公开(公告)号：NL2004162A

公开(公告)日：2010-08-18

申请号：NL2004162

申请日：2010-01-28

Applicant: ASML NETHERLANDS BV

Inventor： KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN

IPC: G03F7/20

Abstract: A fluid supply system for a lithographic apparatus, includes a controller configured to vary fluid flow rate to a first component from a fluid source while maintaining total flow resistance to fluid downstream of the fluid source substantially constant.

公开(公告)号：NL2004820A

公开(公告)日：2011-01-04

申请号：NL2004820

申请日：2010-06-04

Applicant: ASML NETHERLANDS BV

Inventor： KRAMER PIETER ,  NET ANTONIUS ,  EUMMELEN ERIK ,  KUIJPER ANTHONIE

IPC: G03F7/20

Abstract: A lithographic apparatus is disclosed that includes a conduit for two phase flow therethrough. A flow separator is provided to separate the two phase flow into a gas flow and a liquid flow. A flow meter measures the flow rate of fluid in the gas flow or the liquid flow.

公开(公告)号：NL2004540A

公开(公告)日：2010-11-18

申请号：NL2004540

申请日：2010-04-13

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN BAUKE ,  BRULS RICHARD ,  JANSEN HANS ,  NET ANTONIUS ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  CASIMIRI ERIC

IPC: G03F7/20

Abstract: A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.

公开(公告)号：NL2005167A

公开(公告)日：2011-04-05

申请号：NL2005167

申请日：2010-07-29

Applicant: ASML NETHERLANDS BV

Inventor： HOEKERD KORNELIS ,  PADIY ALEXANDRE VIKTOROVYCH ,  GRAAF ROELOF ,  JANSEN HANS ,  LEENDERS MARTINUS ,  NET ANTONIUS ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  GRAAF SANDRA

IPC: G03F7/20

Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.

公开(公告)号：NL2003226A

公开(公告)日：2010-03-09

申请号：NL2003226

申请日：2009-07-17

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS ,  ANTONEVICI ANCA ,  KATE NICOLAAS ,  OTTENS JOOST ,  BECKERS MARCEL ,  POLIZZI MARCO ,  RIEPEN MICHEL ,  KUIJPER ANTHONIE ,  STEFFENS KOEN ,  BAETEN ADRIANES

IPC: G03F7/20

公开(公告)号：SG155256A1

公开(公告)日：2009-09-30

申请号：SG2009057522

申请日：2006-02-06

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS LEONARDUS HENDRIKUS ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KUIJPER ANTHONIE

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base,that has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.