公开(公告)号：NL2006057A

公开(公告)日：2011-08-25

申请号：NL2006057

申请日：2011-01-25

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  EUSSEN EMIEL ,  KOENEN WILLEM ,  PASCH ENGELBERTUS ,  SCHOOT HARMEN ,  WIJST MARC ,  VERMEULEN MARCUS ,  HOON CORNELIUS

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/68

Abstract: A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.

公开(公告)号：NL2004681A

公开(公告)日：2011-01-10

申请号：NL2004681

申请日：2010-05-06

Applicant: ASML NETHERLANDS BV

Inventor： JEUNINK ANDRE ,  BANINE VADIM ,  BUTLER HANS ,  VERMEULEN JOHANNES ,  KRUIJT-STEGEMAN YVONNE ,  PASCH ENGELBERTUS

IPC: G03F7/00

公开(公告)号：NL2009196A

公开(公告)日：2013-02-27

申请号：NL2009196

申请日：2012-07-17

Applicant: ASML NETHERLANDS BV

Inventor： KOENEN WILLEM ,  EUSSEN EMIEL ,  PASCH ENGELBERTUS ,  LEEUWEN ROBBERT ,  KOEVOETS ADRIANUS

IPC: G03F7/20 ,  H01L21/68

Abstract: A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.

公开(公告)号：NL2008468A

公开(公告)日：2012-10-12

申请号：NL2008468

申请日：2012-03-12

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN JOHANNES ,  GROOT ANTONIUS ,  PASCH ENGELBERTUS ,  BEERENS RUUD ,  LAFARRE RAYMOND

IPC: G03F7/20

公开(公告)号：NL2007818A

公开(公告)日：2012-06-21

申请号：NL2007818

申请日：2011-11-18

Applicant: ASML NETHERLANDS BV

Inventor： MAST FRANCISCUS ,  PASCH ENGELBERTUS

IPC: G03F7/20

公开(公告)号：NL2007155A

公开(公告)日：2012-02-28

申请号：NL2007155

申请日：2011-07-21

Applicant: ASML NETHERLANDS BV

Inventor： PASCH ENGELBERTUS ,  EUSSEN EMIEL ,  JEUNINK ANDRE ,  LEEUWEN ROBBERT

IPC: G03F7/20 ,  H01L21/68

公开(公告)号：NL2006149A

公开(公告)日：2011-09-13

申请号：NL2006149

申请日：2011-02-07

Applicant: ASML NETHERLANDS BV

Inventor： KOENEN WILLEM ,  EUSSEN EMIEL ,  PASCH ENGELBERTUS

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2005545A

公开(公告)日：2011-05-18

申请号：NL2005545

申请日：2010-10-18

Applicant: ASML NETHERLANDS BV

Inventor： PASCH ENGELBERTUS ,  EUSSEN EMIEL ,  LOOPSTRA ERIK

IPC: G01D5/38 ,  G03F7/20

公开(公告)号：NL2005309A

公开(公告)日：2011-04-14

申请号：NL2005309

申请日：2010-09-03

Applicant: ASML NETHERLANDS BV

Inventor： BEERENS RUUD ,  DONDERS SJOERD ,  PASCH ENGELBERTUS ,  VEN BASTIAAN ,  VERMEULEN JOHANNES

IPC: G03F7/20

公开(公告)号：NL2003846A

公开(公告)日：2010-06-22

申请号：NL2003846

申请日：2009-11-23

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN JOHANNES ,  WIJST MARC ,  CADEE THEODORUS ,  JACOBS FRANSISCUS ,  VALENTIN CHRISTIAAN LOUIS ,  BAGGEN MARCEL ,  BUTLER HANS ,  COX HENRIKUS ,  EIJK JAN ,  JEUNINK ANDRE ,  KEMPER NICOLAAS ,  SCHMIDT ROBERT-HAN MUNNIG ,  PASCH ENGELBERTUS

IPC: G03F9/00

Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.