公开(公告)号：DE60227135D1

公开(公告)日：2008-07-31

申请号：DE60227135

申请日：2002-07-24

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO JAN ,  DE JAGER PIETER WILLEM HERMAN ,  HINTERSTEINER JASON DOUGLAS ,  KRUIZINGA BORGERT ,  MCCARTHY MATTHEW EUGENE ,  OSKOTSKY MARK ,  RYZHIKOV LEV ,  SAKIN LEV ,  SMIRNOV STANISLAV ,  SNIJDERS BART ,  VAN DER MAST KAREL DIEDERICK

IPC: G03F7/20 ,  H01L21/027

Abstract: An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.

公开(公告)号：DE602006000357D1

公开(公告)日：2008-02-07

申请号：DE602006000357

申请日：2006-02-17

Applicant: ASML NETHERLANDS BV

Inventor： KOK HAICO VICTOR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KRUIZINGA BORGERT ,  SENGERS TIMOTHEUS FRANCISCUS ,  MOEST BEARRACH ,  HAAST MARC ANTONIUS MARIA ,  WEISSBRODT PETER WERNER ,  SCHRENK MANFRED HELMUT GUSTAV ,  HARZENDORF TORSTEN

IPC: G03F7/20

Abstract: A sensor (30) for use at substrate level in a high-NA lithographic apparatus has a transparent plate (22) covering a sensing element (25) and arrangements to improve coupling of radiation into the sensing element, including Fresnel lenses (31), holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.

公开(公告)号：SG11201601454WA

公开(公告)日：2016-03-30

申请号：SG11201601454W

申请日：2014-09-24

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BARTRAIJ PETRUS ,  VAN GORKOM RAMON ,  AMENT LUCAS ,  DE JAGER PIETER ,  DE VRIES GOSSE ,  DONKER RILPHO ,  ENGELEN WOUTER ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  NIENHUYS HAN-KWANG ,  NIKIPELOV ANDREY ,  RENKENS MICHAEL ,  JANSSEN FRANCISCUS ,  KRUIZINGA BORGERT

IPC: G03F7/20 ,  G01N21/956 ,  G02B5/18 ,  G02B27/00 ,  G02B27/09 ,  G02B27/10 ,  G02B27/12 ,  G02B27/14 ,  G02B27/42 ,  G03F1/84 ,  G21K1/06 ,  H01S3/09 ,  H05H7/04

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

公开(公告)号：NL2013518A

公开(公告)日：2015-03-30

申请号：NL2013518

申请日：2014-09-24

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  BARTRAIJ PETRUS ,  AMENT LUCAS ,  JAGER PIETER ,  VRIES GOSSE ,  DONKER RILPHO ,  ENGELEN WOUTER ,  FRIJNS OLAV ,  GRIMMINCK LEONARDUS ,  KATALENIC ANDELKO ,  LOOPSTRA ERIK ,  NIENHUYS HAN-KWANG ,  NIKIPELOV ANDREY ,  RENKENS MICHAEL ,  GORKOM RAMON ,  JANSSEN FRANCISCUS ,  KRUIZINGA BORGERT

IPC: H05G2/00 ,  G03F7/20

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

公开(公告)号：NL2013014A

公开(公告)日：2014-12-22

申请号：NL2013014

申请日：2014-06-17

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  FRIJNS OLAV ,  VRIES GOSSE ,  LOOPSTRA ERIK ,  BANINE VADIM ,  JAGER PIETER ,  DONKER RILPHO ,  NIENHUYS HAN-KWANG ,  KRUIZINGA BORGERT ,  ENGELEN WOUTER ,  LUITEN OTGER ,  AKKERMANS JOHANNES ,  GRIMMINCK LEONARDUS ,  LITVINENKO VLADIMIR

IPC: G03F7/20

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

公开(公告)号：NL1036334A1

公开(公告)日：2009-06-30

申请号：NL1036334

申请日：2008-12-18

Applicant: ASML NETHERLANDS BV

Inventor： VISSER HUIBERT ,  HOEKS MARTINUS HENDRICUS HENDRICUS ,  KRUIZINGA BORGERT ,  STREEFKERK BOB ,  TINNEMANS PATRICIUS ALOYSIUS JACOBUS ,  ZWET ERWIN JOHN VAN ,  VANNEER ROELAND NICOLAAS MARIA ,  MEIJERINK MARCUS GERHARDUS HENDRIKUS ,  VALK NICOLAAS CORNELIS JOHANNES VAN DER ,  HIMBERGEN HAR VAN

IPC: G03F7/20

公开(公告)号：DE602006000357T2

公开(公告)日：2008-12-11

申请号：DE602006000357

申请日：2006-02-17

Applicant: ASML NETHERLANDS BV

Inventor： KOK HAICO VICTOR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KRUIZINGA BORGERT ,  SENGERS TIMOTHEUS FRANCISCUS ,  MOEST BEARRACH ,  HAAST MARC ANTONIUS MARIA ,  WEISSBRODT PETER WERNER ,  SCHRENK MANFRED HELMUT GUSTAV WILHELM JOHANN ,  HARZENDORF TORSTEN

IPC: G03F7/20

Abstract: A sensor (30) for use at substrate level in a high-NA lithographic apparatus has a transparent plate (22) covering a sensing element (25) and arrangements to improve coupling of radiation into the sensing element, including Fresnel lenses (31), holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.