公开(公告)号：US20160172153A1

公开(公告)日：2016-06-16

申请号：US15051210

申请日：2016-02-23

Applicant: PROTOCHIPS, INC.

Inventor： John DAMIANO, Jr. ,  Stephen E. MICK ,  David P. NACKASHI

IPC: H01J37/20 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/26 ,  H01J37/261 ,  H01J2237/188 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2602 ,  H01J2237/28 ,  H01J2237/2802

Abstract: Electron microscope support structures and methods of making and using same. The support structures are generally constructed using semiconductor materials and semiconductor manufacturing processes. The temperature of the support structure may be controlled and/or gases or liquids may be confined in the observation region for reactions and/or imaging.

公开(公告)号：US09349566B1

公开(公告)日：2016-05-24

申请号：US14828352

申请日：2015-08-17

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： John Breuer

IPC: H01J37/145 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/147 ,  H01J2237/12 ,  H01J2237/152 ,  H01J2237/1534 ,  H01J2237/28

Abstract: A charged particle beam device (100) is described. The charged particle beam device includes a beam source (150) for generating a charged particle beam (101); a lens device (160); and a beam deflector device (110) for deflecting the charged particle beam with respect to a direction of incidence (A). The beam deflector device includes: a first deflector (112) providing a first magnetic deflection field (B1) for deflecting the charged particle beam by a first half of a deflection angle (α); a second deflector (114) providing a second magnetic deflection field (B2) for deflecting the charged particle beam by a second half of the deflection angle (α); and a rotation-free lens arranged between the first deflector (112) and the second deflector (114) for at least partially compensating for a dispersion introduced by at least one of the first deflector and the second deflector, wherein the lens device (160) is configured for creating a crossover (X) of the charged particle beam at the position of the rotation-free lens.

Abstract translation: 描述带电粒子束装置（100）。 带电粒子束装置包括用于产生带电粒子束（101）的束源（150）; 透镜装置（160）; 以及用于相对于入射方向（A）偏转带电粒子束的光束偏转器装置（110）。 光束偏转装置包括：第一偏转器（112），其提供用于使带电粒子束偏转偏转角（α）的前半部分的第一磁偏转场（B1）; 提供用于使带电粒子束偏转偏转角（α）的后半部分的第二磁偏转场（B2）的第二偏转器（114）; 以及布置在所述第一偏转器（112）和所述第二偏转器（114）之间的旋转透镜，用于至少部分地补偿由所述第一偏转器和所述第二偏转器中的至少一个引入的色散，其中所述透镜装置（160） 被配置为在无旋转透镜的位置处产生带电粒子束的交叉（X）。

公开(公告)号：US09343265B2

公开(公告)日：2016-05-17

申请号：US14370763

申请日：2012-12-25

Applicant: Hitachi High-Technologies Corporation

Inventor： Asako Kaneko ,  Hisayuki Takasu ,  Hirobumi Mutou

IPC: C23C14/35 ,  H01J37/305 ,  C23C14/50 ,  C23C16/458 ,  C23C8/40 ,  H01J37/20 ,  H01J37/16 ,  H01J37/18

CPC classification number: H01J37/3053 ,  C23C8/40 ,  C23C14/505 ,  C23C16/4586 ,  H01J37/16 ,  H01J37/18 ,  H01J37/20 ,  H01J2237/002 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/28 ,  H01J2237/3151 ,  H01J2237/31749

Abstract: The purpose of the present invention is to provide a charged particle beam irradiation apparatus of a relatively simple structure which performs cooling on a sample or a sample stage. An aspect of the present invention comprises: a charged particle source; a sample stage; and a driving mechanism that comprises a transmission mechanism which transmits a driving force to move the sample stage. The charged particle beam irradiation apparatus comprises a container capable of accommodating an ionic liquid (12), wherein the container is disposed in a vacuum chamber. When the ionic liquid (12) is accommodated in the container, at least a portion of the transmission mechanism is provided at a position submerged in the ionic liquid (12).

Abstract translation: 本发明的目的是提供一种对样品或样品台进行冷却的相对简单结构的带电粒子束照射装置。 本发明的一个方面包括：带电粒子源; 样品台 以及包括传递驱动力以移动样品台的传动机构的驱动机构。 带电粒子束照射装置包括能够容纳离子液体（12）的容器，其中容器设置在真空室中。 当离子液体（12）容纳在容器中时，传播机构的至少一部分设置在浸没在离子液体（12）中的位置。

公开(公告)号：US20160099086A1

公开(公告)日：2016-04-07

申请号：US14729419

申请日：2015-06-03

Applicant: Jae-Wook LEE ,  Ho-Hyung JUNG ,  Kye-Hyun BAEK

Inventor： Jae-Wook LEE ,  Ho-Hyung JUNG ,  Kye-Hyun BAEK

IPC: G21K5/08 ,  H01L21/66 ,  H01L21/67 ,  H01L21/68 ,  H01J37/28 ,  H01L21/677

CPC classification number: H01L22/12 ,  H01J37/18 ,  H01J2237/0047 ,  H01J2237/28 ,  H01L21/67115 ,  H01L21/68

Abstract: A substrate transfer system includes a substrate transfer chamber between a substrate receiving port and a process chamber, the substrate transfer chamber providing a space for transferring a substrate between the substrate receiving port and the process chamber, and an ionizer within the substrate transfer chamber, the ionizer including a light source to irradiate electromagnetic waves having a predetermined radiation angle toward the substrate to eliminate static electricity of the substrate.

Abstract translation: 衬底传送系统包括在衬底接收端口和处理室之间的衬底传送室，衬底传送室提供用于在衬底接收端口和处理室之间传送衬底的空间以及衬底传送室内的离子发生器， 离子发生器包括光源，以向基板照射具有预定辐射角的电磁波，以消除基板的静电。

公开(公告)号：US09263235B2

公开(公告)日：2016-02-16

申请号：US14303227

申请日：2014-06-12

Applicant: Marcus Straw ,  Mark Emerson

Inventor： Marcus Straw ,  Mark Emerson

IPC: H01J37/00 ,  H01J37/304 ,  H01J37/22 ,  H01J37/305 ,  G21K5/00 ,  G21K5/08

CPC classification number: H01J37/3045 ,  G21K5/00 ,  G21K5/08 ,  H01J37/226 ,  H01J37/228 ,  H01J37/3056 ,  H01J2237/1501 ,  H01J2237/28

Abstract: A method and apparatus for aligning a laser beam coincident with a charged particle beam. The invention described provides a method for aligning the laser beam through the center of an objective lens and ultimately targeting the eucentric point of a multi-beam system. The apparatus takes advantage of components of the laser beam alignment system being positioned within and outside of the vacuum chamber of the charged particle system.

Abstract translation: 用于对准与带电粒子束一致的激光束的方法和装置。 所描述的本发明提供了一种通过物镜的中心对准激光束并最终瞄准多光束系统的中心点的方法。 该装置利用激光束对准系统的部件位于带电粒子系统的真空室内和外部。

公开(公告)号：US20150348748A1

公开(公告)日：2015-12-03

申请号：US14760259

申请日：2014-01-22

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuzuru MIZUHARA ,  Miki ISAWA ,  Minoru YAMAZAKI ,  Hitoshi TAMURA ,  Hideyuki KAZUMI

IPC: H01J37/244 ,  H01J37/26 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/268 ,  H01J37/1472 ,  H01J37/244 ,  H01J37/265 ,  H01J37/266 ,  H01J37/28 ,  H01J37/3178 ,  H01J2237/24564 ,  H01J2237/28 ,  H01J2237/2809

Abstract: An object of the present invention is to provide a method and an apparatus capable of measuring a potential of a sample surface by using a charged particle beam, or of detecting a compensation value of a variation in an apparatus condition which changes due to sample charging, by measuring a sample potential caused by irradiation with the charged particle beam. In order to achieve the object, a method and an apparatus are provided in which charged particle beams (2(a), 2(b)) emitted from a sample (23) are deflected by a charged particle deflector (33) in a state in which the sample (23) is irradiated with a charged particle beam (1), and information regarding a sample potential is detected by using a signal obtained at that time.

Abstract translation: 本发明的目的是提供一种能够通过使用带电粒子束来测量样品表面的电位或检测由于样品充电而发生变化的装置状态的变化的补偿值的方法和装置， 通过测量由带电粒子束的照射引起的样品电位。 为了实现该目的，提供了一种方法和装置，其中从样品（23）发射的带电粒子束（2（a），2（b））由带电粒子偏转器（33）在某种状态下偏转 其中样品（23）被带电粒子束（1）照射，并且通过使用当时获得的信号来检测关于样品电位的信息。

公开(公告)号：US20150311033A1

公开(公告)日：2015-10-29

申请号：US14443293

申请日：2013-11-21

Applicant: HITACHI HIGH-TECHNOLOGY CORPORATION

Inventor： Yusuke OMINAMI ,  Mami KONOMI ,  Shinsuke KAWANISHI ,  Hiroyuki SUZUKI

IPC: H01J37/20 ,  H01J37/28 ,  H01J37/22 ,  H01J37/16

CPC classification number: H01J37/20 ,  H01J37/16 ,  H01J37/224 ,  H01J37/28 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2004 ,  H01J2237/2608 ,  H01J2237/28

Abstract: A charged particle beam device provided with: a charged particle optical lens column generating a primary charged particle beam; a housing which has its inside evacuated by a vacuum pump; a first diaphragm that forms a part of the housing and able to keep an airtight state of the interior space of the housing; and a second diaphragm disposed between the first diaphragm and the sample, wherein a primary charged particle beam generated by the charged particle optical lens column is transmitted by or passes through the first diaphragm and the second diaphragm, and then is irradiated, on the sample that is in contact with the second diaphragm.

Abstract translation: 一种带电粒子束装置，具有：产生初级带电粒子束的带电粒子光学透镜柱; 其内部通过真空泵抽真空的壳体; 第一隔膜，其形成所述壳体的一部分并且能够保持所述壳体的内部空间的气密状态; 以及设置在第一膜片和样品之间的第二膜片，其中由带电粒子光学透镜柱产生的初级带电粒子束通过第一膜片和第二膜片透过或通过第一膜片和第二膜片，然后照射在样品上， 与第二隔膜接触。

公开(公告)号：US09171694B2

公开(公告)日：2015-10-27

申请号：US14532805

申请日：2014-11-04

Applicant: KLA-Tencor Corporation

Inventor： Christopher Sears

IPC: H01J37/147 ,  H01J37/141 ,  H01J37/12 ,  H01J37/153 ,  H01J37/10

CPC classification number: H01J37/1472 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/153 ,  H01J2237/10 ,  H01J2237/1508 ,  H01J2237/1516 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/2602 ,  H01J2237/28

Abstract: An electron beam device for inspecting a target substrate or specimen thereon includes a beam separator with an asymmetric quadrupole electrostatic deflector for improving field uniformity for a single direction of deflection. The asymmetric quadrupole electrostatic deflector includes two orthogonal electrode plates spanning roughly 60 degrees and two electrode plates spanning roughly 120 degrees, the two latter plates defining a unidirectional deflection field. The device generates a primary electron beam and focuses the primary electron beam along an optical axis into the target substrate. Secondary electrons detected at the target substrate are focused into a secondary electron beam. The beam separator with asymmetric quadrupole electrostatic deflector deflects the secondary electron beam away from the axis of the primary electron beam in the direction of deflection and into a detector array.

Abstract translation: 用于检查目标衬底或样本的电子束装置包括具有不对称四极静电偏转器的光束分离器，用于改善单个偏转方向的场均匀性。 不对称四极静电偏转器包括跨越大约60度的两个正交电极板和跨越大约120度的两个电极板，后两个板限定单向偏转场。 器件产生一次电子束，并将一次电子束沿光轴聚焦到目标衬底中。 在目标衬底处检测到的二次电子被聚焦成二次电子束。 具有不对称四极静电偏转器的光束分离器使二次电子束在偏转方向上偏离一次电子束的轴线并且进入检测器阵列。

公开(公告)号：US09153414B2

公开(公告)日：2015-10-06

申请号：US11700993

申请日：2007-01-31

Applicant: Hendrik Nicolaas Slingerland ,  William Ralph Knowles

Inventor： Hendrik Nicolaas Slingerland ,  William Ralph Knowles

IPC: G01F23/00 ,  H01J37/18 ,  H01J37/301 ,  H01J37/305

CPC classification number: H01J37/18 ,  H01J37/301 ,  H01J37/3056 ,  H01J2237/182 ,  H01J2237/2608 ,  H01J2237/28

Abstract: The invention relates to a particle-optical apparatus with a predetermined final vacuum pressure. To that end a vacuum chamber of said apparatus is via a first restriction connected to a volume where vapor or gas is present at a known pressure and via a second restriction to a vacuum pump. By making the ratio of the two conductances, associated with said restrictions, a calibrated ratio, the final pressure of the vacuum chamber is a predetermined final pressure. This eliminates the need for e.g. vacuum gauges and control systems, resulting in a more compact design of such apparatus.

Abstract translation: 本发明涉及具有预定最终真空压力的粒子光学装置。 为此，所述装置的真空室经由与已知压力下存在蒸气或气体并通​​过第二限制到真空泵的体积连接的第一限制。 通过使与所述限制相关联的两个电导率的比率为校准比率，真空室的最终压力是预定的最终压力。 这消除了对例如 真空计和控制系统，从而使这种设备更加紧凑的设计。

公开(公告)号：US09082583B2

公开(公告)日：2015-07-14

申请号：US14405485

申请日：2013-05-30

Applicant: Hitachi High-Technologies Corporation

Inventor： Kazuhiro Koyama ,  Masahiro Akatsu

IPC: H01J37/20 ,  H01J37/26 ,  G21K5/08 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/202 ,  H01J2237/28 ,  H01J2237/2801

Abstract: A sample holder is provided allowing for favorable observation of a cross-sectional sample using a retarding method. The sample holder includes: a sample placement member on which a first fixing member, a cross-sectional sample as an observation sample, and a second fixing member are placed in contact with each other, and inserted inside the electronic optical lens barrel of an electron microscope; and a voltage introduction means for introducing a voltage to the sample placement member. The sample placement member has a positioning section for positioning the first fixing member, the cross-sectional sample, and the second fixing member onto a placement position. A positioning section positions the first planar surface of the first fixing member and the second planar surface of the second fixing member which are disposed respectively adjacent to the observation surface of the cross-sectional sample, parallel to the observation surface at locations equidistant from the observation surface.

Abstract translation: 提供了一种样品保持器，允许使用延迟方法有利地观察截面样品。 样品架包括：样品放置构件，第一固定构件，作为观察样品的横截面样品和第二固定构件彼此接触并插入电子的电子光学镜筒内部 显微镜; 以及用于将电压引入样品放置构件的电压引入装置。 样品放置构件具有用于将第一固定构件，横截面样本和第二固定构件定位在放置位置上的定位部。 定位部将位于横截面样本的观察面附近分别配置的第一固定部件的第一平面和第二固定部件的第二平面配置成与观察面平行的观察面 表面。