公开(公告)号：JP2011029599A

公开(公告)日：2011-02-10

申请号：JP2010107057

申请日：2010-05-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN BAUKE ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  VAN DER NET ANTONIUS JOHANNUS ,  KRAMER PIETER JACOB ,  KUIJPER ANTHONIE ,  MARTENS ARJAN HUBRECHT JOSEF ANNA ,  CASIMIRI ERIC WILLEM FELIX

IPC: H01L21/027

CPC classification number: G03B27/52 ,  G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a system which reduces pollution in an immersion lithographic apparatus, and reduces an interruption time for cleaning the immersion lithographic apparatus if not eliminated.
SOLUTION: A cleaner (for instance, an active cleaning agent) is added to immersion liquid in order to clean and/or prevent accumulation of pollution during exposure of a substrate to clean the immersion lithographic apparatus. For the cleaner, a surface-active agent, a cleaning agent, soap, an acid, an alkali, a solvent (nonpolar organic solvent, polar organic solvent or the like), another optional cleaning agent appropriate for a lithographic apparatus or the like is used. The cleaning agent may be present at a concentration

Abstract translation: 要解决的问题：提供一种减少浸没式光刻设备中的污染的系统，并且如果不消除浸没式光刻设备的清洁，减少清洗中断时间。

解决方案：为了清洁和/或防止在曝光基材以清洁浸没式光刻设备时的污染积聚，将清洁剂（例如，活性清洁剂）加入到浸液中。 对于清洁剂，表面活性剂，清洁剂，皂，酸，碱，溶剂（非极性有机溶剂，极性有机溶剂等），适用于光刻设备的其它任选的清洁剂等是 用过的。 清洁剂可以以<300ppb的浓度存在。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009049406A

公开(公告)日：2009-03-05

申请号：JP2008204905

申请日：2008-08-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER NET ANTONIUS JOHANNUS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70858 ,  Y10T137/3084

Abstract: PROBLEM TO BE SOLVED: To control extraction of liquid and gas mixture from a lithographic apparatus using an immersion system.
SOLUTION: A manifold is prepared between an exit of a liquid supplying system of a lithographic apparatus and a separator. This manifold is equipped with a pressure sensor which transmit measured pressure in the manifold to a mass flow rate controlling device. The mass flow rate controlling device controls leak flow into the manifold in accordance with the measured pressure in the manifold to maintain predetermined pressure in it.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：控制使用浸没系统从光刻设备中提取液体和气体混合物。 解决方案：在光刻设备的液体供应系统的出口和分离器之间制备歧管。 该歧管配备有压力传感器，其将歧管中的测量压力传递到质量流量控制装置。 质量流量控制装置根据测量的歧管中的压力来控制进入歧管的泄漏流以维持其中的预定压力。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008185328A

公开(公告)日：2008-08-14

申请号：JP2008012414

申请日：2008-01-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER NET ANTONIUS JOHANNUS

IPC: F24F6/04 ,  H01L21/027

CPC classification number: G03F7/70933 ,  C10J1/06 ,  C10J1/10 ,  G03F7/70341 ,  Y10S261/65

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device, and a humidifier and a humidifying method used in combination with a device manufacturing method. SOLUTION: The humidifier in which gas is supplied to the first side of a membrane and liquid is supplied to the second side of the membrane is presented. The membrane is not permeable to liquid but permeable to liquid steam and lyophilic to the liquid. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种平版印刷装置，以及与装置制造方法结合使用的加湿器和加湿方法。 解决方案：提供将气体供应到膜和液体的第一侧的加湿器供应到膜的第二侧。 该膜不能透过液体，而且对液体蒸气是可渗透的，并且与液体亲液。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：SG149783A1

公开(公告)日：2009-02-27

申请号：SG2008054611

申请日：2008-07-23

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHAN ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

Abstract: Lithographic Apparatus and Contamination Removal or Prevention Method An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra- pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d). [Fig 3]

公开(公告)号：SG120255A1

公开(公告)日：2006-03-28

申请号：SG200505017

申请日：2005-08-08

Applicant: ASML NETHERLANDS BV

Inventor： CADEE THEODORUS PETRUS MARIA C ,  JACOBS JOHANNES HENRICUS WILHE ,  TEN KATE NICOLAAS ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS JOHANNUS ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: G03F7/20

Abstract: A lithographic apparatus comprising: an illumination system (IL) configured to condition a radiation beam (PB); a support (MT) constructed to support a patterning device (MA), the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table (WT) constructed to hold a substrate (W); a projection system (PL) configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system (130) configured to at least partly fill a space (25) between a final element of said projection system and said substrate with liquid; a seal member (12) arranged substantially to contain said liquid within said space between said final element of the projection system and said substrate; and elements (30,50,60,120,140) to control and/or compensate for evaporation of immersion liquid from said substrate.