公开(公告)号：SG131887A1

公开(公告)日：2007-05-28

申请号：SG2006072540

申请日：2006-10-20

Applicant: ASML NETHERLANDS BV

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  OTTENS JOOST JEROEN ,  VAN DER AKKER JEROEN

Abstract: The invention relates to an article support member configured to support an article to be placed in a beam path of a radiation beam of a lithographic apparatus on said article support; said article support member comprising: a base plate of a first material; and a plurality of burls of a second material, bonded to said base plate of said first material.

公开(公告)号：SG122045A1

公开(公告)日：2006-05-26

申请号：SG200508465

申请日：2005-10-25

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA ,  JONG DE FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  GOMPEL VAN EDWIN AUGUSTINUS MA

Abstract: A lithographic apparatus includes a substrate support (2) that is constructed to support a substrate (6), and a projection system (4) that is configured to project a patterned radiation beam (5) onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined trajectory (7) of subsequently targeted target portions of the substrate. The substrate support includes a duct configuration (1) for providing thermal stabilization to the substrate. The duct configuration is arranged to duct thermally stabilizing media in the support, and to substantially duct the media away from a part of the substrate support that supports the target portion via parts of the substrate support that support previously targeted portions of the substrate, so as to keep subsequently targeted target portions thermally stable.

公开(公告)号：SG115682A1

公开(公告)日：2005-10-28

申请号：SG200402399

申请日：2004-04-28

Applicant: ASML NETHERLANDS BV

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  OTTENS JOOST JEROEN

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683

Abstract: A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate holder (2) comprising a plurality of protrusions (10,11,12), the extremities thereof defining a substantially flat plane of support for supporting a substantially flat substrate, said substrate holder provided with means to provide a pressing force for pressing the substrate against the extremities of the protrusions; the protrusions (10) in an edge zone of the substrate holder arranged to provide a substantially flat overhanging of the substrate in relation to the pressing force of the pressing means; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus is characterized in that said protrusions (11,12) in an off-edge zone of the substrate holder are distributed so as to provide a substantial equal supporting area (13) for each protrusion of said plurality of protrusions, said supporting areas being defined by a Voronoi diagram distribution associated to the protrusions. The lithographic apparatus according to the invention offers a substrate holder with a reduced overlay and focus error.

公开(公告)号：SG137779A1

公开(公告)日：2007-12-28

申请号：SG2007034440

申请日：2007-05-11

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ROELOF ,  OTTENS JOOST JEROEN

Abstract: An article support constructed to support an article for lithographic processing purposes is disclosed. The article support includes a channel configuration arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure and an output channel structure, the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure provided at or near a surface of the article support. A lithographic apparatus and device manufacturing incorporating the article support is also disclosed.

公开(公告)号：DE602005000147T2

公开(公告)日：2007-10-25

申请号：DE602005000147

申请日：2005-03-31

Applicant: ASML NETHERLANDS BV

Inventor： ZAAL JACOBUS KOEN ,  MERTENS JOHANNES JEROEN ,  OTTENS JOOST JEROEN

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG132608A1

公开(公告)日：2007-06-28

申请号：SG2006077291

申请日：2006-11-07

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  BOONMAN MARCUS EMILE JOANNES ,  CASTENMILLER THOMAS JOSEPHUS M ,  JEUNINK ANDRE BERNARDUS

Abstract: A lithographic apparatus is disclosed that includes an article support constructed to support a first article, capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, in a beam path of the radiation beam or a second article to be placed in a beam path of the patterned radiation beam, the article support having a plurality of supporting protrusions on which the first article or the second article is disposed in use, wherein the plurality of supporting protrusions are constructed to define a support zone to provide a plane of support for the first article or the second article, so that when the first article or the second article is subjected to a thermal load the support zone allows at least a portion of the first article or the second article to expand or contract to reduce the build up of a mechanical stress in the first article or second article, respectively, while maintaining the first article or second article substantially fixed to the article support, and a position sensor configured to determine a position offset, in a direction lying in the plane of the support zone, of the first article or the second article over a period of time, and a projection system configured to project a patterned radiation beam onto a target portion of a second article.

公开(公告)号：SG120255A1

公开(公告)日：2006-03-28

申请号：SG200505017

申请日：2005-08-08

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS PETRUS MARIA C ,  JACOBS JOHANNES HENRICUS WILHE ,  TEN KATE NICOLAAS ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS JOHANNUS ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: G03F7/20

Abstract: A lithographic apparatus comprising: an illumination system (IL) configured to condition a radiation beam (PB); a support (MT) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table (WT) constructed to hold a substrate (W); a projection system (PL) configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system (130) configured to at least partly fill a space (25) between a final element of said projection system and said substrate with liquid; a seal member (12) arranged substantially to contain said liquid within said space between said final element of the projection system and said substrate; and elements (30,50,60,120,140) to control and/or compensate for evaporation of immersion liquid from said substrate.

公开(公告)号：SG115818A1

公开(公告)日：2005-10-28

申请号：SG200501978

申请日：2005-03-30

Applicant: ASML NETHERLANDS BV

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  MERTENS JEROEN JOHANNES SOPHIA ,  OTTENS JOOST JEROEN

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG115678A1

公开(公告)日：2005-10-28

申请号：SG200402166

申请日：2004-04-20

Applicant: ASML NETHERLANDS BV

Inventor： GILISSEN NOUD JAN ,  OTTENS JOOST JEROEN ,  VAN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRIC

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/027 ,  H01L21/68

Abstract: A carrier for carrying a lithographic substrate or a lithographic patterning means. The carrier comprises a first member provided with an open hollow structure that is open to at least one side of the member. The carrier further comprises a second member connected to the first member, such that a closed hollow internal structure is formed between the carrier members.

公开(公告)号：SG108323A1

公开(公告)日：2005-01-28

申请号：SG200304850

申请日：2003-08-20

Applicant: ASML NETHERLANDS BV

Inventor： HOEKS MARTINUS HENDRICUS HENDR ,  OTTENS JOOST JEROEN

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H02N13/00 ,  H01L21/00 ,  H01L21/68

Abstract: A lithographic projection apparatus is provided with an electrostatic chuck. The electrostatic chuck includes a dielectric element which has a plurality of pins formed on a first surface. The item to be clamped is clamped in position on the chuck by applying a potential difference between an electrode located on the surface of the dielectric member opposite to the clamping surface and an electrode located on the clamping surface of the item to be clamped. The pins are provided with at least an upper conducting layer, which serves to reduce the Johnsen-Rahbek effect, allowing the substrate to be released more quickly.