IMPRINT LITHOGRAPHY.
    21.
    发明专利

    公开(公告)号:NL2003347A

    公开(公告)日:2010-03-16

    申请号:NL2003347

    申请日:2009-08-12

    Abstract: A method of determining a position of a substrate relative to an imprint template is described, wherein the imprint template has at least three gratings and the substrate has at least three gratings positioned such that each imprint template grating forms a composite grating with an associated substrate grating, the at least three imprint template gratings and associated substrate gratings having offsets relative to one another. The method includes detecting an intensity of radiation which is reflected by the three composite gratings, and using the detected intensities to determine displacement of the substrate or imprint template from a position.

    IMPRINT LITHOGRAPHY.
    26.
    发明专利

    公开(公告)号:NL2005259A

    公开(公告)日:2011-03-30

    申请号:NL2005259

    申请日:2010-08-24

    Abstract: A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.

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