公开(公告)号：NL2008630A

公开(公告)日：2012-10-30

申请号：NL2008630

申请日：2012-04-12

Applicant: ASML NETHERLANDS BV

Inventor： BEX JAN ,  KATE NICOLAAS ,  LAFARRE RAYMOND ,  BRINKHOF EUGENE ,  DAMEN JOHANNES ,  KARADE YOGESH

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2006127A

公开(公告)日：2011-08-18

申请号：NL2006127

申请日：2011-02-03

Applicant: ASML NETHERLANDS BV

Inventor： KANEKO TAKESHI ,  OTTENS JOOST ,  LAFARRE RAYMOND

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2005666A

公开(公告)日：2011-06-21

申请号：NL2005666

申请日：2010-11-11

Applicant: ASML NETHERLANDS BV

Inventor： ROSET NIEK ,  KATE NICOLAAS ,  LAFARRE RAYMOND ,  ZDRAVKOV ALEXANDER

IPC: G03F7/20

公开(公告)号：NL2009858A

公开(公告)日：2013-07-01

申请号：NL2009858

申请日：2012-11-22

Applicant: ASML NETHERLANDS BV

Inventor： TROMP SIEGFRIED ,  KATE NICOLAAS ,  LAFARRE RAYMOND

IPC: G03F7/20 ,  H01L21/683

Abstract: A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body, a plurality of burls and a heater and/or a temperature sensor. The main body has a surface. The plurality of burls project from the surface and have end surfaces to support a substrate. The heater and/or temperature sensor is provided on the main body surface. The substrate holder is configured such that when a substrate is supported on the end surfaces, a thermal conductance between the heater and/or temperature sensor and the substrate is greater than a thermal conductance between the heater and/or temperature sensor and the main body surface.

公开(公告)号：NL2008468A

公开(公告)日：2012-10-12

申请号：NL2008468

申请日：2012-03-12

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN JOHANNES ,  GROOT ANTONIUS ,  PASCH ENGELBERTUS ,  BEERENS RUUD ,  LAFARRE RAYMOND

IPC: G03F7/20

公开(公告)号：NL2008199A

公开(公告)日：2012-08-29

申请号：NL2008199

申请日：2012-01-30

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS ,  LAFARRE RAYMOND

IPC: G03F7/20

公开(公告)号：NL2007768A

公开(公告)日：2012-06-18

申请号：NL2007768

申请日：2011-11-10

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  TEN KATE NICOLAAS ,  DZIOMKINA NINA ,  KARADE YOGESH

IPC: G03F7/20 ,  H01L21/683

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：NL2006536A

公开(公告)日：2011-11-15

申请号：NL2006536

申请日：2011-04-04

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  ROSET NIEK ,  HOUBEN MARTIJN

IPC: G03F9/00 ,  G03F7/20

Abstract: A substrate table to support a substrate is disclosed. The substrate table includes a substrate support to support the substrate and to apply a bending force to an edge of the substrate in a first direction. A substrate edge manipulator is provided that is configured to apply a variable bending force to the edge of the substrate in a second direction, which second direction has at least a component opposite in direction to the first direction.

公开(公告)号：NL2006076A

公开(公告)日：2011-09-06

申请号：NL2006076

申请日：2011-01-27

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  RIEPEN MICHEL ,  CORTIE ROGIER ,  MEIJERS RALPH ,  EVANGELISTA FABRIZIO

IPC: G03F7/20

公开(公告)号：NL2004807A

公开(公告)日：2011-01-04

申请号：NL2004807

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  BENSCHOP JOZEF ,  KATE NICOLAAS ,  ROSET NIEK ,  KUSTERS GERARDUS ,  ZDRAVKOV ALEXANDER ,  PATEL HRISHIKESH ,  OPSTAL SANDER

IPC: G03F7/20