公开(公告)号：NL2003528A

公开(公告)日：2010-04-26

申请号：NL2003528

申请日：2009-09-23

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  VERMEULEN JOHANNES ,  ZUIDEMA PATRICK

IPC: G03F9/00

Abstract: A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate. The apparatus is provided with a clamp, including a support part configured to support the patterning device or the substrate and a temperature control part configured to control the temperature of the patterning device or the substrate. The clamp is constructed to mechanically isolate the temperature control part from the support part with a flexible connector so that vibrations, shrink and expansion of the temperature control part will not influence the patterning device and/or the substrate.

公开(公告)号：NL2002942A

公开(公告)日：2010-03-09

申请号：NL2002942

申请日：2009-05-28

Applicant: ASML NETHERLANDS BV

Inventor： KRUIJT-STEGEMAN YVONNE ,  JEUNINK ANDRE ,  VERMEULEN JOHANNES ,  WUISTER SANDER ,  LAFARRE RAYMOND ,  SCHIFFART CATHARINUS ,  JANSEN NORBERT

IPC: G03F7/00 ,  H01L21/30

公开(公告)号：NL2011909A

公开(公告)日：2014-06-19

申请号：NL2011909

申请日：2013-12-06

Applicant: ASML NETHERLANDS BV

Inventor： ARLEMARK ERIK ,  KOEVOETS ADRIANUS ,  LAFARRE RAYMOND ,  KATE NICOLAAS ,  LUIJTEN CARLO ,  NIENHUYS HAN-KWANG

IPC: G03F7/20 ,  H01L21/683

Abstract: Disclosed is a substrate support for an apparatus of the type which projects a beam of EUV radiation onto a target portion of a substrate (400). The substrate support comprises a substrate table constructed to hold the substrate, a support block (420) for supporting the substrate table, and a cover plate (450′) disposed around the substrate table. The top surface of the cover plate and the top surface of a substrate mounted on the substrate table are all substantially at the same level. At least one sensor unit (430) is located on the substrate support and its top surface is also at the same level as that of the cover plate and substrate. Also disclosed is an EUV lithographic apparatus comprising such a substrate support.

公开(公告)号：NL2010472A

公开(公告)日：2013-10-23

申请号：NL2010472

申请日：2013-03-19

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH ,  SINGH HARMEET

IPC: H01L21/683 ,  G03F7/20

Abstract: A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body having a surface; a plurality of burls projecting from the surface and having end surfaces to support a substrate; and a thin film stack on the main body surface and forming an electric component, the thin film stack having a conductive layer configured to distribute electrical charge substantially uniformly throughout a plane of the stack in which the conductive layer is positioned.

公开(公告)号：NL2010139A

公开(公告)日：2013-08-06

申请号：NL2010139

申请日：2013-01-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  KATE NICOLAAS ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH

IPC: G03F7/20 ,  H01L21/683

Abstract: Substrate holder (100) for use in a lithographic apparatus, the substrate holder comprising a main body having a first surface and a second surface opposite the first surface.A plurality of first burls are provided on the first surface, the first burls having end surfaces to support a substrate. A plurality of second burls are provided on the second surface to support the substrate holder on a structure. The plurality of first burls each comprise a lower body portion protruding from the first surface and an upper body portion above the lower body portion, the lower body portions comprise a different material from the upper body portions, and the upper body portions comprise diamond-like carbon.

公开(公告)号：NL2009487A

公开(公告)日：2013-04-16

申请号：NL2009487

申请日：2012-09-19

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH ,  DELFT PETER

IPC: G03F7/20 ,  H01L21/683

公开(公告)号：NL2009332A

公开(公告)日：2013-03-26

申请号：NL2009332

申请日：2012-08-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  GROOT ANTONIUS ,  VERMEULEN JOHANNES ,  HUANG YANG-SHAN ,  VALENTIN CHRISTIAAN LOUIS ,  SEGERS HUBERT MARIE ,  BERG JOHAN ,  WESTERLAKEN JAN STEVEN CHRISTIAAN ,  VISSER RAIMOND

IPC: G03F7/20 ,  G03F9/00

Abstract: A lithographic apparatus comprises a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes an electrostatic clamp arranged to clamp the substrate at a top side thereof. The electrostatic clamp is arranged to clamp at least part of a circumferential outer zone of a top surface of the substrate. The invention provides a substrate handling method including positioning the substrate by means of a gripper on a substrate table of a lithographic apparatus. The substrate is clamped at a top side thereof by using an electrostatic clamp of the gripper.

公开(公告)号：NL2008110A

公开(公告)日：2012-08-21

申请号：NL2008110

申请日：2012-01-12

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  BEEMS MARCEL ,  CADEE THEODORUS ,  LAFARRE RAYMOND

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2004523A

公开(公告)日：2010-11-09

申请号：NL2004523

申请日：2010-04-08

Applicant: ASML NETHERLANDS BV

Inventor： BOKHOVEN LAURENTIUS ,  KATE NICOLAAS ,  LAFARRE RAYMOND ,  CASTELIJNS HENRICUS ,  ARTS PETRUS

IPC: G03F7/20

公开(公告)号：NL2012204A

公开(公告)日：2014-12-18

申请号：NL2012204

申请日：2014-02-05

Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

Inventor： DEL PUERTO SANTIAGO ,  LIPSON MATTHEW ,  HENDERSON KENNETH ,  LAFARRE RAYMOND ,  MARKOYA LOUIS ,  VERMEULEN JOHANNES ,  GROOT ANTONIUS FRANCISCUS JOHANNES ,  WILK RONALD

IPC: G03F7/20

Abstract: A lithographic apparatus is provided. The lithographic apparatus includes a reticle and an electrostatic clamp configured to releasably hold the reticle. The electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements are located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.