Abstract:
안티몬 박막의 제조 방법이 개시된다. 본 발명에 따른 안티몬 박막의 제조 방법은 진공 챔버 내에 기판을 준비하는 단계; 안티몬 전구체 물질을 준비하는 단계; 상기 안티몬 전구체 물질로 소스가스를 준비하는 단계; 수소 가스를 포함하는 반응가스를 준비하는 단계; 퍼지가스를 준비하는 단계; 금속 전구체 물질로 금속 전구체 가스를 준비하는 단계; 및 상기 진공챔버 내에 상기 소스가스, 반응가스, 퍼지가스 및 상기 금속 전구체 가스를 순차적으로 공급하는 1사이클의 공정을 실시하여 상기 기판 상에 안티몬-금속의 단원자층 박막을 형성하는 단계;를 포함하고, 상기 안티몬 전구체 물질은 다음 화학식 1로 표시되는 안티몬 아미노알콕사이드인 것을 특징으로 하는 안티몬 박막의 제조 방법: [화학식 1] Sb[OA-NR 1 R 2 ] 3 상기 식 중, A는 C 1 내지 C 10 의 선형 또는 분지형 알킬기로 치환 또는 비치환된 C 2 내지 C 5 의 알킬렌이고; R 1 및 R 2 는 각각 독립적으로 C 1 내지 C 10 의 선형 또는 분지형 알킬기이다.
Abstract:
본 발명은 하기 화학식 1로 표시되는 구리 전구체에 관한 것으로, 상기 구리 전구체는 황을 포함하고 있는 전구체로서 박막 제조 중에 별도의 황을 첨가시키지 않아도 되는 장점이 있고 열적 안정성과 휘발성이 향상되어 양질의 황화구리 박막을 형성할 수 있다. [화학식 1]
(상기 식에서, R1, R2는 각각 독립적으로 C1-C10의 선형 또는 분지형 알킬기이고, R3, R4는 각각 독립적으로 C1-C10의 선형 또는 분지형 알킬기, 또는 C1-C10의 플루오르화 알킬기이며, n은 1에서 3사이의 숫자에서 선택된다.)
Abstract:
The present invention relates to an indium precursor represented by chemical formula 1. The indium precursor includes sulfur, has improved thermal stability and volatilization properties, and forms a sulfur indium thin film. In chemical formula 1, each of R1 and R2 is independently a C1-C10 linear or branched alkyl group, each of R3 and R4 is independently a C1-C10 linear or branched alkyl group or a C1-C10 alkyl fluoride group; X is Cl, Br, or I; and n is 1-3.
Abstract:
PURPOSE: A novel tungsten aminoamide halogen compound is provided to have thermal stability and high volatility, thereby simply manufacturing a thin film containing high quality tungsten. CONSTITUTION: A tungsten compound is denoted by chemical formula 1. A method for preparing the tungsten compound of chemical formula 1 comprises the step of making a compound of chemical formula 2 react with a compound of chemical formula 3. A thin film containing tungsten is grown by chemical vapor deposition (CVD) or atomic layer deposition (ALD) using the tungsten compound.
Abstract:
PURPOSE: A novel tungsten aminoalkoxide compound is provided to have thermal stability and high volatility, thereby easily producing a thin film containing high quality tungsten. CONSTITUTION: A tungsten compound is denoted by chemical formula 1. A method for preparing the tungsten compound of chemical formula 1 comprises the step of reacting a compound of chemical formula 2 with a compound of chemical formula 3. A thin film containing tungsten is grown by chemical vapor deposition (CVD) or atomic layer deposition (ALD) using the tungsten compound.
Title translation:7-(3',4'-二烷氧基苯基) - [1,2,4] - 三唑并[1,5-A]吡啶化合物,其制备方法和药物组合物,用于治疗或预防哮喘,慢性阻塞性肺动脉疾病, ARTHRITIS,ATOPIC DERMATITIS,TUMOR AND DEGENERATIVE BRAIN DISEASES COMPATH THE SAME
Abstract:
A 7-(3',4'-dialkoxyphenyl)-[1,2,4]-triazolo[1,5-a]pyrimidine compound is provided to show excellent activity on PDE-4 enzymes and high selectivity on other PDE enzymes and improve vomiting related side effects, which is one most serious problem of the PDE-4 inhibitors, thereby being used as a therapeutic agent of asthma and chronic obstructive pulmonary diseases, arthritis, atopic dermatitis, leukemia, cancer and brain diseases. A 7-(3',4'-dialkoxyphenyl)-[1,2,4]-triazolo[1,5-a]pyrimidine compound is represented by a formula(1) and is prepared by reacting 3-amino-triazole compound represented by a formula(4) with 3-(dimethylamino)-1-(3,4-dialkoxyphenyl)prophenone compound represented by a formula(5) or 3-(3,4-dialkoxyphenyl)3-oxopropionealdehyde compound represented by a formula(6) in the presence of acetic acid. In the formulae, each R1 and R2 is independently H, linear or branched saturated or unsaturated C1-7 alkyl, linear or branched saturated or unsaturated C1-7 alkyl including O, N or S, C3-7 cycloalkyl, C3-7 cycloalkyl including O, N or S, (C3-7)cycloalkyl(C1-7)alkyl, 3 to 7-membered saturated or unsaturated heterocycloalkyl including O, N, or S in a heterocycle, phenyl or benzyl, or R1 and R2 may be linked to each other by C1-3 alkylene or C1-3 alkylene including halogen; R3 is aryl selected from groups(1) to (4). A pharmaceutical composition for treating or preventing diseases related to bronchial inflammation such as asthma and chronic obstructive pulmonary disease, arthritis, atopic dermatitis, leukemia, cancer and brain diseases such as Alzheimer's disease, depression and memory decrease comprises the 7-(3',4'-dialkoxyphenyl)-[1,2,4]-triazolo[1,5-a]pyrimidine compound or a pharmaceutically acceptable carrier as an effective ingredient.
Abstract:
A novel pyrazole compound is provided to show excellent inhibitory activity on PDE-4 enzyme, thereby being used in order to prevent and treat asthma, chronic obstructive pulmonary disease, arthritis, atopic dermatitis, tumor and degenerative brain diseases. A 1-(3,4-dialkoxybenzyl)-1H-pyrazole compound is represented by the formula(1), wherein each R1 and R2 is independently H, linear or branched C1-7 alkyl, linear or branched C1-7 C1-7 alkyl including halogen, C3-7 cycloalkyl, (C3-7)cycloalkyl(C1-7)alkyl, 3- to 7-membered heterocycloalkyl including O, N or S in a hetero-cycle, 3- to 7-membered heterocycloalkyl(C1-7)alkyl including O, N or S in a hetero-cycle, phenyl, benzyl or allyl, or R1 and R2 may be linked to each other with C1-3 alkylene or C1-3 alkylene including halogen; R3 is H, formyl, halogen, linear or branched C1-10 alkyl, C1-10 alkoxy, C3-7 cycloalkyl, (C1-7)alkoxy(C1-7)alkyl, C1-7 alkyl ketone, (C3-7)cycloalkyl(C1-7)alkyl, (C3-7)cycloalkyl(C1-7)alkoxy, (C1-10)alkylcarboxylic acid, carboxyl(C1-10)alkylester, carboxyl(C1-10)alkylamide, amino, mono or di(C1-7)alkylamino, mono or di(C1-7)alkylaminocarbonyl; (C3-7)cycloalkylamino, morpholine, morpholine oxide, piperidine, piperazine, piperazine oxide, cyano, nitro, carboxylic acid guanidine, urea, phenoxy, benzyloxy, or an Aryl represented by the group(I); each R4 and R5 is independently H, halogen, formyl, linear or branched C1-10 alkyl, C1-10 alkoxy, (C1-10)alkoxy(C1-10)alkyl, C1-7 alkylketone, hydroxy(C1-10)alkyl, C3-7 cycloalkyl, (C3-7)cycloalkyl(C1-7)alkyl, (C3-7)cycloalkyl(C1-7)alkoxy, carboxylic acid, carboxyl(C1-10)alkylester, carboxyl(C1-10)alkylamide, amino, mono or di(C1-7)alkylamino, mono or di(C1-7)alkylaminocarbonyl, phenyl, phenoxy, benzyl, benzyloxy, 3- to 7-membered heterocycloalkyl including O, N or S in a hetero-cycle, 3- to 7-membered heterocycloalkyl(C1-7)alkyl including O, N or S in a hetero-cycle, 3- to 7-membered heterocycloalkyl(C1-7)alkoxy including O, N or S in a hetero-cycle, cyano, nitro, (C3-7)cycloalkylamino, guanidine, or urea. A method for preparing the compound of the formula(1) comprises a step of reacting a halobenzyl compound represented by the formula(3) with a pyrazole compound represented by the formula(4), each R1, R2, R3, R4, and R5 are same as defined above, and X is halogen. A pharmaceutical composition for preventing and treating inflammation related diseases such as asthma and chronic obstructive pulmonary diseases comprises the compound of the formula(1) as an effective ingredient.
Abstract:
본 발명은 화학식 1로 표시되는 신규한 2-아릴-7-(3′,4′-디알콕시페닐)-피라졸로[1,5-а]피리미딘 화합물 또는 그의 약제학적으로 허용 가능한 염, 이의 제조 방법 및 이를 유효성분으로 함유하는 것을 특징으로 하는 천식 및 만성폐쇄성 폐질환(Chronic Obstructive Pulmonary Disease)을 포함한 염증관련 질환의 치료를 위한 약제학적 조성물에 관한 것이다. [화학식1]
Abstract:
PURPOSE: Provided are 5-benzyloxymethyl-1,2-isoxazoline derivatives having an excellent herbicidal activity, its manufacturing method and herbicides containing the derivative as an active ingredient. CONSTITUTION: 5-benzyloxymethyl-1,2-isoxazoline derivative is represented by the formula(I), in which each X1, X2 and X3 represents hydrogen, methyl group, ethyl group, halogen group, methoxy group or nitro group (provided that it is an exception that X1, X2 and X3 are decimals all together); and Y1, Y2 and Y3 are respectively hydrogen or fluorine.
Abstract:
PURPOSE: Provided is N-(5-isoxazoline methyloxyphenyl)-3,4,5,6-tetrahydrophthalimide derivative which shows a great herbicidal effect only on weed without damaging crops like rice and is useful as a plant growth control agent. CONSTITUTION: A method for manufacturing N-(5-isoxazolinemethyloxyphenyl)-3,4,5,6-tetrahydrophthalimide derivative is characterized by the step of reacting a compound of the formula (2) with nitrileoxide or precursor in the presence of solvents like dichloromethane, tetrahydrofuran, benzene, ethyl ether, and C1-C4 alcohol. In the formula (1), R is an alkyl group of C1-C3, phenyl group, substituted phenyl group, cyano group, carboxylic acid group, or carboxylic acid ester group. The substituted phenyl group is a phenyl group having the same or different 1-3 substituents among an alkyl group of C1-C3, haloalkyl group of C1-C3, methylsulfonyl group, alkoxy group of C1-C3, halogen atom, cyano group, nitro group, carboxylic acid group, and carboxylic acid ester group.