公开(公告)号：NL2010140A

公开(公告)日：2013-08-06

申请号：NL2010140

申请日：2013-01-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  KATE NICOLAAS ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH

IPC: G03F7/20 ,  H01L21/683

Abstract: Substrate holder (100) for use in a lithographic apparatus, the substrate holder comprising a main body having a first surface and a second surface opposite the first surface.A plurality of first burls are provided on the first surface, the first burls having end surfaces to support a substrate. A plurality of second burls are provided on the second surface to support the substrate holder on a structure. The plurality of first burls each comprise a lower body portion protruding from the first surface and an upper body portion above the lower body portion, the lower body portions comprise a different material from the upper body portions, and the upper body portions comprise diamond-like carbon.

公开(公告)号：NL2008630A

公开(公告)日：2012-10-30

申请号：NL2008630

申请日：2012-04-12

Applicant: ASML NETHERLANDS BV

Inventor： BEX JAN ,  KATE NICOLAAS ,  LAFARRE RAYMOND ,  BRINKHOF EUGENE ,  DAMEN JOHANNES ,  KARADE YOGESH

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2005717A

公开(公告)日：2011-06-21

申请号：NL2005717

申请日：2010-11-18

Applicant: ASML NETHERLANDS BV

Inventor： GOSEN JEROEN ,  JANSEN ALBERT ,  KATE NICOLAAS ,  STAVENGA MARCO ,  STEFFENS KOEN ,  BOKHOVEN LAURENTIUS ,  CASTELIJNS HENRICUS ,  CUYPERS KOEN

IPC: G03F7/20

公开(公告)号：NL2005666A

公开(公告)日：2011-06-21

申请号：NL2005666

申请日：2010-11-11

Applicant: ASML NETHERLANDS BV

Inventor： ROSET NIEK ,  KATE NICOLAAS ,  LAFARRE RAYMOND ,  ZDRAVKOV ALEXANDER

IPC: G03F7/20

公开(公告)号：NL2005207A

公开(公告)日：2011-03-29

申请号：NL2005207

申请日：2010-08-11

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES ,  KATE NICOLAAS ,  OTTENS JOOST ,  DONK GERRIT ,  ES JOHANNES

IPC: G03F7/20

Abstract: A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber.

公开(公告)号：NL2004598A

公开(公告)日：2010-11-30

申请号：NL2004598

申请日：2010-04-23

Applicant: ASML NETHERLANDS BV

Inventor： EIJK JAN ,  DONDERS SJOERD ,  JACOBS JOHANNES ,  KATE NICOLAAS ,  VERMEULEN JOHANNES ,  ZAAL KOEN ,  REMIE MARTIN

IPC: G03F7/20