公开(公告)号：WO2015180966A3

公开(公告)日：2016-01-28

申请号：PCT/EP2015060620

申请日：2015-05-13

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER FREDERIK ,  JEUNINK ANDRE BERNARDUS ,  PEETERS EMIEL

IPC: G03F7/00

CPC classification number: H01L21/76816 ,  B81C1/00031 ,  B81C1/00396 ,  B81C2201/0149 ,  C09K13/00 ,  C30B1/04 ,  C30B29/58 ,  G03F7/0002 ,  G03F7/0041 ,  G03F7/2004 ,  G03F7/3021 ,  G03F7/70375 ,  H01L21/0271 ,  H01L21/3083 ,  H01L21/76829

Abstract: A method of forming at least one lithography feature, the method comprising: providing at least one lithography recess on a substrate, the or each lithography recess comprising side-walls and a base, with the side-walls having a width therebetween; providing a self-assemblable block copolymer having first and second blocks in the or each lithography recess; causing the self-assemblable block copolymer to self-assemble into an ordered layer within the or each lithography recess, the ordered layer comprising at least a first domain of first blocks and a second domain of second blocks; causing the self-assemblable block copolymer to cross-link in a directional manner; and selectively removing the first domain to form lithography features comprised of the second domain within the or each lithography recess.

Abstract translation: 一种形成至少一个光刻特征的方法，所述方法包括：在基底上提供至少一个光刻凹槽，所述或每个光刻凹槽包括侧壁和底座，其中所述侧壁之间具有宽度; 提供在所述或每个光刻凹槽中具有第一和第二块的自组装嵌段共聚物; 使得所述可自组装嵌段共聚物自组装成所述或每个光刻凹槽内的有序层，所述有序层包含至少第一区域的第一区域和第二区域的第二区域; 导致自组装嵌段共聚物以定向方式交联; 并且选择性地移除第一区域以形成由该光刻凹槽或每个光刻凹槽内的第二区域组成的光刻特征。

公开(公告)号：SG152898A1

公开(公告)日：2009-06-29

申请号：SG2003056066

申请日：2003-09-19

Applicant: ASML NETHERLANDS BV

Inventor： VAN BILSEN FRANCISCUS BERNARDUS MARIA ,  BURGHOORN JACOBUS ,  VAN HAREN RICHARD JOHANNES FRANCISCUS ,  HINNEN PAUL CHRISTIAAN ,  VAN HORSSEN HERMANUS GERARDUS ,  HUIJBREGTSE JEROEN ,  JEUNINK ANDRE BERNARDUS ,  MEGENS HENRY ,  KOREN NAVARRO Y ,  TOLSMA HOITE PIETER THEODOOR ,  SIMONS HUBERTUS JOHANNES GERTRUDUS ,  SCHUURHUIS JOHNY RUTGER ,  SCHETS SICCO IAN ,  BOK LEE YOUNG ,  DUNBAR ALLAN REUBEN

IPC: G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00 ,  G01D5/26 ,  G03F7/207

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit in communication with the detection system. The position determining unit processes information from the first and second detector channels in combination to determine a position of an alignment mark on a first object relative to a reference position on a second object based on the combined information.

公开(公告)号：SG124270A1

公开(公告)日：2006-08-30

申请号：SG200307497

申请日：2003-12-15

Applicant: ASML NETHERLANDS BV

Inventor： LEVASIER LEON MARTIN ,  BOEF DEN ARIE JEFFREY ,  DIRNSTORFER INGO ,  JEUNINK ANDRE BERNARDUS ,  KRUIJSWIJK STEFAN GEERTE ,  PELLEMANS HENRICUS PETRUS MARI ,  SETIJA IRWAN DANI ,  TOLSMA HOITE PIETER THEODOOR

IPC: G01B11/00 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: A lithographic apparatus comprising an alignment subsystem (21) for aligning the substrate (W) on the substrate table (WT) relative to the patterning means (MA). The alignment structure (10) comprises a non-periodic feature (15) which is detectable as a capture position or a check position using a reference grating (26) in the alignment subsystem (21). The non-periodic feature (15) may cause a phase effect in the detected signal of the alignment subsystem (21) or an amplitude effect.

公开(公告)号：NL2011427A

公开(公告)日：2014-04-02

申请号：NL2011427

申请日：2013-09-12

Applicant: ASML NETHERLANDS BV

Inventor： DEKKERS JEROEN ,  JEUNINK ANDRE BERNARDUS ,  LOOPSTRA ERIK ,  PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  RENKENS MICHAEL JOZEF MATHIJS ,  SCHOORMANS CAROLUS JOHANNES CATHARINA ,  HOEKSTRA PETER

IPC: G01D5/26 ,  G03F7/20 ,  G03F9/00

公开(公告)号：SG120949A1

公开(公告)日：2006-04-26

申请号：SG200305608

申请日：2003-09-19

Applicant: ASML NETHERLANDS BV

Inventor： KOREN NAVARRO Y ,  SIMONS HUBERTUS JOHANNES GERTR ,  JEUNINK ANDRE BERNARDUS

IPC: G01B11/00 ,  G01B11/02 ,  G01B21/00 ,  G02B5/18 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G03F9/02 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/68 ,  H01L23/52 ,  H01S3/00 ,  G01D5/26

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

公开(公告)号：NL2013507A

公开(公告)日：2015-04-09

申请号：NL2013507

申请日：2014-09-22

Applicant: ASML NETHERLANDS BV

Inventor： PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  EUSSEN EMIEL JOZEF MELANIE ,  JEUNINK ANDRE BERNARDUS

IPC: G01D5/38 ,  G03F7/20

公开(公告)号：DE602005010014D1

公开(公告)日：2008-11-13

申请号：DE602005010014

申请日：2005-06-28

Applicant: ASML NETHERLANDS BV

Inventor： JEUNINK ANDRE BERNARDUS ,  AKHSSAY M HAMED ,  BASELMANS JOHANNES JACOBUS ,  COMMISSARIS FRANCISCUS ,  VAN DIJK REMCO MARCEL ,  DE GROOT SIMON ,  TEL WIM TJIBBO ,  VAN DER HOFF ALEXANDER HENDRIK ,  VAN DE STADT ARNOUT

IPC: G03F7/20

Abstract: A manufacturing method is utilized in lithographic projection apparatus in order to enable all aberrations to be compensated for but with those aberrations that are of most significance to the particular application (the particular pattern, illumination mode, etc.) being given precedence over aberrations that are of lesser significance in relation to that particular application. The method uses a substrate having a target portion for receiving an image, a mask for applying a pattern in accordance with a required patterning application, and a projection system to project a selected beam of radiation onto the mask to produce a specific required patterned beam providing an image of the pattern on the target portion. In order to compensate for the aberrations in a manner that gives precedence to those aberrations of particular significance to the required application, the method incorporates the steps of predicting projection system aberration changes with time, determining the application-specific effect on certain parameters of the image of such predicted projection system aberration changes with respect to certain measured aberration values, generating a control signal specific to the required patterned beam according to such predicted projection system aberration changes in the projection system aberrations with time and their application-specific effect on certain parameters of the image; and carrying out imaging adjustments in dependence on the control signal to compensate for the application-specific effect of the predicted changes in the aberrations on the image. The adjustments are therefore determined optimally for the given application.

公开(公告)号：SG132608A1

公开(公告)日：2007-06-28

申请号：SG2006077291

申请日：2006-11-07

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  BOONMAN MARCUS EMILE JOANNES ,  CASTENMILLER THOMAS JOSEPHUS M ,  JEUNINK ANDRE BERNARDUS

Abstract: A lithographic apparatus is disclosed that includes an article support constructed to support a first article, capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, in a beam path of the radiation beam or a second article to be placed in a beam path of the patterned radiation beam, the article support having a plurality of supporting protrusions on which the first article or the second article is disposed in use, wherein the plurality of supporting protrusions are constructed to define a support zone to provide a plane of support for the first article or the second article, so that when the first article or the second article is subjected to a thermal load the support zone allows at least a portion of the first article or the second article to expand or contract to reduce the build up of a mechanical stress in the first article or second article, respectively, while maintaining the first article or second article substantially fixed to the article support, and a position sensor configured to determine a position offset, in a direction lying in the plane of the support zone, of the first article or the second article over a period of time, and a projection system configured to project a patterned radiation beam onto a target portion of a second article.