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    Fluid extract system, lithography apparatus, and device manufacturing method
    41.
    发明专利
    Fluid extract system, lithography apparatus, and device manufacturing method 有权
    流体萃取系统，光刻设备和装置制造方法

    公开(公告)号：JP2010141325A

    公开(公告)日：2010-06-24

    申请号：JP2009277243

    申请日：2009-12-07

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KEMPER NICOLAAS R ,  VAN BALLEGOIJ ROBERTUS NICODEMUS JACOBUS ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  RIEPEN MICHEL ,  VAN DEN HEUVEL MARTINUS WILHELMUS ,  BERKVENS PAUL PETRUS JOANNES ,  METSENAERE CHRISTOPHE DE ,  VAN DE WINKEL JIMMY MATHEUS WILHELMUS ,  ROPS CORNELIUS MARIA

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341 ,  F01N1/023 ,  G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling system in which a vibration produced by two phase extraction is reduced or eliminated. SOLUTION: A liquid-immersion lithography usually is equipped with a fluid handling system. The handling system generally has a two phase fluid extraction system which removes a mixture of a gas and a liquid from a predetermined place. Since the extract fluid contains two phases, the pressure in the extract system varies sometimes. It is likely that the pressure variation passes through the liquid-immersion liquid to cause an incorrect exposing light. A buffer chamber can be used to reduce the pressure variation in the extract system. The buffer chamber may be connected to the fluid extract system in order to provide a fixed volume of gas to reduce the pressure variation. Substitutively or additionally, a flexible wall portion may be provided to somewhere in the fluid extract system. The flexible wall portion may respond to the pressure variation in the fluid extract system to change its shape. The change of the shape may be a help when the flexible wall portion reduces or eliminates the pressure variation. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种流体处理系统，其中减少或消除由两相萃取产生的振动。

    解决方案：液浸光刻通常配备有流体处理系统。 处理系统通常具有从预定位置去除气体和液体的混合物的两相流体萃取系统。 由于萃取液含有两相，萃取系统中的压力有时会变化。 压力变化很可能通过液浸液体导致不正确的曝光。 可以使用缓冲室来减少提取系统中的压力变化。 缓冲室可以连接到流体提取系统，以提供固定体积的气体以减小压力变化。 替代地或另外地，柔性壁部分可以设置在流体提取系统的某处。 柔性壁部分可以响应于流体提取系统中的压力变化以改变其形状。 当柔性壁部分减小或消除压力变化时，形状的变化可能是有帮助的。 版权所有（C）2010，JPO＆INPIT

    Substrate table, lithographic apparatus, and device manufacturing method
    43.
    发明专利
    Substrate table, lithographic apparatus, and device manufacturing method 有权
    基板，平面设备和器件制造方法

    公开(公告)号：JP2009295979A

    公开(公告)日：2009-12-17

    申请号：JP2009126050

    申请日：2009-05-26

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MONDT EVA ,  GILISSEN NOUD JAN ,  JACOBS HERNES ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VERMAELEN MARKUS MARTINUS PETR ,  RIEPEN MICHEL

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/707

    Abstract: PROBLEM TO BE SOLVED: To disclose a table in which measures are taken to seal between the table and an edge of an object, in use, supported on the table.
    SOLUTION: In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：公开一种表格，其中采用措施来将桌子和使用中的物体的边缘密封在桌子上。 具体而言，在台面上的物体与桌子本身之间形成毛细通道。 在毛细管通道的径向向内的弯液面钉扎特征和/或超压存在使通道中的液体保持在通道中并有助于防止其进一步向内径向前进。 执行该功能的特征可以与围绕对象的构件相关联或形成在其中。 该构件可以与桌子的一部分热分离。 版权所有（C）2010，JPO＆INPIT

    Lithographic equipment and liquid removing method
    44.
    发明专利
    Lithographic equipment and liquid removing method 有权
    LITHOGRAPHIC EQUIPMENT和液体清除方法

    公开(公告)号：JP2008205465A

    公开(公告)日：2008-09-04

    申请号：JP2008032818

    申请日：2008-02-14

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JACOBS HERNES ,  LOOPSTRA ERIK R ,  RIEPEN MICHEL ,  MONDT EVA

    IPC: H01L21/027

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a system for removing a liquid from a substrate table, in particular, from a gap between the substrate table and a substrate, and to provide a method therefor.
    SOLUTION: In the liquid removing method, the liquid is removed from the substrate held on the substrate table and from the gap between the substrate and the substrate table. A liquid removing device is provided with at least one outlet port, forming a predetermined geometric long and thin extractor; the substrate table is moved relative to the liquid removing device so that the extractor passes all through the substrate and the gap; and that the local tangent in the local portion of the extractor at the end of non-dry portion in the gap substantially holds the angle between about 35° and 90° on a planar view, at arbitrary times with respect to that in the gap.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于从衬底台，特别是从衬底台和衬底之间的间隙去除液体的系统，并提供其方法。 解决方案：在液体去除方法中，液体从保持在基板台上的基板和基板与基板台之间的间隙移除。 液体去除装置设置有至少一个出口，形成预定的几何长薄抽提器; 衬底台相对于液体去除装置移动，使得提取器全部通过衬底和间隙; 并且在间隙中非干燥部分末端处的提取器的局部部分中的局部切线在平面视图上基本上保持约35°至90°之间的角度，相对于间隙中的任意时间。 版权所有（C）2008，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    45.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2007318117A

    公开(公告)日：2007-12-06

    申请号：JP2007120671

    申请日：2007-05-01

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： ANTONIUS LEENDERS MARTINUS HEN ,  KATE NICOLAAS TEN ,  RIEPEN MICHEL ,  SERGEI SHULEPOV ,  LAMBERTUS DONDERS SJOERD NICOL

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: H01L21/0274 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus capable of improving removal of liquid from a substrate or a substrate table surface. SOLUTION: A gas knife 410 comprises eight segments each of which has a radius smaller than an average radius of the gas knife 410 to reserve a gas knife area further apart from the average radius and near a projection beam PB. A liquid extractor 420 lies at a part of the most distant gas knife 410 present inside in radius direction of the gas knife 410. Combination of such a gas knife 410 and a substrate displacement makes it possible to collect liquid in the liquid extractor 420, which works as a liquid removal device. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供能够改善从基板或基板台表面去除液体的浸没式光刻设备。 解决方案：气刀410包括八个段，每个段具有小于气刀410的平均半径的半径，以保留与平均半径更远的距离和靠近投影束PB的气刀区域。 液体提取器420位于在气刀410的半径方向内侧存在的最远的气刀410的一部分。这种气刀410与基板位移的组合使得可以在液体提取器420中收集液体， 作为液体去除装置。 版权所有（C）2008，JPO＆INPIT

    SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD
    46.
    发明申请
    SOURCE-COLLECTOR DEVICE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
    源收集器件，光刻设备和器件制造方法

    公开(公告)号：WO2013107686A2

    公开(公告)日：2013-07-25

    申请号：PCT/EP2013050406

    申请日：2013-01-10

    Applicant: ASML NETHERLANDS BV

    Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  MOORS ROEL ,  VAN SCHOOT JAN ,  VERHAGEN MARTINUS ,  FRIJNS OLAV ,  KRIVTSUN VLADIMIR ,  SWINKELS GERARDUS ,  RIEPEN MICHEL ,  SCHIMMEL HENDRIKUS ,  MEDVEDEV VIACHESLAV

    IPC: G03F7/20

    CPC classification number: G03F7/70033 ,  G03F7/70166 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70916 ,  G21K1/067 ,  G21K2201/064 ,  H05G2/008

    Abstract: A source-collector device is constructed and arranged to generate a radiation beam, The device includes a target unit constructed and arranged to present a target surface of plasma- forming material; a laser unit constructed and arranged to generate a beam of radiation directed onto the target surface so as to form a plasma from said plasma-forming material; a contaminant trap constructed and arranged to reduce propagation of particulate contaminants generated by the plasma; a radiation collector comprising a plurality of grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom; and a filter constructed and arranged to attenuate at least one wavelength range of the beam.

    Abstract translation: 源极集电极器件被构造和布置成产生辐射束。该器件包括构造和布置成呈现等离子体形成材料的目标表面的靶单元; 激光单元，其被构造和布置成产生被引导到所述目标表面上的辐射束，以便形成来自所述等离子体形成材料的等离子体; 构造和布置以减少由等离子体产生的颗粒污染物的传播的污染物阱; 辐射收集器，包括多个放射入射反射器，其布置成收集由等离子体发射的辐射并从其形成光束; 以及被构造和布置成衰减所述光束的至少一个波长范围的滤光器。

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