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公开(公告)号:NL2003347A
公开(公告)日:2010-03-16
申请号:NL2003347
申请日:2009-08-12
Applicant: ASML NETHERLANDS BV
Inventor: BOEF ARIE , JEUNINK ANDRE , VERMEULEN JOHANNES , SMITS PASCAL , WUISTER SANDER , KRUIJT-STEGEMAN YVONNE , SCHIFFART CATHARINUS
IPC: G03F7/00
Abstract: A method of determining a position of a substrate relative to an imprint template is described, wherein the imprint template has at least three gratings and the substrate has at least three gratings positioned such that each imprint template grating forms a composite grating with an associated substrate grating, the at least three imprint template gratings and associated substrate gratings having offsets relative to one another. The method includes detecting an intensity of radiation which is reflected by the three composite gratings, and using the detected intensities to determine displacement of the substrate or imprint template from a position.
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公开(公告)号:NL2010254A
公开(公告)日:2013-09-09
申请号:NL2010254
申请日:2013-02-06
Applicant: ASML NETHERLANDS BV
Inventor: PEETERS EMIEL , KETELAARS WILHELMUS , WUISTER SANDER , KOOLE ROELOF , HEESCH CHRIS , BRIZARD AURELIE , BOOTS HENRI , NGUYEN THANH , YILDIRIM OKTAY
IPC: G03F7/20
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公开(公告)号:NL2006929A
公开(公告)日:2012-02-13
申请号:NL2006929
申请日:2011-06-14
Applicant: ASML NETHERLANDS BV
Inventor: SCHIFFART CATHARINUS , HARDEMAN TOON , SCHOTHORST GERARD , JEUNINK ANDRE , RENKENS MICHAEL , FOCKERT GEORGE , BAARS GREGOR , DIJKSMAN JOHAN , WUISTER SANDER , KRUIJT-STEGEMAN YVONNE , JANSEN NORBERT
IPC: G03F7/00
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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公开(公告)号:NL2006747A
公开(公告)日:2012-01-30
申请号:NL2006747
申请日:2011-05-09
Applicant: ASML NETHERLANDS BV
Inventor: DIJKSMAN JOHAN , PIERIK ANKE , WUISTER SANDER , KOOLE ROELOF
IPC: G03F7/00
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25.
公开(公告)号:NL2006030A
公开(公告)日:2011-10-18
申请号:NL2006030
申请日:2011-01-19
Applicant: ASML NETHERLANDS BV
Inventor: PEETERS EMIEL , WUISTER SANDER , KOOLE ROELOF
IPC: G03F7/20
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公开(公告)号:NL2005259A
公开(公告)日:2011-03-30
申请号:NL2005259
申请日:2010-08-24
Applicant: ASML NETHERLANDS BV
Inventor: BOEF ARIE , BANINE VADIM , JEUNINK ANDRE , WUISTER SANDER , KRUIJT-STEGEMAN YVONNE
IPC: G03F7/00
Abstract: A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.
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公开(公告)号:NL2005007A
公开(公告)日:2011-03-01
申请号:NL2005007
申请日:2010-06-30
Applicant: ASML NETHERLANDS BV
Inventor: WUISTER SANDER , BANINE VADIM , DIJKSMAN JOHAN , KRUIJT-STEGEMAN YVONNE , LAMMERS JEROEN , KOOLE ROLF
IPC: G03F7/00
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28.
公开(公告)号:NL2011228A
公开(公告)日:2014-02-10
申请号:NL2011228
申请日:2013-07-26
Applicant: ASML NETHERLANDS BV
Inventor: FINDERS JOZEF , WUISTER SANDER , PEETERS EMIEL , BOOTS HENRI , DRUZHININA TAMARA , HEESCH CHRIS , HEIJDEN EDDY
IPC: G03F7/20
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公开(公告)号:NL2009210A
公开(公告)日:2013-02-19
申请号:NL2009210
申请日:2012-07-20
Applicant: ASML NETHERLANDS BV
Inventor: JAGER PIETER , BANINE VADIM , BLEEKER ARNO , SCHOOT HARMEN , STEVENS LUCAS , VERMEULEN JOHANNES , WUISTER SANDER
IPC: G03F7/20
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30.
公开(公告)号:NL2009002A
公开(公告)日:2013-01-21
申请号:NL2009002
申请日:2012-06-14
Applicant: ASML NETHERLANDS BV
Inventor: WUISTER SANDER
IPC: G03F7/00
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