公开(公告)号：NL2011580A

公开(公告)日：2014-05-08

申请号：NL2011580

申请日：2013-10-10

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  YAKUNIN ANDREI ,  BANINE VADIM ,  NIKIPELOV ANDREY ,  OSORIO OLIVEROS EDGAR ,  STRUYCKEN ALEXANDER ,  DRIE NHUIZEN BERT ,  SCHOOT JAN

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2010108A

公开(公告)日：2013-07-22

申请号：NL2010108

申请日：2013-01-10

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  MOORS ROEL ,  SCHOOT JAN ,  VERHAGEN MARTINUS ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  KRIVTSUN VLADIMIR ,  SWINKELS GERARDUS ,  RIEPEN MICHEL ,  SCHIMMEL HENDRIKUS ,  MEDVEDEV VIACHESLAV

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：SG184557A1

公开(公告)日：2012-11-29

申请号：SG2012075628

申请日：2011-02-22

Applicant: ASML NETHERLANDS BV

Inventor： SOER WOUTER ,  BANINE VADIM ,  LOOPSTRA ERIK ,  YAKUNIN ANDREI ,  JAK MARTIN

Abstract: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000 °C.

公开(公告)号：NL2005750A

公开(公告)日：2011-01-18

申请号：NL2005750

申请日：2010-11-24

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  IVANOV VLADIMIR ,  KOSHELEV KONSTANTIN ,  KRIVTSUN VLADIMIR ,  GLUSHKOV DENIS

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2005748A

公开(公告)日：2011-01-06

申请号：NL2005748

申请日：2010-11-24

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  BANINE VADIM ,  BRULS RICHARD ,  IVANOV VLADIMIR ,  NEERHOF HENDRIK ,  YAKUNIN ANDREI ,  SCACCABAROZZI LUIGI

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2004984A

公开(公告)日：2010-08-12

申请号：NL2004984

申请日：2010-06-28

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  KRIVTSUN VLADIMIR ,  MEDVEDEV VIACHESLAV ,  KODENTSOV ALEXANDRE

IPC: G02B5/20 ,  G03F7/20

公开(公告)号：NL2011484A

公开(公告)日：2014-04-29

申请号：NL2011484

申请日：2013-09-23

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  BANINE VADIM ,  YAKUNIN ANDREI

IPC: G03F7/20

公开(公告)号：NL2009372A

公开(公告)日：2013-04-02

申请号：NL2009372

申请日：2012-08-28

Applicant: ASML NETHERLANDS BV

Inventor： SCHOOT JAN ,  GREEVENBROEK HENDRIKUS ,  IVANOV VLADIMIR ,  YAKUNIN ANDREI ,  KREUWEL HERMANUS

IPC: G03F7/20

Abstract: EUV exposure dose in a lithographic apparatus is controlled pulse to pulse by varying a conversion efficiency with which a pulse of EUV radiation is generated from an excitation of a fuel material by a corresponding pulse of excitation laser radiation. Conversion efficiency can be varied in several different ways, by varying the proportion of a fuel material that intersects a laser beam, and/or by varying a quality of the interaction. Mechanisms to vary the conversion efficiency can be based on variation of a laser pulse timing, variation of pre-pulse energy, and/or variable displacement of a main laser beam in one or more directions. Steps to maintain symmetry of the generated EUV radiation can be included.

公开(公告)号：NL2010236A

公开(公告)日：2013-03-19

申请号：NL2010236

申请日：2013-02-04

Applicant: ASML NETHERLANDS BV

Inventor： YEREMENKO SERGIY ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  LABETSKI DZMITRY ,  YAKUNIN ANDREI

IPC: G03F7/20

公开(公告)号：NL2007864A

公开(公告)日：2011-12-22

申请号：NL2007864

申请日：2011-11-25

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  IVANOV VLADIMIR ,  SCHOOT JAN ,  KRIVTSUN VLADIMIR ,  SWINKELS GERARDUS ,  MEDVEDEV VIACHESLAV

IPC: G03F7/20 ,  H05G2/00