one of the grids. The bias voltages of the grids can be changed or reversed so that each grid can be used to detect the secondary particles and the multi-channel particle detector as a whole can extend its lifetime.

公开(公告)号：EP2590203A3

公开(公告)日：2014-06-04

申请号：EP12191348.7

申请日：2012-11-06

Applicant: FEI COMPANY

Inventor： Parker, William ,  Utlaut, Mark ,  Tuggle, David ,  Graham, Jeremy

IPC: H01J37/09

CPC classification number: G21K1/00 ,  H01J37/09 ,  H01J2237/045 ,  H01J2237/0453

Abstract: An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening (432) is made in a thin conductive film (420) positioned over a cavity (430) in a support substrate (410), where the aperture size and shape is determined by the opening in the conductive film and not determined by the cavity in the substrate.

公开(公告)号：EP2482061A3

公开(公告)日：2013-09-04

申请号：EP12152791.5

申请日：2012-01-27

Applicant: FEI Company

Inventor： Parker, N. William ,  Utlaut, Mark

IPC: G01N23/225 ,  H01J37/28 ,  G01N21/64

CPC classification number: G01N21/6428 ,  G01N21/6458 ,  G01N21/6486 ,  G01N23/225 ,  H01J37/228 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/206 ,  H01J2237/2443 ,  H01J2237/24455 ,  H01J2237/2448 ,  H01J2237/2803 ,  H01J2237/2857

Abstract: A method and system for the imaging and localization of fluorescent markers such as fluorescent proteins or quantum dots within biological samples is disclosed. The use of recombinant genetics technology to insert "reporter" genes into many species is well established. In particular, green fluorescent proteins (GFPs) and their genetically-modified variants ranging from blue to yellow, are easily spliced into many genomes at the sites of genes of interest (Gols), where the GFPs are expressed with no apparent effect on the functioning of the proteins of interest (Pols) coded for by the Gols. One goal of biologists is more precise localization of Pols within cells. The invention is a method and system for enabling more rapid and precise Pol localization using charged particle beam-induced damage to GFPs. Multiple embodiments of systems for implementing the method are presented, along with an image processing method relatively immune to high statistical noise levels. Fig. 3

公开(公告)号：EP2624040A3

公开(公告)日：2013-08-21

申请号：EP13153161.8

申请日：2013-01-30

Applicant: FEI Company

Inventor： Bahm, Alan ,  Parker, N. William ,  Utlaut, Mark

IPC: G02B21/36

CPC classification number: H04N5/23216 ,  G02B21/365 ,  H01J37/265 ,  H01J2237/22 ,  H01J2237/28 ,  H04N1/62

Abstract: An apparatus to permit a viewer of a digital microscopy original image to manipulate the display and/or the microscope to obtain an enhanced view of a region of interest within the original image. In one preferred embodiment a spotlight mode matches the gray shade scale for a spotlight region-of-interest to the pixel intensity variation present in the spotlight region. The gray shade scale used for the spotlight mode may then be generalized to the original image. In a preferred embodiment, spotlight mode provides an easy mechanism for permitting a user to command a re-imaging of a selected spotlight region from a displayed image. Such re-imaging may permit the use of imaging parameter selections that better fit the spotlight region.

公开(公告)号：EP2624040A2

公开(公告)日：2013-08-07

申请号：EP13153161.8

申请日：2013-01-30

Applicant: FEI Company

Inventor： Bahm, Alan ,  Parker, N. William ,  Utlaut, Mark

IPC: G02B21/36

CPC classification number: H04N5/23216 ,  G02B21/365 ,  H01J37/265 ,  H01J2237/22 ,  H01J2237/28 ,  H04N1/62

Abstract: An apparatus to permit a viewer of a digital microscopy original image to manipulate the display and/or the microscope to obtain an enhanced view of a region of interest within the original image. In one preferred embodiment a spotlight mode matches the gray shade scale for a spotlight region-of-interest to the pixel intensity variation present in the spotlight region. The gray shade scale used for the spotlight mode may then be generalized to the original image. In a preferred embodiment, spotlight mode provides an easy mechanism for permitting a user to command a re-imaging of a selected spotlight region from a displayed image. Such re-imaging may permit the use of imaging parameter selections that better fit the spotlight region.

Abstract translation: 一种允许数字显微镜原始图像的观看者操纵显示器和/或显微镜以获得原始图像内的感兴趣区域的增强视图的设备。 在一个优选实施例中，聚光灯模式将聚光灯区域的灰度色标匹配到聚光灯区域中存在的像素强度变化。 然后可以将用于聚光灯模式的灰度等级标准推广到原始图像。 在优选实施例中，聚光灯模式提供了一种容易的机制，用于允许用户命令从显示的图像中对选定的聚光灯区域进行重新成像。 这种重新成像可以允许使用更适合聚光灯区域的成像参数选择。

公开(公告)号：EP2600381A2

公开(公告)日：2013-06-05

申请号：EP12194645.3

申请日：2012-11-28

Applicant: FEI COMPANY

Inventor： Kellogg, Sean ,  Graupera, Anthony ,  Parker, N. William ,  Wells, Andrew ,  Utlaut, Mark ,  Skoczylas, Walter ,  Schwind, Gregory ,  Zhang, Shouyin ,  Smith, Noel

IPC: H01J37/08 ,  H01J37/04 ,  H01J27/02

CPC classification number: H01J37/32605 ,  H01J9/02 ,  H01J27/16 ,  H01J37/04 ,  H01J37/08 ,  H01J2237/032

Abstract: An inductively coupled plasma charged particle source (100, 200, 300, 400, 500, 600) for focused ion beam systems includes a plasma reaction chamber (102, 202, 302, 402, 502, 602) with a removably attached source electrode (106, 206, 306, 406, 506, 606). A fastening mechanism (104, 204, 304, 404, 504) connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.

公开(公告)号：EP2546863A1

公开(公告)日：2013-01-16

申请号：EP12173972.6

申请日：2012-06-28

Applicant: FEI Company

Inventor： Graupera, Anthony ,  Kellogg, Sean ,  Utlaut, Mark ,  Parker, N. William

IPC: H01J37/08 ,  H01J37/18

CPC classification number: H01J37/3002 ,  H01J37/08 ,  H01J37/18 ,  H01J2237/006 ,  H01J2237/08 ,  H01J2237/0827

Abstract: An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source.

Abstract translation: 可打开气体通道提供用于过程的快速泵出或在带电粒子束系统感应耦合等离子体源烘烤气体。所述的阀，在所述气体入口的源极电极或部分典型地定位，提高了气体传导当打开以 泵出等离子体室和等离子体源的外科手术过程中关闭。

公开(公告)号：EP2980223A3

公开(公告)日：2016-04-20

申请号：EP15178875.9

申请日：2015-07-29

Applicant: FEI Company

Inventor： Utlaut, Mark ,  Parker, N. William

IPC: C12Q1/68 ,  H01J37/20 ,  G01N33/58 ,  C12N15/10

CPC classification number: C12N15/1065 ,  B01J2219/00605 ,  B01J2219/00623 ,  B01J2219/00722 ,  C12Q1/6806 ,  H01J37/20 ,  H01J2237/2004 ,  H01J2237/2802

Abstract: A functionalized specimen support for use in charged particle microscopy is provided that includes a specimen support surface configured to support specimens (e.g. DNA strands 1051) during an interrogation of the specimens with a charged particle microscope, the specimen support surface having functionalized sites 1031, each functionalized site configured to maintain position of a portion of one of the specimens at the functionalized site by way of attachment, attraction, or a combination thereof.