公开(公告)号：NL2004635A

公开(公告)日：2010-06-16

申请号：NL2004635

申请日：2010-04-29

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ROELOF ,  RAVENSBERGEN MARIUS ,  JANSSEN FRANCISCUS JOHANNES JOSEPH

IPC: G03F7/20

公开(公告)号：SG158017A1

公开(公告)日：2010-01-29

申请号：SG2009037078

申请日：2009-06-01

Applicant: ASML NETHERLANDS BV

Inventor： JANSSEN FRANCISCUS JOHANNES JOSEPH ,  LANDHEER SIEBE ,  KOEK YUECEL ,  BECKERS MARCEL ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO

Abstract: A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.

公开(公告)号：NL1035816A1

公开(公告)日：2009-03-16

申请号：NL1035816

申请日：2008-08-12

Applicant: ASML NETHERLANDS BV

Inventor： BERKVENS PAUL PETRUS JOANNES ,  GRAAF ROELOF FREDERIK DE ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HAM RONALD VAN DER ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG177192A1

公开(公告)日：2012-01-30

申请号：SG2011090693

申请日：2009-06-01

Applicant: ASML NETHERLANDS BV

Inventor： JANSSEN FRANCISCUS JOHANNES JOSEPH ,  LANDHEER SIEBE ,  KOEK YUECEL ,  BECKERS MARCEL ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO

Abstract: A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.Fig. 8

公开(公告)号：IL312104A

公开(公告)日：2024-06-01

申请号：IL31210424

申请日：2024-04-11

Applicant: ASML NETHERLANDS BV ,  BAKKER TIES JAN WILLEM ,  DE VRIES GOSSE CHARLES ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ENGEL MICHAEL ,  HILDENBRAND VOLKER DIRK ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KURGANOVA EVGENIA ,  LUTTIKHUIS BERNARDUS ANTONIUS JOHANNES ,  VAN DER HAM RONALD ,  VAN LIPZIG JEROEN PETERUS JOHANNES ,  VERMEULEN PAUL ALEXANDER ,  WOLF ABRAHAM JAN

Inventor： BAKKER TIES JAN WILLEM ,  DE VRIES GOSSE CHARLES ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ENGEL MICHAEL ,  HILDENBRAND VOLKER DIRK ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KURGANOVA EVGENIA ,  LUTTIKHUIS BERNARDUS ANTONIUS JOHANNES ,  VAN DER HAM RONALD ,  VAN LIPZIG JEROEN PETERUS JOHANNES ,  VERMEULEN PAUL ALEXANDER ,  WOLF ABRAHAM JAN

Abstract: A lithographic apparatus comprises: an illumination system; a support structure; a substrate table; a projection system and a heating system. The illumination system is configured to condition a radiation beam. The support structure is constructed to support a reticle and pellicle assembly for receipt of the radiation beam conditioned by the illumination system. The substrate table is constructed to support a substrate. The projection system is configured to receive the radiation beam from the reticle - pellicle assembly and to project it onto the substrate. The heating system is operable to heat a pellicle of the reticle - pellicle assembly supported by the support structure. A method for using a reticle - pellicle assembly comprises: illuminating the reticle - pellicle assembly with a radiation beam so as to form a patterned image on a substrate; and heating the pellicle of the reticle - pellicle assembly using a separate heat source.

公开(公告)号：SG146541A1

公开(公告)日：2008-10-30

申请号：SG2008018160

申请日：2008-03-04

Applicant: ASML NETHERLANDS BV

Inventor： HOOGENDAM CHRISTIAAN ALEXANDER ,  JANSSEN FRANCISCUS JOHANNES JOSEPH

Abstract: LITHOGRAPHIC APPARATUS AND METHOD A lithographic apparatus includes an illumination system constructed and arranged to condition a beam of radiation, and a support structure constructed and arranged to support a patterning device. The patterning device is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table constructed and arranged to hold a substrate. The substrate table includes a substrate support plate that is in thermal contact with a thermal conditioning plate. The apparatus further includes a projection system constructed and arranged to project the patterned beam of radiation onto a target portion of the substrate.

公开(公告)号：SG155256A1

公开(公告)日：2009-09-30

申请号：SG2009057522

申请日：2006-02-06

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS LEONARDUS HENDRIKUS ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KUIJPER ANTHONIE

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base,that has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

公开(公告)号：NL1035908A1

公开(公告)日：2009-03-26

申请号：NL1035908

申请日：2008-09-09

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF MARCUS ADRIANUS VAN DE ,  LANDHEER SIEBE ,  BECKERS MARCEL ,  BRUIJSTENS JEROEN PETER JOHANNES ,  JANSSEN FRANCISCUS JOHANNES JOSEPH

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL1035757A1

公开(公告)日：2009-02-03

申请号：NL1035757

申请日：2008-07-25

Applicant: ASML NETHERLANDS BV

Inventor： BECKERS MARCEL ,  KERKHOF MARCUS ADRIANUS VAN DE ,  LANDHEER SIEBE ,  MAAS WOUTERUS JOHANNES PETRUS MARIA ,  BRUIJSTENS JEROEN PETER JOHANNES ,  THOMAS IVO ADAM JOHANNES ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  OERLE BARTHOLOMEUS MATHIAS VAN

IPC: G03F7/20 ,  H01L21/027