公开(公告)号：NL2005832A

公开(公告)日：2011-01-10

申请号：NL2005832

申请日：2010-12-08

Applicant: ASML NETHERLANDS BV

Inventor： MEDVEDEV VIACHESLAV ,  BANINE VADIM ,  KRIVTSUN VLADIMIR ,  SOER WOUTER ,  YAKUNIN ANDREI

IPC: G03F7/20

公开(公告)号：NL2005763A

公开(公告)日：2011-01-06

申请号：NL2005763

申请日：2010-11-26

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  LOOPSTRA ERIK ,  MOORS JOHANNES ,  YAKUNIN ANDREI

IPC: G03F7/20

公开(公告)号：NL2004992A

公开(公告)日：2010-08-09

申请号：NL2004992

申请日：2010-06-29

Applicant: ASML NETHERLANDS BV

Inventor： SOER WOUTER ,  BANINE VADIM ,  LOOPSTRA ERIK ,  YAKUNIN ANDREI ,  JAK MARTIN

IPC: G03F7/20

公开(公告)号：NL2003449A

公开(公告)日：2010-04-29

申请号：NL2003449

申请日：2009-09-08

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM

IPC: G02B3/00 ,  G03F7/20

Abstract: A transmissive fly's eye integrator is disclosed that includes a first array of lenses and a second array of lenses. The first array of lenses and second array of lenses together form a fly's eye integrator, and the first array of lenses and second array of lenses comprise lenses which have a diameter selected from the range of 5 μm-50 μm, and a radius of curvature selected from the range of 25 μm-2500 μm.

公开(公告)号：NL2003152A1

公开(公告)日：2010-02-16

申请号：NL2003152

申请日：2009-07-08

Applicant: ASML NETHERLANDS BV

Inventor： KEMPEN ANTONIUS ,  BANINE VADIM ,  IVANOV VLADIMIR ,  LOOPSTRA ERIK

IPC: H05G2/00 ,  G03F7/20

公开(公告)号：AT453136T

公开(公告)日：2010-01-15

申请号：AT07808582

申请日：2007-09-17

Applicant: ASML NETHERLANDS BV

Inventor： FRANKEN JOHANNES ,  BANINE VADIM ,  WASSINK ARNOUD

IPC: G03F7/20 ,  F16C32/06

Abstract: A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii).

公开(公告)号：NL2002838A1

公开(公告)日：2009-12-01

申请号：NL2002838

申请日：2009-05-05

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BOEIJ WILHELMUS DE ,  LOOPSTRA JOHANNES ,  SWINKELS GERARDUS ,  DIJSSELDONK ANTONIUS VAN ,  SCHOOT JAN VAN

IPC: H05G2/00 ,  G03F7/20

公开(公告)号：SG11201601454WA

公开(公告)日：2016-03-30

申请号：SG11201601454W

申请日：2014-09-24

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BARTRAIJ PETRUS ,  VAN GORKOM RAMON ,  AMENT LUCAS ,  DE JAGER PIETER ,  DE VRIES GOSSE ,  DONKER RILPHO ,  ENGELEN WOUTER ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  NIENHUYS HAN-KWANG ,  NIKIPELOV ANDREY ,  RENKENS MICHAEL ,  JANSSEN FRANCISCUS ,  KRUIZINGA BORGERT

IPC: G03F7/20 ,  G01N21/956 ,  G02B5/18 ,  G02B27/00 ,  G02B27/09 ,  G02B27/10 ,  G02B27/12 ,  G02B27/14 ,  G02B27/42 ,  G03F1/84 ,  G21K1/06 ,  H01S3/09 ,  H05H7/04

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

公开(公告)号：NL2013663A

公开(公告)日：2015-05-07

申请号：NL2013663

申请日：2014-10-22

Applicant: ASML NETHERLANDS BV

Inventor： AKKERMANS JOHANNES ,  AMENT LUCAS ,  BANINE VADIM ,  COENEN TEIS JOHAN ,  JAGER PIETER ,  VRIES GOSSE ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  LUITEN OTGER ,  NIKIPELOV ANDREY

IPC: G03F7/20 ,  H01S3/00

公开(公告)号：NL2013518A

公开(公告)日：2015-03-30

申请号：NL2013518

申请日：2014-09-24

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BARTRAIJ PETRUS ,  AMENT LUCAS ,  JAGER PIETER ,  VRIES GOSSE ,  DONKER RILPHO ,  ENGELEN WOUTER ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  NIENHUYS HAN-KWANG ,  NIKIPELOV ANDREY ,  RENKENS MICHAEL ,  GORKOM RAMON ,  JANSSEN FRANCISCUS ,  KRUIZINGA BORGERT

IPC: H05G2/00 ,  G03F7/20

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.