Patent search ap:("ASML NETHERLANDS BV") AND inv:"LIEBREGTS PAULUS MARTINUS MARIA" Page 2

11.

发明专利
Lithographic apparatus, method of controlling the same and device manufacturing method 有权
Title translation: 光刻设备，其控制方法和设备制造方法

公开(公告)号：JP2010219510A

公开(公告)日：2010-09-30

申请号：JP2010029605

申请日：2010-02-15

Applicant: Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.

Inventor： STAVENGA MARCO KOERT , KEMPER NICOLAAS R , ANTONIUS LEENDERS MARTINUS HENDRIKUS , LIEBREGTS PAULUS MARTINUS MARIA , HUBERTUS MULKENS JOHANNES C , EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA , MOERMAN RICHARD , RIEPEN MICHEL , SERGEI SHULEPOV , BRANDS GERT-JAN GERARDUS JOHANEES THOMAS , STEFFENS KOEN , CROMWIJK JAN WILLEM , MEIJERS RALPH JOSEPH , FABRIZIO EVANGELISTA , BESSEMS DAVID , LI HUA , JOCHEMSEN MARINUS , GUNTHER PIETER LEIN JOSEPH , BELL FRANCISCUS WILHELMUS , WITBERG ERIK , SMITS MARCUS AGNES JOHANNES , MA ZHENHUA

IPC: H01L21/027 , G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a method of controlling the same, and a device manufacturing method, wherein defects of imaging are reduced or eliminated. SOLUTION: The method includes the steps of: moving a substrate table supporting a substrate relative to a projection system; and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, and/or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate. The step of adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation onto a target portion of the substrate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其控制方法以及减少或消除成像缺陷的器件制造方法。解决方案：该方法包括以下步骤：相对于投影系统移动支撑衬底的衬底台; 以及在所述基板的边缘处或附近的预定区域内的目标成像期间调整所述基板台和所述投影系统之间的扫描速度，和/或调整所述基板的边缘处或其附近的预定区域中的相邻目标位置之间的步进速度衬底的边缘。调整扫描和/或步进速度的步骤可以包括降低速度。投影系统被配置为将图案化的辐射束投影到基板的目标部分上。版权所有（C）2010，JPO＆INPIT

12.

发明专利
Lithographic apparatus and method of manufacturing device 审中-公开
Title translation: 光刻设备及其制造方法

公开(公告)号：JP2011171760A

公开(公告)日：2011-09-01

申请号：JP2011101629

申请日：2011-04-28

Applicant: Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.

Inventor： BERKVENS PAUL PETRUS JOANNES , DE GRAAF ROELOF FREDERIK , LIEBREGTS PAULUS MARTINUS MARIA , VAN DER HAM RONALD , SIMONS WILHELMUS FRANCISCUS JOHANNES , DIREKS DANIEL JOSEPH MARIA , JANSSEN FRANCISCUS JOHANNES JOSEPH , SCHOLTES PAUL WILLIAM , BRANDS GERT-JAN GERARDUS JOHANEES THOMAS , STEFFENS KOEN , LEMPENS HAN HENRICUS ALDEGONDA , LIEROP MATHIEUS ANNA KAREL VAN , METSENAERE CHRISTOPHE DE , MIRANDA MARCIO ALEXANDRE CANO , SPRUYTENBURG PATRICK JOHANNES WILHELMUS , VERSTRAETE JORIS JOHAN ANNE-MARIE

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus that combines a barrier member with a shutter member to keep the final element of a projection system wet during the replacement of a substrate.
SOLUTION: A liquid immersion lithographic apparatus includes a fluid confinement system for confining a fluid in a space between the projection system and a substrate. The liquid confinement system includes an inlet port to supply liquid, and a fluid entrance connected to an outlet port. The liquid immersion lithographic apparatus further includes a fluid supply system to control the fluid flow passing through the fluid entrance by changing a flow rate of fluid supplied to the entrance port and a flow rate of fluid removed from the outlet port.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种将阻挡构件与闸板构件组合的装置，以在更换基板期间使投影系统的最终元件保持湿润。解决方案：液浸式光刻设备包括用于将流体限制在投影系统和基底之间的空间中的流体限制系统。液体限制系统包括用于供应液体的入口端口和连接到出口端口的流体入口。液浸光刻设备还包括流体供应系统，用于通过改变供应到入口的流体的流量和从出口移除的流体的流量来控制流过流体入口的流体流。版权所有（C）2011，JPO＆INPIT

13.

发明专利
Lithography apparatus, removable member, and device manufacturing method 有权
Title translation: 平板电脑设备，可拆卸的会员和设备的制造方法

公开(公告)号：JP2011109092A

公开(公告)日：2011-06-02

申请号：JP2010251365

申请日：2010-11-10

Applicant: Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.

Inventor： DE GRAAF ROELOF FREDERIK , VAN DE KERKHOF MARCUS A , ANTONIUS LEENDERS MARTINUS HENDRIKUS , LIEBREGTS PAULUS MARTINUS MARIA , DE ROOIJ GERARDUS MARTINUS ANTONIUS , HOUBEN MARTIJN , BADAM VIJAY KUMAR , DZIOMKINA NINA VLADIMIROVNA , SONDAG-HUETHORST JOHANNA ANTOINETTE MARIA , DE KRUIJF NIEK ELOUT

IPC: H01L21/027

CPC classification number: C09J7/0217 , B32B2307/546 , B32B2307/56 , B32B2307/71 , B32B2307/73 , B32B2405/00 , C09J7/21 , C09J7/385 , G03F7/70341 , G03F7/70808 , G03F7/70916 , G03F7/7095 , Y10T428/28 , Y10T428/2843 , Y10T428/2848 , Y10T428/2852

Abstract: PROBLEM TO BE SOLVED: To provide a sealing member that does not have a large couple of force or a time-related couple of force in particular between sections of an immersion lithography apparatus for forming a sealed gap. SOLUTION: The sealing member that prevents the entry of an immersion liquid into a gap between components is provided. The sealing member has a plastic or polymeric sealing section adhered to components for forming a sealed gap. The sealing member is structured to reduce a couple of force or a time-related couple of force in particular between sealed components. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种密封构件，其特征在于用于形成密封间隙的浸没式光刻设备的部分之间不具有大的力或力相对的力。解决方案：提供防止浸入液体进入部件之间的间隙的密封构件。密封构件具有粘附到用于形成密封间隙的部件的塑料或聚合物密封部分。密封构件被构造成减少特别是在密封部件之间的一对力或与时间有关的力。版权所有（C）2011，JPO＆INPIT

14.

发明专利
Lithography system 有权
Title translation: LITHOGRAPHIC设备

公开(公告)号：JP2010135787A

公开(公告)日：2010-06-17

申请号：JP2009268224

申请日：2009-11-26

Applicant: Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.

Inventor： KNAAPEN THIJS EGIDIUS JOHANNES , BRULS RICHARD JOSEPH , VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA , JACOBS JOHANNES HENRICUS WILHELMUS , KAMPHUIS MARTIJN HENDRIK , LIEBREGTS PAULUS MARTINUS MARIA , MAAS RUDOLF ADRIANUS JOANNES , STAVENGA MARCO KOERT , VERSPAGET COEN CORNELIS WILHELMUS , PELLENS RUDY JAN MARIA , VAN DER HOEVEN JAN CORNELIS , ANSTOTZ DAVID LUCIEN , BRANDS GERT-JAN GERARDUS JOHANEES THOMAS , MARCUS JOHANNES VAN DER ZANDEN , BADAM VIJAY KUMAR , DE GROOT CASPER RODERIK

IPC: H01L21/027

CPC classification number: G03F7/70925 , G03B27/52 , G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus reducing latent adverse effect of liquid drops remained on a substrate table after light-exposure of a substrate. SOLUTION: The lithographic apparatus having a table including a target and/or a sensor and a liquid displacement device displacing a liquid from the target and/or the sensor using a localized gas flow is disclosed. The liquid displacement device can be disposed at various positions. For example, the liquid displacement device can be mounted on a liquid handling device at a light-exposure station and can be disposed adjacent to a transfer passage between the light-exposure station and a measuring station or adjacent to a load/unload station or the sensor in the transfer passage. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其减少了在曝光基板之后残留在基板台上的液滴的潜在不利影响。公开了具有包括靶和/或传感器的台的液晶显示装置以及使用局部气流从液体和/或传感器移出液体的液体排量装置。液体置换装置可以设置在各种位置。例如，液体移动装置可以安装在曝光站处的液体处理装置上，并且可以设置在靠近曝光站和测量站之间或与装载/卸载站相邻的传送通道或者传感器在传输通道中。版权所有（C）2010，JPO＆INPIT

15.

发明专利
Lithographic apparatus and device manufacturing method 有权
Title translation: LITHOGRAPHIC装置和装置制造方法

公开(公告)号：JP2010114455A

公开(公告)日：2010-05-20

申请号：JP2009293786

申请日：2009-12-25

Applicant: Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.

Inventor： GRAAF ROELOF FREDERICK DE , LAMBERTUS DONDERS SJOERD NICOLAAS , HOOGENDAM CHRISTIAAN A , JANSEN HANS , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LIEBREGTS PAULUS MARTINUS MARIA , MERTENS JEROEN JOHANNES SOPHIA MARIA , STREEFKERK BOB , VAN DER TOORN JAN-GERARD C , RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the radiated projection beam passes.
SOLUTION: This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中采取措施来防止或减少辐射投影光束通过的液体中气泡的存在。解决方案：这可以通过例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使位于流动的边缘附近的光轴径向向外的局部流动来实现基质。版权所有（C）2010，JPO＆INPIT

16.

发明专利
FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 未知

公开(公告)号：SG175498A1

公开(公告)日：2011-11-28

申请号：SG2011020534

申请日：2011-03-22

Applicant: ASML NETHERLANDS BV

Inventor： CORTIE ROGIER HENDRIKUS MAGDALENA , LIEBREGTS PAULUS MARTINUS MARIA , RIEPEN MICHEL , EVANGELISTA FABRIZIO

Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.[Figure 1]

17.

发明专利
A LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A DEVICE MANUFACTURING METHOD 未知

公开(公告)号：SG164338A1

公开(公告)日：2010-09-29

申请号：SG2010009934

申请日：2010-02-12

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT , KEMPER NICOLAAS RUDOLF , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LIEBREGTS PAULUS MARTINUS MARIA , MULKENS JOHANNES CATHARINUS HUBERTUS , EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA , MOERMAN RICHARD , RIEPEN MICHEL , SHULEPOV SERGEI , BRANDS GERT-JAN GERARDUS JOHANNES THOMAS , STEFFENS KOEN , CROMWIJK JAN WILLEM , MEIJERS RALPH JOSEPH , EVANGELISTA FABRIZIO , BESSEMS DAVID , LI HUA , JOCHEMSEN MARINUS , GUNTER PIETER LEIN JOSEPH , BELL FRANCISCUS WILHELMUS , WITBERG ERIK , SMITS MARCUS AGNES JOHANNES , MA ZHENHUA

Abstract: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.