公开(公告)号：NL2004598A

公开(公告)日：2010-11-30

申请号：NL2004598

申请日：2010-04-23

Applicant: ASML NETHERLANDS BV

Inventor： EIJK JAN ,  DONDERS SJOERD ,  JACOBS JOHANNES ,  KATE NICOLAAS ,  VERMEULEN JOHANNES ,  ZAAL KOEN ,  REMIE MARTIN

IPC: G03F7/20

公开(公告)号：NL2005244A

公开(公告)日：2011-03-23

申请号：NL2005244

申请日：2010-08-18

Applicant: ASML NETHERLANDS BV

Inventor： DONDERS SJOERD ,  GILISSEN NOUD

IPC: H01L21/683 ,  G03F7/20

Abstract: A substrate table or a patterning device support includes an aerogel. The aerogel may be very light weight, for example the aerogel may have a density between 0.5 and 500 mg/cm3, preferably between 1 and 100 mg/cm3 and most preferably between 1 and 10 mg/cm3. The aerogel may be made from a silica gel. The aerogel made from silica gel may have a density of 1.9 mg/cm3 and if the air out of the aerogel is evacuated even 1 mg/cm3.

公开(公告)号：NL2003225A1

公开(公告)日：2010-01-26

申请号：NL2003225

申请日：2009-07-17

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL ,  DONDERS SJOERD ,  KEMPER NICOLAAS ,  PHILIPS DANNY ,  RIEPEN MICHEL ,  DUNGEN CLEMENS VAN DEN ,  BAETEN ADRIANES ,  EVANGELISTA FABRIZIO

IPC: G03F7/20

公开(公告)号：NL2010139A

公开(公告)日：2013-08-06

申请号：NL2010139

申请日：2013-01-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  KATE NICOLAAS ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH

IPC: G03F7/20 ,  H01L21/683

Abstract: Substrate holder (100) for use in a lithographic apparatus, the substrate holder comprising a main body having a first surface and a second surface opposite the first surface.A plurality of first burls are provided on the first surface, the first burls having end surfaces to support a substrate. A plurality of second burls are provided on the second surface to support the substrate holder on a structure. The plurality of first burls each comprise a lower body portion protruding from the first surface and an upper body portion above the lower body portion, the lower body portions comprise a different material from the upper body portions, and the upper body portions comprise diamond-like carbon.

公开(公告)号：NL2010185A

公开(公告)日：2013-08-01

申请号：NL2010185

申请日：2013-01-25

Applicant: ASML NETHERLANDS BV

Inventor： KOEVOETS ADRIANUS ,  DONDERS SJOERD ,  SCHOOT JAN ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA

IPC: G03F7/20

公开(公告)号：NL2009332A

公开(公告)日：2013-03-26

申请号：NL2009332

申请日：2012-08-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  GROOT ANTONIUS ,  VERMEULEN JOHANNES ,  HUANG YANG-SHAN ,  VALENTIN CHRISTIAAN LOUIS ,  SEGERS HUBERT MARIE ,  BERG JOHAN ,  WESTERLAKEN JAN STEVEN CHRISTIAAN ,  VISSER RAIMOND

IPC: G03F7/20 ,  G03F9/00

Abstract: A lithographic apparatus comprises a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes an electrostatic clamp arranged to clamp the substrate at a top side thereof. The electrostatic clamp is arranged to clamp at least part of a circumferential outer zone of a top surface of the substrate. The invention provides a substrate handling method including positioning the substrate by means of a gripper on a substrate table of a lithographic apparatus. The substrate is clamped at a top side thereof by using an electrostatic clamp of the gripper.