公开(公告)号：JP2005322906A

公开(公告)日：2005-11-17

申请号：JP2005130901

申请日：2005-04-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MERTENS JEROEN JOHANNES SOPHIA ,  STREEFKERK BOB ,  MULKENS JOHANNES CATHARINUS HU

IPC: H01L21/027 ,  G03B27/42 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F9/7034 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a method which eliminates the need for a double stage in an immersion exposure divice and enables quick and accurate measurement of height.
SOLUTION: Immersion lithography equipment comprises a single stage, where the height of a substrate is measured, and exposure is performed at the same time; measurement information is stored by a sensor for measuring the height of the substrate, and the stored information is read to control the positioning of the substrate, such that a measured part is moved from a projection optical system underneath the optical axis separated by a predetermined distance.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种在浸没曝光分离中不需要双阶段的方法，并且能够快速和准确地测量高度。 解决方案：浸渍光刻设备包括单个阶段，其中测量基底的高度，同时进行曝光; 测量信息由用于测量基板的高度的传感器存储，并且读取所存储的信息以控制基板的定位，使得测量部分从光轴下方的预定距离的投影光学系统移动 。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005303316A

公开(公告)日：2005-10-27

申请号：JP2005115241

申请日：2005-04-13

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  PEETERS FELIX GODFRIED PETER ,  STREEFKERK BOB ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN SANTEN HELMAR

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of a immersion lithographic equipment which is made so as to prevent contamination due to an immersion liquid.
SOLUTION: A substrate table WT is provided with a drainage groove, i.e. a barrier 40 which surrounds an outer periphery of a substrate W and a barrier 100 which surrounds another object 20 such as a sensor which exists in the substantially same surface as the upper surface of the substrate W. Since the barriers 40 and 100 can collect all liquid which falls from a liquid feed system while exposing the substrate W, a risk that fine components of the lithographic projection equipment is contaminated is reduced.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供浸没式光刻设备的基板台，其被制成以防止由于浸没液体而引起的污染。 解决方案：衬底台WT设置有排水槽，即围绕衬底W的外周的阻挡层40和围绕另一物体20的阻挡物100，例如传感器，其存在于基本相同的表面中 基板W的上表面。由于阻挡层40和100可以收集从液体供给系统落下的所有液体同时暴露基板W，所以降低了光刻投影设备的精细分量被污染的风险。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：WO2006084641A2

公开(公告)日：2006-08-17

申请号：PCT/EP2006001005

申请日：2006-02-06

Applicant: ASML NETHERLANDS BV ,  JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS LEONA ,  JANSSEN FRANCISCUS JOHANNES JO ,  KUIJPER ANTHONIE

Inventor： JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS LEONA ,  JANSSEN FRANCISCUS JOHANNES JO ,  KUIJPER ANTHONIE

IPC: G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, that has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

Abstract translation: 提供了一种浸没液体，其包括离子形成组分，例如 酸或碱，具有较高的蒸气压。 还提供了使用浸液的光刻工艺和光刻系统。

公开(公告)号：WO2013189827A2

公开(公告)日：2013-12-27

申请号：PCT/EP2013062259

申请日：2013-06-13

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  LABETSKI DZMITRY ,  MESTROM WILBERT ,  KAMPINGA WIM RONALD ,  NIEUWENKAMP JAN OKKE ,  BRINKERT JACOB ,  CASTELIJNS HENRICUS ,  TEN KATE NICOLAAS ,  SCHIMMEL HENDRIKUS ,  JANSEN HANS ,  PAULUSSEN DENNIS ,  VIRGO BRIAN ,  JILISEN REINIER ,  BADIE RAMIN ,  RIJPMA ALBERT ,  FRANKEN JOHANNES ,  VAN PUTTEN PETER ,  VAN DER STRAATEN GERRIT

IPC: G03F7/20

CPC classification number: G03F7/70983 ,  F15D1/0065 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/06 ,  G21K5/08 ,  H05G2/005 ,  H05G2/008 ,  Y10T137/206

Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Abstract translation: 一种辐射源，包括燃料源，其构造成将燃料输送到燃料发射EUV辐射的位置。 辐射源还包括设置有多个凹槽的不动的燃料碎屑接收表面。 凹槽具有定向，其布置成在一个或多个所需方向上在重力的影响下引导液体燃料的流动。

公开(公告)号：NL2003421A

公开(公告)日：2010-04-22

申请号：NL2003421

申请日：2009-09-02

Applicant: ASML NETHERLANDS BV

Inventor： JONG ANTHONIUS ,  JANSEN HANS ,  DONCK JACQUES ,  GORTER HARRIE ,  BERG JOHANNES

IPC: G03F7/20

Abstract: A lithographic apparatus includes a fluid supply system configured to provide a cleaning fluid to a surface to be cleaned. The cleaning fluid includes from 25 to 98.99 wt % water; from 1 to 74.99 wt % solvent selected from one or more glycol ethers, esters, alcohols and ketones; and from 0.01 to 5 wt % surfactant.

公开(公告)号：NL1036571A1

公开(公告)日：2009-09-08

申请号：NL1036571

申请日：2009-02-13

Applicant: ASML NETHERLANDS BV

Inventor： KIVITS KOEN ,  JANSEN HANS ,  SERRAO VASCO MIGUEL MATIAS

IPC: G03F7/20

公开(公告)号：NL1036306A1

公开(公告)日：2009-06-23

申请号：NL1036306

申请日：2008-12-11

Applicant: ASML NETHERLANDS BV

Inventor： GRAAF ROELOF FREDERIK DE ,  JANSEN HANS ,  JANSEN BAUKE ,  HEUSSCHEN HUBERTUS LEONARDUS FRANCISCUS

IPC: G03F7/20

公开(公告)号：SG145770A1

公开(公告)日：2008-09-29

申请号：SG2008062531

申请日：2006-02-14

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MARIA

Abstract: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume / damper to compensate for pressure fluctuation.

公开(公告)号：DE602005000696D1

公开(公告)日：2007-04-26

申请号：DE602005000696

申请日：2005-04-04

Applicant: ASML NETHERLANDS BV

Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  BASELMANS JOHANNES JACOBUS ,  DONDERS SJOERD NICOLAAS ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  MERTENS JEROEN JOHANNES ,  MULKENS JOHANNES CATHARINUS ,  PEETERS FELIX GODFRIED ,  STREEFKERK BOB ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN SANTEN HELMAR ,  JANSEN HANS

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG123687A1

公开(公告)日：2006-07-26

申请号：SG200507860

申请日：2005-12-06

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN HANS ,  TINNEMANS PATRICIUS ALOYSIUS J ,  TOORN VAN DER JAN-GERARD CORNE

Abstract: The present invention relates to the method of reducing contamination of an immersion liquid in a lithographic apparatus when a closing surface is used to confine liquid in a liquid supply system. To avoid or reduce particulate contamination caused by the closing surface colliding with the liquid supply system, the closing surface is maintained at a distance away from the liquid supply system such that there is no collision between the closing surface and the liquid supply system, but the liquid is nonetheless confined.